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公开(公告)号：US20250013142A1
公开(公告)日：2025-01-09
申请号：US18708573
申请日：2022-11-11
Applicant: ASML NETHERLANDS B.V.
Abstract: A method for forming a pellicle for use in a lithographic apparatus is disclosed. The method includes: providing a porous membrane formed from a first material; applying at least one layer of two-dimensional material to at least one side of the porous membrane; and applying a capping layer to the at least one layer of two-dimensional material on at least one side of the porous membrane such that the at least one layer of two-dimensional material is disposed between the or each capping layer and the porous membrane. The at least one layer of two-dimensional material may act to close the adjacent side of the porous membrane and to form a smoother and flatter exterior surface of the pellicle. Advantageously, this may allow the porous membrane to be protected from etching while reducing EUV flare, regardless of the material used for the capping layer.
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公开(公告)号：US20230168577A1
公开(公告)日：2023-06-01
申请号：US17922768
申请日：2021-04-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Zomer Silvester HOUWELING , Volker Dirk HILDENBRAND , Alexander Ludwig KLEIN , Paul Alexander VERMEULEN
CPC classification number: G03F1/64 , G02B5/09 , G02B5/208 , G02B5/0891
Abstract: An optical element for a lithographic apparatus, the optical element including an anchor layer selected to support a top layer having self-terminating growth in an operating lithographic apparatus or plasma containing environment. Also described is a method of manufacturing an optical element, the method including depositing a top layer on anchor layer via exposure to plasma, preferably electromagnetically induced plasma. Lithographic apparatuses including such optical elements are also described.
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Patent Agency Ranking
公开(公告)号：US20240411233A1
公开(公告)日：2024-12-12
申请号：US18699358
申请日：2022-10-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Gosse Charles DE VRIES , Sjoerd Nicolaas Lambertus DONDERS , Franciscus Johannes Joseph JANSSEN , Evgenia KURGANOVA , Abraham Jan WOLF , Ties Jan Willem BAKKER , Volker Dirk HILDENBRAND , Paul Alexander VERMEULEN , Michael ENGEL , Bernardus Antonius Johannes LUTTIKHUIS , Ronald VAN DER HAM , Jeroen Peterus Johannes VAN LIPZIG
Abstract: A lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support structure constructed to support a reticle and pellicle assembly for receipt of the radiation beam conditioned by the illumination system; a substrate table constructed to support a substrate; a projection system configured to receive the radiation beam from the reticle-pellicle assembly and to project it onto the substrate; and a heating system configured to heat a pellicle of the reticle-pellicle assembly supported by the support structure. A method for using a reticle-pellicle assembly including: illuminating the reticle-pellicle assembly with a radiation beam so as to form a patterned image on a substrate; and heating the pellicle of the reticle-pellicle assembly using a separate heat source.
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公开(公告)号：US20220276553A1
公开(公告)日：2022-09-01
申请号：US17637891
申请日：2020-08-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey NIKIPELOV , Sander BALTUSSEN , Vadim Yevgenyevich BANINE , Alexandr DOLGOV , DONMEZ NOYAN , Zomer Silvester HOUWELING , Arnoud Willem NOTENBOOM , Marcus Adrianus VAN DE KERKHOF , Ties Wouter VAN DER WOORD , Paul Alexander VERMEULEN , David Ferdinand VLES , Victoria VORONINA , Halil Gökay YEGEN
IPC: G03F1/62 , C01B32/158 , G03F7/20
Abstract: A pellicle membrane for a lithographic apparatus, the membrane including uncapped carbon nanotubes. A method of regenerating a pellicle membrane, the method including decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. A method of reducing the etch rate of a pellicle membrane, the method including providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane. An assembly for a lithographic apparatus, the assembly including a biased electrode near or including the pellicle membrane or heating means for the pellicle membrane.
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公开(公告)号：US20240411222A1
公开(公告)日：2024-12-12
申请号：US18699574
申请日：2022-10-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Inci DONMEZ NOYAN , Ties Wouter VAN DER WOORD , Johan REININK , Tim Willem Johan VAN DE GOOR , Alexander Ludwig KLEIN , Zomer Silvester HOUWELING , Paul Alexander VERMEULEN , Adrianus Johannes Maria GIESBERS , Johan Hendrik KLOOTWIJK , Lambertus Idris Johannes Catharina BERGERS
Abstract: A pellicle membrane includes a population of metal silicide crystals in a silicon-based matrix, wherein the pellicle membrane has an emissivity of 0.3 or more. Also a method of manufacturing a pellicle membrane, a pellicle assembly, a lithographic apparatus comprising such a pellicle membrane or pellicle assembly. Also the use of such a pellicle membrane, pellicle assembly, or lithographic apparatus in a lithographic apparatus or method.
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公开(公告)号：US20240116760A1
公开(公告)日：2024-04-11
申请号：US18276248
申请日：2022-02-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Paul Alexander VERMEULEN , Zomer Silvester HOUWELING
IPC: C01B32/174 , B01J19/12 , B01J19/24 , G03F1/62 , G03F7/00
CPC classification number: C01B32/174 , B01J19/121 , B01J19/24 , G03F1/62 , G03F7/70983 , B01J2219/0886 , B01J2219/0896 , B01J2219/12 , B82Y30/00 , C01B2202/36
Abstract: A carbon nanotube membrane including carbon nanotubes having a pre-selected bonding configuration or (m, n) chirality, wherein the carbon nanotube membrane has a substantial amount of carbon nanotubes having zigzag (m, 0) chirality and/or armchair (m, m) chirality. An apparatus for the treatment of a carbon-based membrane, a method for treating carbon based membranes, pellicles including carbon based membranes, lithographic apparatuses includes carbon nanotube membranes, as well as the use of carbon nanotube membranes in lithographic apparatuses and methods are also described.
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公开(公告)号：US20230314930A1
公开(公告)日：2023-10-05
申请号：US18022476
申请日：2021-07-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Vadim Yevgenyevich BANINE , Paul Alexander VERMEULEN , Cornelis Adrianus DE MEIJERE , Johnnes Hubertus Josephina MOORS , Andrey NIKIPELOV , Guido SALMASO , Marcus Adrianus VAN DE KERKHOF , Parham YAGHOOBI
CPC classification number: G03F1/64 , G03F7/70983
Abstract: An apparatus for reducing a partially oxidized reticle and pellicle assembly, the apparatus including: a support; a hydrogen supply; and an electron source. The support is for supporting a reticle and pellicle assembly. The hydrogen supply is operable to supply hydrogen in the vicinity of a pellicle of a reticle and pellicle assembly when supported by the support. The electron source is operable to direct electrons so as to be incident on a pellicle of a reticle and pellicle assembly when supported by the support.
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