公开(公告)号：US20150086911A1

公开(公告)日：2015-03-26

申请号：US14560650

申请日：2014-12-04

Applicant: FUJIFILM Corporation

Inventor： Takuya TSURUTA ,  Tomotaka TSUCHIMURA ,  Tadeteru YATSUO

IPC: G03F7/027 ,  G03F7/20

CPC classification number: G03F7/0045 ,  C07C309/65 ,  C07C381/12 ,  C07C2601/14 ,  C07D327/08 ,  C07D333/46 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/2037 ,  G03F7/325

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes; a compound (A) which generates an acid by irradiation with actinic rays or radiation, wherein the acid is linked with a group represented by the following general formula (M) through covalent bonding. In the formula, Y1 and Y2 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group. Z represents a hydrogen atom or a substituent. * represents a linking site with a residue of the compound (A)

Abstract translation: 光化射线敏感或辐射敏感性树脂组合物包括： 通过用光化射线或辐射照射产生酸的化合物（A），其中所述酸通过共价键与由以下通式（M）表示的基团连接。 在该式中，Y1和Y2各自独立地表示氢原子，烷基，环烷基，烯基，炔基，芳基或酰基。 Z表示氢原子或取代基。 *表示与化合物（A）的残基的连接位点，