公开(公告)号：US10908518B2

公开(公告)日：2021-02-02

申请号：US15984040

申请日：2018-05-18

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Santiago E. Delpuerto ,  Antonius Franciscus Johannes De Groot ,  Kenneth C. Henderson ,  Raymond Wilhelmus Louis Lafarre ,  Matthew Lipson ,  Louis John Markoya ,  Tammo Uitterdijk ,  Ronald Van Der Wilk ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC: G03F7/20 ,  H01L21/683 ,  H01L21/687

Abstract: A lithographic apparatus is provided. The lithographic apparatus includes a reticle and an electrostatic clamp configured to releasably hold the reticle. The electrostatic clamp includes a first substrate having opposing first and second surfaces, a plurality of burls located on the first surface and configured to contact the reticle, a second substrate having opposing first and second surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

公开(公告)号：US20180267414A1

公开(公告)日：2018-09-20

申请号：US15984040

申请日：2018-05-18

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Santiago E. DELPUERTO ,  Antonius Franciscus Johannes De Groot ,  Kenneth C. HENDERSON ,  Raymond Wilhelmus Louis LAFARRE ,  Matthew Lipson ,  Louis John Markoya ,  Tammo Uitterdijk ,  Ronald Van Der Wilk ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC: G03F7/20 ,  H01L21/67 ,  H01L21/683 ,  H01L21/687

CPC classification number: G03F7/70875 ,  G03F7/70708 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6875

Abstract: A lithographic apparatus is provided. The lithographic apparatus includes a reticle and an electrostatic clamp configured to releasably hold the reticle. The electrostatic clamp includes a first substrate having opposing first and second surfaces, a plurality of burls located on the first surface and configured to contact the reticle, a second substrate having opposing first and second surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

公开(公告)号：US10185231B2

公开(公告)日：2019-01-22

申请号：US15495548

申请日：2017-04-24

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Martinus Hendrikus Antonius Leenders ,  Sjoerd Nicolaas Lambertus Donders ,  Harry Sewell ,  Louis John Markoya ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Diane Elaine Markoya

IPC: G03F7/20

Abstract: A new way of drying and/or wetting a surface, such as a top surface of a substrate, is disclosed which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single phase extractor is only activated after the priming liquid has been provided between the single phase extractor and the surface. Priming liquid is delivered to the single phase extractor during the whole of the drying and/or wetting process.

公开(公告)号：US10649349B2

公开(公告)日：2020-05-12

申请号：US16226731

申请日：2018-12-20

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Martinus Hendrikus Antonius Leenders ,  Sjoerd Nicolaas Lambertus Donders ,  Harry Sewell ,  Louis John Markoya ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Diane Elaine Markoya

IPC: G03F7/20

Abstract: A new way of drying and/or wetting a surface, such as a top surface of a substrate, is disclosed which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single phase extractor is only activated after the priming liquid has been provided between the single phase extractor and the surface. Priming liquid is delivered to the single phase extractor during the whole of the drying and/or wetting process.

公开(公告)号：US10001713B2

公开(公告)日：2018-06-19

申请号：US14762452

申请日：2014-02-05

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Santiago E. Del Puerto ,  Matthew Lipson ,  Kenneth C. Henderson ,  Raymond Wilhelmus Louis LaFarre ,  Louis John Markoya ,  Tammo Uitterdijk ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Antonius Franciscus Johannes De Groot ,  Ronald Van Der Wilk

IPC: G03B27/52 ,  G03F7/20 ,  H01L21/67 ,  H01L21/683 ,  H01L21/687

CPC classification number: G03F7/70875 ,  G03F7/70708 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6875

Abstract: A support such as a clamp (310) is configured to releasably hold a patterning device such as a reticle (300) to secure it and prevent heat-induced deformation of it. For example, an electrostatic clamp includes a first substrate (312) having opposing first (313) and second (315) surfaces, a plurality of burls (316) located on the first surface and configured to contact the reticle, a second substrate (314) having opposing first (317) and second (319) surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements (318) are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.