公开(公告)号：US20160077440A1

公开(公告)日：2016-03-17

申请号：US14946206

申请日：2015-11-19

Applicant: FUJIFILM CORPORATION

Inventor： Tsukasa YAMANAKA ,  Toru FUJIMORI

IPC: G03F7/42

CPC classification number: G03F7/426 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/423 ,  G03F7/425

Abstract: The present invention has an object to provide a pattern peeling method which is excellent in peelability and causes less damage to a substrate, a method for manufacturing an electronic device, including the pattern peeling method, and an electronic device manufactured by the method for manufacturing an electronic device. The present invention includes a resist film forming step of applying an actinic ray-sensitive or radiation-sensitive resin composition onto a substrate to form a resist film; an exposing step of exposing the resist film; a developing step of developing the exposed resist film using a developing liquid containing an organic solvent to form a negative-type pattern; and a peeling step of peeling the negative-type pattern using the following liquid A or B: A: a liquid containing a sulfoxide compound and/or an amide compound; or B: a liquid containing sulfuric acid and hydrogen peroxide.

Abstract translation: 本发明的目的是提供一种图案剥离方法，该剥离方法具有优异的剥离性和对基材的损害较小，包括图案剥离方法的电子装置的制造方法，以及通过该方法制造的电子装置 电子设备。 本发明包括在基板上涂布光化射线敏感性或辐射敏感性树脂组合物以形成抗蚀剂膜的抗蚀剂膜形成步骤; 暴露所述抗蚀剂膜的曝光步骤; 使用含有有机溶剂的显影液显影曝光的抗蚀剂膜以形成负型图案的显影步骤; 以及使用以下液体A或B剥离负型图案的剥离步骤：A：含有亚砜化合物和/或酰胺化合物的液体; 或B：含硫酸和过氧化氢的液体。

公开(公告)号：US20180120697A1

公开(公告)日：2018-05-03

申请号：US15854780

申请日：2017-12-27

Applicant: FUJIFILM Corporation

Inventor： Toru FUJIMORI ,  Toru TSUCHIHASHI

IPC: G03F7/004

CPC classification number: G03F7/0044 ,  G03F7/0042

Abstract: An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive composition which has excellent heat stability and makes it possible to achieve high sensitivity and good roughness characteristics. The actinic ray-sensitive or radiation-sensitive composition according to the present invention contains (A) a compound in which in an organic/inorganic composite composition containing a metal or metalloid element, the aggregated domain size of the metal or metalloid element is 1 to 5 nm, and 1.2 to 2.0 mol times of a carboxylic acid and/or a carboxylic acid derivative with respect to the metal or metalloid element exists to form a coordinated structure; (B) a compound (Q) capable of generating an acid upon irradiation with actinic rays or radiation; and (C) an organic solvent.

公开(公告)号：US20160147154A1

公开(公告)日：2016-05-26

申请号：US15011813

申请日：2016-02-01

Applicant: FUJIFILM Corporation

Inventor： Hiroo TAKIZAWA ,  Toru FUJIMORI ,  Wataru NIHASHI ,  Shuji HIRANO ,  Natsumi YOKOKAWA

IPC: G03F7/32 ,  G03F7/038 ,  G03F7/20

CPC classification number: G03F7/325 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2004 ,  G03F7/2065 ,  G03F7/26 ,  G03F7/30 ,  G03F7/40

Abstract: There are provided a pattern formation method, including: (1) forming a film using an active light-sensitive or radiation-sensitive resin composition; (2) exposing the film to active light or radiation; and (3) developing the exposed film using a developer including an organic solvent, wherein the active light-sensitive or radiation-sensitive resin composition contains a resin (A) having specific repeating units, and a crosslinking agent (C).

Abstract translation: 提供了图案形成方法，其包括：（1）使用活性光敏或辐射敏感性树脂组合物形成膜; （2）将膜暴露于活性光或辐射; 和（3）使用包含有机溶剂的显影剂显影曝光的膜，其中活性光敏或辐射敏感性树脂组合物含有具有特定重复单元的树脂（A）和交联剂（C）。

公开(公告)号：US20130306919A1

公开(公告)日：2013-11-21

申请号：US13953748

申请日：2013-07-30

Applicant: FUJIFILM CORPORATION

Inventor： Yoichi MARUYAMA ,  Hiroyuki EINAGA ,  Toru FUJIMORI ,  Kazuto SHIMADA ,  Tomotaka TSUCHIMURA ,  Yushi KANEKO

IPC: G02B5/23

CPC classification number: G02B5/23 ,  G02B5/223 ,  G03F7/0007 ,  G03F7/029 ,  G03F7/031 ,  G03F7/033 ,  G03F7/105 ,  H01L27/14621

Abstract: The invention provides a photosensitive resin composition that includes titanium black, a photopolymerizable compound, a resin A having an acid value of from 70 mgKOH/g to 250 mgKOH/g, a resin B having an acid value of from 26 mgKOH/g to 65 mgKOH/g, a photopolymerization initiator, and a solvent, the photopolymerization initiator including an oxime photopolymerization compound.

Abstract translation: 本发明提供一种感光性树脂组合物，其包含钛黑，光聚合性化合物，酸值为70mgKOH / g〜250mgKOH / g的树脂A，酸值为26mgKOH / g〜65的树脂B mgKOH / g，光聚合引发剂和溶剂，光聚合引发剂包括肟光聚合化合物。