公开(公告)号：US20180207581A1

公开(公告)日：2018-07-26

申请号：US15746266

申请日：2016-06-15

Applicant: Edwards Limited

Inventor： Christopher Mark Bailey ,  Clive Marcus Lloyd Tunna ,  Jack Raymond Tattersall ,  Ingo Stephen Graham ,  Michael Roger Czerniak ,  Gary Peter Knight ,  Darren Mennie ,  Duncan Michael Price ,  Derek Martin Baker ,  Andrew James Seeley

IPC: B01D53/75 ,  B01D53/68 ,  B01D53/78 ,  C23C16/44 ,  C23C16/24 ,  H01J37/32 ,  F04C19/00 ,  F04C29/00 ,  F04C23/00 ,  A62C4/00 ,  F23G7/06

CPC classification number: B01D53/75 ,  A62C4/00 ,  B01D53/68 ,  B01D53/78 ,  B01D2252/103 ,  B01D2257/204 ,  B01D2257/206 ,  B01D2258/0216 ,  C23C16/24 ,  C23C16/4405 ,  C23C16/4408 ,  C23C16/4412 ,  F04C19/001 ,  F04C19/005 ,  F04C23/006 ,  F04C29/0092 ,  F23G7/06 ,  H01J37/32807 ,  H01J37/32862 ,  H01J2237/335 ,  Y02C20/30

Abstract: Dry pumps are used to pump a variety of gas mixtures from the semiconductor industry. The present invention provides a liquid ring pump located between the dry pump and an abatement device to remove soluble corrosive materials prior to the exhaust gases entry to the abatement device, the work fluid exhausted from the liquid ring pump being separated from the gas prior to entry to the abatement device.