公开(公告)号：US11049689B2

公开(公告)日：2021-06-29

申请号：US16559459

申请日：2019-09-03

Applicant: ASML Netherlands B.V.

Inventor： Ehud Shaked ,  Martinus Maassen

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/24 ,  H01J37/14 ,  H01J37/04 ,  H01J37/244 ,  H01J37/147

Abstract: Systems and methods for conducting charged particle beam modulation are disclosed. According to certain embodiments, a charged particle beam apparatus generates a plurality of charged particle beams. A modulator may be configured to receive the plurality of charged particle beams and generate a plurality of modulated charged particle beams. A detector may be configured to receive the plurality of modulated charged particle beams.

公开(公告)号：US20170255105A1

公开(公告)日：2017-09-07

申请号：US15443681

申请日：2017-02-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Johannes Matheus Marie DE WIT ,  Kim Gerard Feijen ,  Anko Jozef Cornelus Sijben ,  Martinus Maassen ,  Henricus Martinus Johannes VAN DE GROES

IPC: G03F7/20 ,  G01N21/88

CPC classification number: G03F7/70191 ,  G01N21/8806 ,  G01N2021/8835 ,  G02B21/082 ,  G02B21/361 ,  G02B21/365 ,  G03F7/70575 ,  G03F7/70616

Abstract: Disclosed is an illumination system for a metrology apparatus and a metrology apparatus comprising such an illumination system. The illumination system comprises an illumination source; and a linear variable filter arrangement configured to filter a radiation beam from said illumination source and comprising one or more linear variable filters. The illumination system is operable to enable selective control of a wavelength characteristic of the radiation beam subsequent to it being filtered by the linear variable filter arrangement.

公开(公告)号：US20200176219A1

公开(公告)日：2020-06-04

申请号：US16559459

申请日：2019-09-03

Applicant: ASML Netherlands B.V.

Inventor： Ehud Shaked ,  Martinus Maassen

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/244 ,  H01J37/147 ,  H01J37/04

Abstract: Systems and methods for conducting charged particle beam modulation are disclosed. According to certain embodiments, a charged particle beam apparatus generates a plurality of charged particle beams. A modulator may be configured to receive the plurality of charged particle beams and generate a plurality of modulated charged particle beams. A detector may be configured to receive the plurality of modulated charged particle beams.

公开(公告)号：US10416567B2

公开(公告)日：2019-09-17

申请号：US15443681

申请日：2017-02-27

Applicant: ASML Netherlands B.V.

Inventor： Johannes Matheus Marie De Wit ,  Kim Gerard Feijen ,  Anko Jozef Cornelus Sijben ,  Martinus Maassen ,  Henricus Martinus Johannes Van De Groes

IPC: G03F7/20 ,  G01N21/88 ,  G02B21/08 ,  G02B21/36

Abstract: Disclosed is an illumination system for a metrology apparatus and a metrology apparatus comprising such an illumination system. The illumination system comprises an illumination source; and a linear variable filter arrangement configured to filter a radiation beam from said illumination source and comprising one or more linear variable filters. The illumination system is operable to enable selective control of a wavelength characteristic of the radiation beam subsequent to it being filtered by the linear variable filter arrangement.