METHOD AND APPARATUS FOR ANALYZING AND FOR REMOVING A DEFECT OF AN EUV PHOTOMASK
    1.
    发明申请
    METHOD AND APPARATUS FOR ANALYZING AND FOR REMOVING A DEFECT OF AN EUV PHOTOMASK 审中-公开
    用于分析和去除EUV光刻胶缺陷的方法和装置

    公开(公告)号:US20140165236A1

    公开(公告)日:2014-06-12

    申请号:US14137731

    申请日:2013-12-20

    CPC classification number: G01Q30/02 B82Y10/00 B82Y40/00 G03F1/22 G03F1/84 G03F1/86

    Abstract: The invention refers to a method for analyzing a defect of an optical element for the extreme ultra-violet wavelength range comprising at least one substrate and at least one multi-layer structure, the method comprising the steps: (a) determining first data by exposing the defect to ultra-violet radiation, (b) determining second data by scanning the defect with a scanning probe microscope, (c) determining third data by scanning the defect with a scanning particle microscope, and (d) com-bining the first, the second and the third data.

    Abstract translation: 本发明涉及用于分析包括至少一个基底和至少一个多层结构的用于极紫外波长范围的光学元件的缺陷的方法,所述方法包括以下步骤:(a)通过曝光来确定第一数据 (b)通过用扫描探针显微镜扫描缺陷来确定第二数据,(c)通过用扫描粒子显微镜扫描缺陷来确定第三数据,以及(d)将第一数据, 第二和第三个数据。

    APPARATUS AND METHOD FOR INVESTIGATING AN OBJECT
    2.
    发明申请
    APPARATUS AND METHOD FOR INVESTIGATING AN OBJECT 有权
    用于调查对象的装置和方法

    公开(公告)号:US20140027512A1

    公开(公告)日:2014-01-30

    申请号:US14038148

    申请日:2013-09-26

    Abstract: The present invention refers to an apparatus and a method for investigating an object with a scanning particle microscope and at least one scanning probe microscope with a probe, wherein the scanning particle microscope and the at least one scanning probe microscope are spaced with respect to each other in a common vacuum chamber so that a distance between the optical axis of the scanning particle microscope and the measuring point of the scanning probe microscope in the direction perpendicular to the optical axis of the scanning particle microscope is larger than the maximum field of view of both the scanning probe microscope and the scanning particle microscope, wherein the method comprises the step of determining the distance between the measuring point of the scanning probe microscope and the optical axis of the scanning particle microscope.

    Abstract translation: 本发明涉及一种使用扫描粒子显微镜和至少一个具有探针的扫描探针显微镜来研究物体的装置和方法,其中扫描粒子显微镜和至少一个扫描探针显微镜相对于彼此间隔开 在共同的真空室中,使得扫描粒子显微镜的光轴与扫描探针显微镜的测量点在垂直于扫描粒子显微镜的光轴的方向上的距离大于两者的最大视场 扫描探针显微镜和扫描粒子显微镜,其中,该方法包括确定扫描探针显微镜的测量点与扫描粒子显微镜的光轴之间的距离的步骤。

    Apparatus and method for investigating an object
    3.
    发明授权
    Apparatus and method for investigating an object 有权
    用于调查物体的装置和方法

    公开(公告)号:US09115981B2

    公开(公告)日:2015-08-25

    申请号:US14038148

    申请日:2013-09-26

    Abstract: The present invention refers to an apparatus and a method for investigating an object with a scanning particle microscope and at least one scanning probe microscope with a probe, wherein the scanning particle microscope and the at least one scanning probe microscope are spaced with respect to each other in a common vacuum chamber so that a distance between the optical axis of the scanning particle microscope and the measuring point of the scanning probe microscope in the direction perpendicular to the optical axis of the scanning particle microscope is larger than the maximum field of view of both the scanning probe microscope and the scanning particle microscope, wherein the method comprises the step of determining the distance between the measuring point of the scanning probe microscope and the optical axis of the scanning particle microscope.

    Abstract translation: 本发明涉及一种使用扫描粒子显微镜和至少一个具有探针的扫描探针显微镜来研究物体的装置和方法,其中扫描粒子显微镜和至少一个扫描探针显微镜相对于彼此间隔开 在共同的真空室中,使得扫描粒子显微镜的光轴与扫描探针显微镜的测量点在垂直于扫描粒子显微镜的光轴的方向上的距离大于两者的最大视场 扫描探针显微镜和扫描粒子显微镜,其中,该方法包括确定扫描探针显微镜的测量点与扫描粒子显微镜的光轴之间的距离的步骤。

    Apparatus and method for analyzing and modifying a specimen surface
    4.
    发明授权
    Apparatus and method for analyzing and modifying a specimen surface 有权
    用于分析和修改试样表面的装置和方法

    公开(公告)号:US08769709B2

    公开(公告)日:2014-07-01

    申请号:US13954617

    申请日:2013-07-30

    CPC classification number: G01Q10/00 G01Q70/06 G01Q80/00 G03F1/72 G03F1/82

    Abstract: The invention refers to a probe assembly for a scanning probe microscope which comprises at least one first probe-adapted for analyzing a specimen, at least one second probe adapted for modifying the specimen and at least one motion element associated with the probe assembly and adapted for scanning one of the probes being in a working position across a surface of the specimen so that the at least one first probe interacts with the specimen whereas the at least one second probe is in a neutral position in which it does not interact with the specimen and to bring the at least one second probe into a position so that the at least one second probe can modify a region of the specimen analyzed with the at least one first probe.

    Abstract translation: 本发明涉及一种用于扫描探针显微镜的探针组件,其包括至少一个适用于分析样本的第一探针,至少一个适于修改样本的第二探针和与该探针组件相关联的至少一个运动元件, 扫描探针中的一个位于穿过试样的表面的工作位置,使得至少一个第一探针与试样相互作用,而至少一个第二探针处于其不与试样相互作用的中性位置, 以使至少一个第二探针进入位置,使得至少一个第二探针可以修改用至少一个第一探针分析的样本的区域。

    APPARATUS AND METHOD FOR ANALYZING AND MODIFYING A SPECIMEN SURFACE
    5.
    发明申请
    APPARATUS AND METHOD FOR ANALYZING AND MODIFYING A SPECIMEN SURFACE 有权
    用于分析和修改样本表面的装置和方法

    公开(公告)号:US20140007306A1

    公开(公告)日:2014-01-02

    申请号:US13954617

    申请日:2013-07-30

    CPC classification number: G01Q10/00 G01Q70/06 G01Q80/00 G03F1/72 G03F1/82

    Abstract: The invention refers to a probe assembly for a scanning probe microscope which comprises at least one first probe-adapted for analyzing a specimen, at least one second probe adapted for modifying the specimen and at least one motion element associated with the probe assembly and adapted for scanning one of the probes being in a working position across a surface of the specimen so that the at least one first probe interacts with the specimen whereas the at least one second probe is in a neutral position in which it does not interact with the specimen and to bring the at least one second probe into a position so that the at least one second probe can modify a region of the specimen analyzed with the at least one first probe.

    Abstract translation: 本发明涉及一种用于扫描探针显微镜的探针组件,其包括至少一个适用于分析样本的第一探针,至少一个适于修改样本的第二探针和与该探针组件相关联的至少一个运动元件, 扫描探针中的一个位于穿过试样的表面的工作位置,使得至少一个第一探针与试样相互作用,而至少一个第二探针处于其不与试样相互作用的中性位置, 以使至少一个第二探针进入位置,使得至少一个第二探针可以修改用至少一个第一探针分析的样本的区域。

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