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1.发明授权Arrangement for identifying uncontrolled events at the process module level and methods thereof 有权用于在过程模块级别识别不受控制的事件的安排及其方法公开(公告)号：US08983631B2
公开(公告)日：2015-03-17
申请号：US12555674
申请日：2009-09-08
IPC分类号： G05B11/01 , G06F19/00 , G06F9/50 , G05B19/418 , G06F11/20
CPC分类号： G06F9/5027 , G05B19/4184 , G05B2219/31202 , G05B2219/31293 , G05B2219/31318 , G05B2219/31481 , G05B2219/32209 , G05B2219/45031 , G06F11/2035 , G06F11/2043 , Y02P90/14 , Y02P90/18
摘要： A process-level troubleshooting architecture (PLTA) configured to facilitate substrate processing in a plasma processing system is provided. The architecture includes a process module controller. The architecture also includes a plurality of sensors, wherein each sensor of the plurality of sensors communicates with the process module controller to collect sensed data about one or more process parameters. The architecture further includes a process-module-level analysis server, wherein the process-module-level analysis server communicates directly with the plurality of sensors and the process module controller. The process-module-level analysis server is configured for receiving data, wherein the data include at least one of the sensed data from the plurality of sensors and process module and chamber data from the process module controller. The process-module-level analysis server is also configured for analyzing the data and sending interdiction data directly to the process module controller when a problem is identified during the substrate processing.
摘要翻译： 提供了一种配置为促进等离子体处理系统中的基板处理的过程级故障排除架构（PLTA）。 该架构包括一个进程模块控制器。 该架构还包括多个传感器，其中多个传感器中的每个传感器与过程模块控制器通信以收集关于一个或多个过程参数的感测数据。 该体系结构还包括一个过程模块级分析服务器，其中过程模块级分析服务器与多个传感器和过程模块控制器直接通信。 过程模块级分析服务器被配置为用于接收数据，其中数据包括来自多个传感器的感测数据中的至少一个以及来自处理模块控制器的处理模块和室数据。 过程模块级分析服务器还被配置为当在衬底处理期间识别出问题时，分析数据并将拦截数据直接发送到过程模块控制器。
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2.发明申请ARRANGEMENT FOR IDENTIFYING UNCONTROLLED EVENTS AT THE PROCESS MODULE LEVEL AND METHODS THEREOF 有权在过程模块级别识别非受控事件的安排及其方法公开(公告)号：US20100332012A1
公开(公告)日：2010-12-30
申请号：US12555674
申请日：2009-09-08
CPC分类号： G06F9/5027 , G05B19/4184 , G05B2219/31202 , G05B2219/31293 , G05B2219/31318 , G05B2219/31481 , G05B2219/32209 , G05B2219/45031 , G06F11/2035 , G06F11/2043 , Y02P90/14 , Y02P90/18
摘要： A process-level troubleshooting architecture (PLTA) configured to facilitate substrate processing in a plasma processing system is provided. The architecture includes a process module controller. The architecture also includes a plurality of sensors, wherein each sensor of the plurality of sensors communicates with the process module controller to collect sensed data about one or more process parameters. The architecture further includes a process-module-level analysis server, wherein the process-module-level analysis server communicates directly with the plurality of sensors and the process module controller. The process-module-level analysis server is configured for receiving data, wherein the data include at least one of the sensed data from the plurality of sensors and process module and chamber data from the process module controller. The process-module-level analysis server is also configured for analyzing the data and sending interdiction data directly to the process module controller when a problem is identified during the substrate processing.
摘要翻译： 提供了一种配置为促进等离子体处理系统中的基板处理的过程级故障排除架构（PLTA）。 该架构包括一个进程模块控制器。 该架构还包括多个传感器，其中多个传感器中的每个传感器与过程模块控制器通信以收集关于一个或多个过程参数的感测数据。 该体系结构还包括一个过程模块级分析服务器，其中过程模块级分析服务器与多个传感器和过程模块控制器直接通信。 过程模块级分析服务器被配置为用于接收数据，其中数据包括来自多个传感器的感测数据中的至少一个以及来自处理模块控制器的处理模块和室数据。 过程模块级分析服务器还被配置为当在衬底处理期间识别出问题时，分析数据并将拦截数据直接发送到过程模块控制器。
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3.发明授权公开(公告)号：US06622286B1
公开(公告)日：2003-09-16
申请号：US09608599
申请日：2000-06-30
申请人： Tuan Ngo , Farro Kaveh , Connie Lam , Chung-Ho Huang , Tuqiang Ni , Anthony T. Le , Steven Salkow
发明人： Tuan Ngo , Farro Kaveh , Connie Lam , Chung-Ho Huang , Tuqiang Ni , Anthony T. Le , Steven Salkow
IPC分类号： G06F1750
CPC分类号： H01J37/32431 , G05B19/0421 , G05B2219/2208 , G05B2219/25434 , G05B2219/45031 , H01J37/32 , H01J37/32935
摘要： A central controller for use in a semiconductor manufacturing equipment integrates a plurality of controllers with an open architecture allowing real-time communication between the various control loops. The central controller includes at least one central processing unit (CPU) executing high level input output (i/o) and control algorithms and at least one integrated i/o controller providing integrated interface to sensors and control hardware. The integrated i/o controller performs basic i/o and low level control functions and communicates with the CPU through a bus to perform or enable controls of various subsystems of the semiconductor manufacturing equipment.
摘要翻译： 用于半导体制造设备的中央控制器将多个控制器与允许各种控制回路之间的实时通信的开放架构集成。 中央控制器包括执行高电平输入输出（i / o）和控制算法的至少一个中央处理单元（CPU）以及提供与传感器和控制硬件的集成接口的至少一个集成i / o控制器。 集成i / o控制器执行基本的I / O和低级控制功能，并通过总线与CPU进行通信，以执行或启用对半导体制造设备的各种子系统的控制。
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