METHOD AND APPARATUS FOR EDGE FINISHING OF HIGH MECHANICAL STRENGTH THIN GLASS SUBSTRATES

    公开(公告)号:US20220339751A1

    公开(公告)日:2022-10-27

    申请号:US17621049

    申请日:2020-06-11

    Abstract: Processes and devices by which a brittle material substrate may be edge formed and finished to simultaneously remove corresponding damage remaining on the edges in the areas formed by cutting and separation while imposing a desired edge profile and achieving a desired mechanical edge strength. Processes of the present disclosure may include a chemical and mechanical brush polishing process configured to shape and/or polish a surface of one or more thin substrates. A plurality of substrates may be arranged in a stacked configuration, and engineered interposer devices may be arranged between the stacked substrates. The interposers may provide between the substrates and may direct filament placement during brushing so as to guide material removal on the substrate edges. Substrate edge profile shapes, including symmetric and asymmetric profiles, may be formed by strategic manipulation of interposer properties including dimensions, mechanical features, material properties, and positioning.

    POLISHING EXTREMELY THIN SILICA SHEETS AND POLISHED SHEETS

    公开(公告)号:US20180169826A1

    公开(公告)日:2018-06-21

    申请号:US15846778

    申请日:2017-12-19

    CPC classification number: B24B37/042

    Abstract: A method of manufacturing a sheet of fused silica includes polishing a sheet of fused silica having a thickness of less than 500 μm and a major face surface area of at least 6π square inches. The polishing is performed by removing less than 100 micrometers depth of material of a major surface of the sheet, such as by bonding the sheet to a substrate, polishing a first major side of the sheet, debonding the sheet from the substrate, flipping the sheet, bonding the flipped sheet to the substrate or a new substrate, and polishing a second major side of the sheet. Prior to polishing, the sheet has a peak-to-valley waviness of at least 1 micrometer, but after polishing has peak-to-valley waviness less than 500 nanometers.

    EDLC ELECTRODE AND MANUFACTURING PROCESS THEREOF
    5.
    发明申请
    EDLC ELECTRODE AND MANUFACTURING PROCESS THEREOF 审中-公开
    EDLC电极及其制造工艺

    公开(公告)号:US20150062779A1

    公开(公告)日:2015-03-05

    申请号:US14164796

    申请日:2014-01-27

    CPC classification number: H01G11/86 H01G11/32 H01M4/88 H01M4/96 Y02E60/13

    Abstract: A method of forming a carbon-based electrode includes forming a mixture of activated carbon particles, carbon black particles, binder, and an optional liquid, fibrillating the binder to form a fibrillated mixture, and forming a carbon mat from the fibrillated mixture, wherein the mixture, during the forming of the mixture, is maintained at a temperature less than 19° C. The low temperature process facilitates dispersive and distributive mixing of the components of the carbon mat.

    Abstract translation: 形成碳基电极的方法包括形成活性炭颗粒,炭黑颗粒,粘合剂和任选液体的混合物,使粘合剂原纤化以形成原纤化混合物,并从原纤化混合物形成碳毡,其中 混合物在形成混合物期间保持在低于19℃的温度。低温方法有利于碳毡组分的分散和分配混合。

    EDGE FINISHING APPARATUS AND METHODS FOR LAMINATE PRODUCTION

    公开(公告)号:US20170232571A1

    公开(公告)日:2017-08-17

    申请号:US15427484

    申请日:2017-02-08

    Abstract: Embodiments of a grinding wheel and methods for edge finishing glass substrates are disclosed. In one or more embodiments, the grinding wheel includes a metal matrix structure, a plurality of primary abrasive particles and a plurality of secondary abrasive particles bonded to the matrix structure, wherein one of the primary abrasive diamond particles and secondary abrasive particles comprises resin bond diamond particles. In some embodiments, the other of the primary abrasive diamond particles and secondary abrasive particles comprises metal bond diamond particles.

    Laser sintering system and method for forming high purity, low roughness silica glass
    7.
    发明授权
    Laser sintering system and method for forming high purity, low roughness silica glass 有权
    激光烧结体系及形成高纯度,低糙度的二氧化硅玻璃的方法

    公开(公告)号:US09422187B1

    公开(公告)日:2016-08-23

    申请号:US14862771

    申请日:2015-09-23

    Abstract: A system and method for making a thin sintered silica sheet is provided. The method includes providing a soot deposition surface and forming a glass soot sheet by delivering a stream of glass soot particles from a soot generating device to the soot deposition surface. The method includes providing a sintering laser positioned to direct a laser beam onto the soot sheet and forming a sintered glass sheet from the glass soot sheet by delivering a laser beam from the sintering laser onto the glass soot sheet. The sintered glass sheet formed by the laser sintering system or method is thin, has low surfaces roughness and/or low contaminant levels.

    Abstract translation: 提供一种用于制造薄的烧结二氧化硅片的系统和方法。 该方法包括提供烟灰沉积表面并通过将烟灰发生装置的玻璃烟灰颗粒流输送到烟灰沉积表面来形成玻璃烟灰片。 该方法包括提供烧结激光器,其定位成将激光束引导到烟灰片上,并通过将来自烧结激光器的激光束输送到玻璃烟炱片上,从玻璃烟炱片形成烧结玻璃片。 通过激光烧结体系或方法形成的烧结玻璃板薄,表面粗糙度低和/或污染物含量低。

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