Abstract:
The invention refers to a method for analyzing a defect of an optical element for the extreme ultra-violet wavelength range comprising at least one substrate and at least one multi-layer structure, the method comprising the steps: (a) determining first data by exposing the defect to ultra-violet radiation, (b) determining second data by scanning the defect with a scanning probe microscope, (c) determining third data by scanning the defect with a scanning particle microscope, and (d) com-bining the first, the second and the third data.
Abstract:
The present invention refers to an apparatus and a method for investigating an object with a scanning particle microscope and at least one scanning probe microscope with a probe, wherein the scanning particle microscope and the at least one scanning probe microscope are spaced with respect to each other in a common vacuum chamber so that a distance between the optical axis of the scanning particle microscope and the measuring point of the scanning probe microscope in the direction perpendicular to the optical axis of the scanning particle microscope is larger than the maximum field of view of both the scanning probe microscope and the scanning particle microscope, wherein the method comprises the step of determining the distance between the measuring point of the scanning probe microscope and the optical axis of the scanning particle microscope.
Abstract:
The present invention refers to an apparatus and a method for investigating an object with a scanning particle microscope and at least one scanning probe microscope with a probe, wherein the scanning particle microscope and the at least one scanning probe microscope are spaced with respect to each other in a common vacuum chamber so that a distance between the optical axis of the scanning particle microscope and the measuring point of the scanning probe microscope in the direction perpendicular to the optical axis of the scanning particle microscope is larger than the maximum field of view of both the scanning probe microscope and the scanning particle microscope, wherein the method comprises the step of determining the distance between the measuring point of the scanning probe microscope and the optical axis of the scanning particle microscope.
Abstract:
The invention refers to a probe assembly for a scanning probe microscope which comprises at least one first probe-adapted for analyzing a specimen, at least one second probe adapted for modifying the specimen and at least one motion element associated with the probe assembly and adapted for scanning one of the probes being in a working position across a surface of the specimen so that the at least one first probe interacts with the specimen whereas the at least one second probe is in a neutral position in which it does not interact with the specimen and to bring the at least one second probe into a position so that the at least one second probe can modify a region of the specimen analyzed with the at least one first probe.
Abstract:
The invention refers to a probe assembly for a scanning probe microscope which comprises at least one first probe-adapted for analyzing a specimen, at least one second probe adapted for modifying the specimen and at least one motion element associated with the probe assembly and adapted for scanning one of the probes being in a working position across a surface of the specimen so that the at least one first probe interacts with the specimen whereas the at least one second probe is in a neutral position in which it does not interact with the specimen and to bring the at least one second probe into a position so that the at least one second probe can modify a region of the specimen analyzed with the at least one first probe.