公开(公告)号：US10253406B2

公开(公告)日：2019-04-09

申请号：US15451995

申请日：2017-03-07

Applicant: Applied Materials, Inc.

Inventor： Laksheswar Kalita ,  Prerna S. Goradia ,  Geetika Bajaj ,  Yogita Pareek ,  Yixing Lin ,  Dmitry Lubomirsky ,  Ankur Kadam ,  Bipin Thakur ,  Kevin A. Papke ,  Kaushik Vaidya

IPC: C25D3/54 ,  C25D5/18 ,  C25D5/48 ,  C25D11/34 ,  C23C8/12 ,  C22F1/16 ,  C23C8/16 ,  C25D5/50 ,  C25D11/08

Abstract: The present disclosure generally relates to methods of electro-chemically forming yttria or yttrium oxide. The methods may include the optional preparation of a an electrochemical bath, the electrodepositon of yttria or yttrium oxide onto a substrate, removal of solvent form the surface of the substrate, and post treatment of the substrate having the electrodeposited yttria or yttrium oxide thereon.