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    TREATMENT LIQUID AND PATTERN FORMING METHOD
    2.
    发明申请
    TREATMENT LIQUID AND PATTERN FORMING METHOD 有权

    公开(公告)号：US20220308449A1

    公开(公告)日：2022-09-29

    申请号：US17833904

    申请日：2022-06-07

    Applicant: FUJIFILM Corporation

    Inventor： Toru TSUCHIHASHI ,  Satomi TAKAHASHI ,  Tetsuya SHIMIZU

    IPC: G03F7/004

    Abstract: The present invention provides a treatment liquid excellent in resolution, a property of suppressing reduction in film thickness, and a property of suppressing residues, in a case of being used for at least one of developing or washing a resist film. Further, the present invention provides a pattern forming method for the above-described treatment liquid. The treatment liquid of the present invention is a treatment liquid for patterning a resist film, which is used for performing at least one of development or washing after exposure on a resist film obtained from an actinic ray-sensitive or radiation-sensitive composition, the treatment liquid including a first organic solvent that satisfies a predetermined condition and a second organic solvent that satisfies a predetermined condition.

    METHOD FOR DEVELOPING RESIST, METHOD FOR FORMING A RESIST PATTERN, METHOD FOR PRODUCING A MOLD, AND DEVELOPING FLUID UTILIZED IN THESE METHODS
    5.
    发明申请
    METHOD FOR DEVELOPING RESIST, METHOD FOR FORMING A RESIST PATTERN, METHOD FOR PRODUCING A MOLD, AND DEVELOPING FLUID UTILIZED IN THESE METHODS 有权
    用于发展耐药性的方法，形成耐药性图案的方法，用于生产模具的方法和利用这些方法开发的流体

    公开(公告)号：US20150008211A1

    公开(公告)日：2015-01-08

    申请号：US14497616

    申请日：2014-09-26

    Applicant: FUJIFILM Corporation

    Inventor： Ikuo TAKANO ,  Toru TSUCHIHASHI ,  Tomokazu SEKI

    IPC: G03F7/32 ,  G03F7/00

    CPC classification number: G03F7/32 ,  G03F7/0002 ,  G03F7/0017 ,  G03F7/039 ,  G03F7/325 ,  G11B5/82 ,  H01L21/0337

    Abstract: A method for developing a non chemically amplified resist employs a developing fluid having a carboxylic acid compound, which is a carboxylic acid ester having branched chain alkyl groups and a total carbon number of 8 or greater, as a main component. It is particularly preferable for the carboxylic acid compound to be at least one of isobutyl butyrate, butyl isobutyrate, isobutyl isobutyrate, isoamyl isobutyrate, and 2-methylbutyrate 2-methylbutyl. It is also preferable for the non chemically amplified resist to be a resist having a copolymer of an α-chloroacrylate ester compound and an α-methylstyrene compound as a main component.

    Abstract translation: 用于开发非化学放大抗蚀剂的方法采用具有羧酸化合物的显影液，其是具有支链烷基和总碳数为8以上的羧酸酯作为主要成分。 特别优选羧酸化合物为丁酸异丁酯，异丁酸丁酯，异丁酸异丁酯，异丁酸异戊酯和2-甲基丁酸2-甲基丁酯中的至少一种。 非化学放大型抗蚀剂也优选为具有α-氯代丙烯酸酯化合物和α-甲基苯乙烯化合物的共聚物作为主要成分的抗蚀剂。

    PATTERN FORMING METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD
    8.
    发明申请
    PATTERN FORMING METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD 审中-公开

    公开(公告)号：US20180120705A1

    公开(公告)日：2018-05-03

    申请号：US15853973

    申请日：2017-12-26

    Applicant: FUJIFILM Corporation

    Inventor： Wataru NIHASHI ,  Toru TSUCHIHASHI ,  Hideaki TSUBAKI

    IPC: G03F7/32 ,  G03F7/039 ,  G03F7/004

    Abstract: Provided are a positive tone pattern forming method in which development is carried out using a developer containing an organic solvent with use of a composition containing (A) a resin which has a repeating unit containing a moiety capable of forming a polar interaction and whose polarity is decreased due to release of the polar interaction by the action of an acid or a base, or a composition containing (A′) a resin having a repeating unit containing a polar group and (B) a compound capable of forming a polar interaction with the polar group of the resin (A′); and an electronic device manufacturing method including such a pattern forming method.

    RINSING LIQUID AND PATTERN FORMING METHOD
    9.
    发明申请
    RINSING LIQUID AND PATTERN FORMING METHOD 有权

    公开(公告)号：US20230132693A1

    公开(公告)日：2023-05-04

    申请号：US18062021

    申请日：2022-12-06

    Applicant: FUJIFILM Corporation

    Inventor： Satomi TAKAHASHI ,  Toru TSUCHIHASHI

    IPC: G03F7/32

    Abstract: An object of the present invention is to provide a rinsing liquid that has excellent resolution and excellent film thickness loss suppressiveness in a case where the rinsing liquid is used to rinse a resist film and a pattern forming method that uses the rinsing liquid. The rinsing liquid according to an embodiment of the present invention is a rinsing liquid for resist film patterning for a resist film obtained from an actinic ray-sensitive or radiation-sensitive composition, and contains at least a first ester-based solvent having 7 carbon atoms other than an acetate.

    PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND LAMINATE
    10.
    发明申请
    PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND LAMINATE 审中-公开

    公开(公告)号：US20180181003A1

    公开(公告)日：2018-06-28

    申请号：US15904438

    申请日：2018-02-26

    Applicant: FUJIFILM Corporation

    Inventor： Wataru NIHASHI ,  Hideaki TSUBAKI ,  Toru TSUCHIHASHI ,  Kei YAMAMOTO

    IPC: G03F7/11 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38

    Abstract: The pattern forming method includes forming an actinic ray-sensitive or radiation-sensitive film using an actinic ray-sensitive or radiation-sensitive composition, forming an upper layer film on the actinic ray-sensitive or radiation-sensitive film using a composition for forming an upper layer film, exposing the actinic ray-sensitive or radiation-sensitive film having the upper layer film formed thereon, and developing the exposed actinic ray-sensitive or radiation-sensitive film using a developer, in which the composition for forming an upper layer film includes a solvent and a crosslinking agent; and in which the content of a solvent having a hydroxyl group is 80% by mass or less with respect to all the solvents included in the composition for forming an upper layer film. The method for manufacturing an electronic device includes the pattern forming method. The laminate has an actinic ray-sensitive or radiation-sensitive film, and an upper layer film including a crosslinking agent.

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