-
公开(公告)号:US10407789B2
公开(公告)日:2019-09-10
申请号:US15835067
申请日:2017-12-07
发明人: Balaji Ganapathy , Ankur Kadam , Prerna S. Goradia , Laksheswar Kalita , Tapash Chakraborty , Vijay Bhan Sharma
IPC分类号: C25D3/44 , C25D5/44 , C25D5/48 , C25D5/18 , C25D7/00 , C25D5/50 , C25D9/08 , C25D11/04 , C25D5/02
摘要: In one implementation, a method of depositing a material on a substrate is provided. The method comprises positioning an aluminum-containing substrate in an electroplating solution, the electroplating solution comprising a non-aqueous solvent and a deposition precursor. The method further comprises depositing a coating on the aluminum-containing substrate, the coating comprising aluminum or aluminum oxide. Depositing the coating comprises applying a first current for a first time-period to nucleate a surface of the aluminum-containing substrate and applying a second current for a second time-period, wherein the first current is greater than the second current and the first time-period is less than the second time-period to form the coating on the nucleated surface of the aluminum-containing substrate.
-
公开(公告)号:US10253406B2
公开(公告)日:2019-04-09
申请号:US15451995
申请日:2017-03-07
发明人: Laksheswar Kalita , Prerna S. Goradia , Geetika Bajaj , Yogita Pareek , Yixing Lin , Dmitry Lubomirsky , Ankur Kadam , Bipin Thakur , Kevin A. Papke , Kaushik Vaidya
IPC分类号: C25D3/54 , C25D5/18 , C25D5/48 , C25D11/34 , C23C8/12 , C22F1/16 , C23C8/16 , C25D5/50 , C25D11/08
摘要: The present disclosure generally relates to methods of electro-chemically forming yttria or yttrium oxide. The methods may include the optional preparation of a an electrochemical bath, the electrodepositon of yttria or yttrium oxide onto a substrate, removal of solvent form the surface of the substrate, and post treatment of the substrate having the electrodeposited yttria or yttrium oxide thereon.
-
公开(公告)号:US10233554B2
公开(公告)日:2019-03-19
申请号:US15452062
申请日:2017-03-07
发明人: Yogita Pareek , Laksheswar Kalita , Geetika Bajaj , Kevin A. Papke , Ankur Kadam , Bipin Thakur , Yixing Lin , Dmitry Lubomirsky , Prerna S. Goradia
摘要: The present disclosure generally relates to methods of electro-chemically forming aluminum or aluminum oxide. The methods may include the optional preparation of a an electrochemical bath, the electrodepositon of aluminum or aluminum oxide onto a substrate, removal of solvent form the surface of the substrate, and post treatment of the substrate having the electrodeposited aluminum or aluminum oxide thereon.
-
-