公开(公告)号：US20180323042A1

公开(公告)日：2018-11-08

申请号：US15957054

申请日：2018-04-19

Applicant: Applied Materials, Inc.

Inventor： Haitao WANG ,  Anwar HUSAIN ,  Kartik RAMASWAMY ,  Jason A. KENNEY ,  Jeffrey LUDWIG ,  Chunlei ZHANG ,  Wonseok LEE

IPC: H01J37/32 ,  H01L21/67 ,  H01L21/683

CPC classification number: H01J37/32642 ,  H01J37/32715 ,  H01J2237/334 ,  H01L21/67069 ,  H01L21/6833

Abstract: The present disclosure generally relates to methods of and apparatuses for controlling a plasma sheath near a substrate edge. The apparatus includes an auxiliary electrode that may be positioned adjacent an electrostatic chuck. The auxiliary electrode is recursively fed from a power source using equal length and equal impedance feeds. The auxiliary electrode is vertically actuatable, and is tunable with respect to ground or other frequencies responsible for plasma generation. Methods of using the same are also provided.

公开(公告)号：US20220262600A1

公开(公告)日：2022-08-18

申请号：US17175216

申请日：2021-02-12

Applicant: Applied Materials, Inc.

Inventor： Ming XU ,  Ashley Mutsuo OKADA ,  Michael D. WILLWERTH ,  Duc Dang BUCKIUS ,  Jeffrey LUDWIG ,  Aditi MITHUN ,  Benjamin SCHWARZ

IPC: H01J37/32 ,  H01L21/3065

Abstract: A gas distribution apparatus is provided having a first reservoir with a first upstream end and a first downstream end and a second reservoir with a second upstream end and a second downstream end. A reservoir switch valve is in fluid communication with the first downstream end of the first reservoir and the second downstream end of the second reservoir. The reservoir switch valve operable to selectively couple the first reservoir to an outlet of the reservoir switch valve when in a first state, and couple the second reservoir to the outlet of the reservoir switch valve when in a second state. A plurality of proportional flow control valves are provided having inlets coupled in parallel to the outlet of the reservoir switch valve The plurality of proportional flow control valves have outlets configured to provide gas to a processing chamber.