公开(公告)号：US20200341365A1

公开(公告)日：2020-10-29

申请号：US16758250

申请日：2018-11-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Zomer Silvester HOUWELING ,  Chaitanya Krishna ANDE ,  Dennis DE GRAAF ,  Thijs KATER ,  Michael Alfred Josephus KUIJKEN ,  Mahdiar VALEFI

IPC: G03F1/64 ,  G03F1/00

Abstract: A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.

公开(公告)号：US20240302736A1

公开(公告)日：2024-09-12

申请号：US18618406

申请日：2024-03-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Dennis DE GRAAF ,  Richard BEAUDRY ,  Maxime BIRON ,  Paul JANSSEN ,  Thijs KATER ,  Kevin KORNELSEN ,  Michael Alfred Josephus KUIJKEN ,  Jan Hendrik Willem KUNTZEL ,  Stephane MARTEL ,  Maxim Aleksandrovich NASALEVICH ,  Guido SALMASO ,  Pieter-Jan VAN ZWOL

IPC: G03F1/64 ,  G03F1/62 ,  G03F7/00

CPC classification number: G03F1/64 ,  G03F1/62 ,  G03F7/70983

Abstract: A wafer including a mask on one face and at least one layer on an opposite face, wherein the mask has at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle, the method including: providing a wafer having a mask on one face and at least one layer on an opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle, the method including: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidizing environment. In any aspect, the pellicle may include a metal nitride layer.

公开(公告)号：US20220121110A1

公开(公告)日：2022-04-21

申请号：US17566764

申请日：2021-12-31

Applicant: ASML NETHERLANDS B.V.

Inventor： Zomer Silvester HOUWELING ,  Chaitanya Krishna ANDE ,  Dennis DE GRAAF ,  Thijs KATER ,  Michael Alfred Josephus KUIJKEN ,  Mahdiar VALEFI

IPC: G03F1/62

Abstract: A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.

公开(公告)号：US20210240070A1

公开(公告)日：2021-08-05

申请号：US17048875

申请日：2019-04-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Dennis DE GRAAF ,  Richard BEAUDRY ,  Maxime BIRON ,  Paul JANSSEN ,  Thijs KATER ,  Kevin KORNELSEN ,  Michael Alfred Josephus KUIJKEN ,  Jan Hendrik Willem KUNTZEL ,  Stephane MARTEL ,  Maxim Aleksandrovich NASALEVICH ,  Guido SALMASO ,  Pieter-Jan VAN ZWOL

IPC: G03F1/64 ,  G03F7/20 ,  H01L21/033 ,  H01L21/027

Abstract: A wafer including a mask on one face and at least one layer on an opposite face, wherein the mask has at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle, the method including: providing a wafer having a mask on one face and at least one layer on an opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle, the method including: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may include a metal nitride layer.

公开(公告)号：US20180239240A1

公开(公告)日：2018-08-23

申请号：US15752302

申请日：2016-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Zomer Silvester HOUWELING ,  Eric Willem Felix CASIMIRI ,  Tamara DRUZHININA ,  JANSSEN Paul ,  Michael Alfred Josephus KUIJKEN ,  Martinus Hendrikus Antonius LEENDERS ,  Sicco OOSTERHOFF ,  Mária PÉTER ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Beatrijs Louise Marie-Joseph Katrie VERBRUGGE ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  David Ferdinand VLES ,  Willem-Pieter VOORTHUIJZEN

IPC: G03F1/62 ,  G03F7/20

CPC classification number: G03F1/62 ,  G03F7/70983

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.