公开(公告)号：US20210087676A1

公开(公告)日：2021-03-25

申请号：US16467828

申请日：2017-12-08

Applicant: DIAM CONCEPT

Inventor： Alix GICQUEL ,  François DES PORTES

IPC: C23C16/27 ,  C23C16/455 ,  C23C16/458 ,  C23C16/46 ,  C30B25/14 ,  C30B25/20 ,  C30B25/12 ,  C30B25/08 ,  C30B29/04 ,  C23C16/511 ,  H01J37/32

Abstract: The invention relates to a microwave plasma-assisted deposition modular reactor for manufacturing synthetic diamond. The reactor has at least three modulation elements selected from: a crown adapted to be positioned between a first enclosure part and a second enclosure part; a substrate holder module mobile in vertical translation and in rotation, in contact with a quarter-wave and including at least one fluid cooling system; a tray mobile in vertical translation in order to change the shape and volume of the resonant cavity and including through openings allowing the gases to pass; a gas distribution module, including a removable gas distribution plate comprising an inner surface, an outer surface, and a plurality of gas distribution nozzles forming channels between said surfaces capable of conducting a gas flow, and a support device connected to a cooling system and adapted to accommodate the removable gas distribution plate; and a substrate cooling control module including a removable thermal resistance gas injection device.