公开(公告)号：US20230314930A1

公开(公告)日：2023-10-05

申请号：US18022476

申请日：2021-07-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Vadim Yevgenyevich BANINE ,  Paul Alexander VERMEULEN ,  Cornelis Adrianus DE MEIJERE ,  Johnnes Hubertus Josephina MOORS ,  Andrey NIKIPELOV ,  Guido SALMASO ,  Marcus Adrianus VAN DE KERKHOF ,  Parham YAGHOOBI

IPC: G03F1/64 ,  G03F7/20

CPC classification number: G03F1/64 ,  G03F7/70983

Abstract: An apparatus for reducing a partially oxidized reticle and pellicle assembly, the apparatus including: a support; a hydrogen supply; and an electron source. The support is for supporting a reticle and pellicle assembly. The hydrogen supply is operable to supply hydrogen in the vicinity of a pellicle of a reticle and pellicle assembly when supported by the support. The electron source is operable to direct electrons so as to be incident on a pellicle of a reticle and pellicle assembly when supported by the support.

公开(公告)号：US20240385541A1

公开(公告)日：2024-11-21

申请号：US18790520

申请日：2024-07-31

Applicant: Carl Zeiss SMT GmbH ,  ASML Netherlands B.V.

Inventor： Wilbert KRUITHOF ,  Parham YAGHOOBI ,  John LEO

IPC: G03F7/00

Abstract: A lithography system for extreme ultraviolet (EUV) radiation includes a housing (25) with an interior (24) containing a residual gas (27), and at least one gas-binding component (29) which is arranged in the interior (24) and has a gas-binding material for binding contaminating substances (28). The gas-binding component (29) has at least one flow duct (33) having at least one surface with the gas-binding material, with a gas flow of the residual gas (27) in the flow duct (33) having a Knudsen number of between 0.01 and 5, preferably between 0.01 and 0.5, in particular between 0.01 and 0.3, and with a casing (26) which encapsulates a beam path of the EUV lithography system (1) being arranged in the interior (24) of the housing (25). The casing (26) preferably has an opening (37) with a maintenance shaft (36) in which the gas-binding component (29) is arranged.

公开(公告)号：US20230063156A1

公开(公告)日：2023-03-02

申请号：US17794897

申请日：2020-12-24

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Ronald Peter ALBRIGHT ,  Kursat BAL ,  Vadim Yevgenyevich BANINE ,  Richard Joseph BRULS ,  Sjoerd Frans DE VRIES ,  Olav Waldemar Vladimir FRIJNS ,  Yang-Shan HUANG ,  Zhuangxiong HUANG ,  Johannes Henricus Wilhelmus JACOBS ,  Johannes Hubertus Josephina MOORS ,  Georgi Nanchev NENCHEV ,  Andrey NIKIPELOV ,  Thomas Maarten RAASVELD ,  Manish RANJAN ,  Edwin TE SLIGTE ,  Karl Robert UMSTADTER ,  Eray UZGÖREN ,  Marcus Adrianus VAN DE KERKHOF ,  Parham YAGHOOBI

IPC: G03F7/20

Abstract: An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.