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1.发明申请公开(公告)号：US20220299871A1
公开(公告)日：2022-09-22
申请号：US17835665
申请日：2022-06-08
Applicant: FUJIFILM Corporation
Inventor： Takuya TSURUTA , Takuro SUGIYAMA , Yasuharu SHIRAISHI , Akio MIZUNO
Abstract: Provided are a coloring composition including a colorant, a polymerizable compound, and a photopolymerization initiator, in which the colorant includes a green pigment, a content of the green pigment in a total solid content of the coloring composition is 25% by mass or more, and the green pigment includes a compound which is a compound represented by Formula (1) and has a maximal absorption wavelength in a wavelength range of 620 to 730 nm; a film formed of the coloring composition; a color filter; a solid-state imaging element; and an image display device.
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公开(公告)号：US20180057690A1
公开(公告)日：2018-03-01
申请号：US15802828
申请日：2017-11-03
Applicant: FUJIFILM Corporation
Inventor： Masahiro MORI , Kazuya OOTA , Kazuto SHIMADA , Kyohei ARAYAMA , Takuya TSURUTA , Hirotaka TAKISHITA
Abstract: Provided is a coloring composition with which a film capable of allowing transmission of infrared light in a state where noise generated from visible light is small can be formed. In addition, also provided are a film, a color filter, a pattern forming method, a method for manufacturing a color filter, a solid image pickup element, and an infrared sensor in which the coloring composition is used. The coloring composition includes a coloring material that shields light in a visible range; and an infrared absorber. It is preferable that the coloring material that shields light in the visible range includes two or more chromatic colorants and that a combination of the two or more chromatic colorants forms black. Alternatively, it is preferable that the coloring material that shields light in the visible range includes an organic black colorant. It is preferable that the organic black colorant is at least one selected from the group consisting of a perylene compound and a bisbenzofuranone compound.
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公开(公告)号：US20150118623A1
公开(公告)日：2015-04-30
申请号：US14586129
申请日：2014-12-30
Applicant: FUJIFILM Corporation
Inventor： Takuya TSURUTA , Tomotaka TSUCHIMURA , Kaoru IWATO
CPC classification number: C08F12/24 , C08F8/02 , C08F12/32 , C08F212/14 , G03F7/004 , G03F7/0045 , G03F7/0382 , G03F7/0388 , G03F7/0392 , G03F7/20 , C08F212/32 , C08F212/08 , C08F220/32 , C08F220/36
Abstract: A resin composition of the present invention includes a polymer compound (A) containing a repeating unit (Q) represented by the following general formula (1): wherein R1 represents a hydrogen atom, a methyl group, or a halogen atom; R2 and R3 represent a hydrogen atom, an alkyl group, or a cycloalkyl group; L represents a divalent linking group or a single bond; Y represents a substituent excluding a methylol group; Z represents a hydrogen atom or a substituent; m represents an integer of 0 to 4; n represents an integer of 1 to 5; and m+n is 5 or less.
Abstract translation: 本发明的树脂组合物含有含有下述通式（1）表示的重复单元（Q）的高分子化合物（A）：其中，R1表示氢原子，甲基或卤原子; R2和R3表示氢原子，烷基或环烷基; L表示二价连接基团或单键; Y表示除羟甲基之外的取代基; Z表示氢原子或取代基; m表示0〜4的整数， n表示1〜5的整数， m + n为5以下。
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4.发明申请公开(公告)号：US20200319548A1
公开(公告)日：2020-10-08
申请号：US16908886
申请日：2020-06-23
Applicant: FUJIFILM Corporation
Inventor： Tetsushi MIYATA , Takuya TSURUTA
Abstract: A composition includes a near infrared absorbing pigment and a solvent, in which the near infrared absorbing pigment is at least one selected from a colorant compound which has a cation and an anion in the same molecule, a colorant compound which is a salt of a cationic chromophore and a counter anion, and a colorant compound which is a salt of an anionic chromophore and a counter cation, a D50 particle size in which a cumulative volume in a particle size distribution of particle sizes of the near infrared absorbing pigment is 50% is 100 nm or lower, and d values of Hansen solubility parameters of the near infrared absorbing pigment and the solvent satisfy a predetermined expression.
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5.发明申请ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANKS INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD AND PHOTOMASK 有权丙烯酸敏感或辐射敏感性树脂组合物，紫外线敏感或辐射敏感膜，包括丙烯酸敏感或辐射敏感膜的掩模层，图案形成方法和光电子公开(公告)号：US20150086911A1
公开(公告)日：2015-03-26
申请号：US14560650
申请日：2014-12-04
Applicant: FUJIFILM Corporation
Inventor： Takuya TSURUTA , Tomotaka TSUCHIMURA , Tadeteru YATSUO
CPC classification number: G03F7/0045 , C07C309/65 , C07C381/12 , C07C2601/14 , C07D327/08 , C07D333/46 , G03F7/0046 , G03F7/038 , G03F7/0382 , G03F7/0397 , G03F7/2037 , G03F7/325
Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes; a compound (A) which generates an acid by irradiation with actinic rays or radiation, wherein the acid is linked with a group represented by the following general formula (M) through covalent bonding. In the formula, Y1 and Y2 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group. Z represents a hydrogen atom or a substituent. * represents a linking site with a residue of the compound (A)
Abstract translation: 光化射线敏感或辐射敏感性树脂组合物包括： 通过用光化射线或辐射照射产生酸的化合物（A），其中所述酸通过共价键与由以下通式（M）表示的基团连接。 在该式中，Y1和Y2各自独立地表示氢原子，烷基，环烷基，烯基，炔基，芳基或酰基。 Z表示氢原子或取代基。 *表示与化合物（A）的残基的连接位点，
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Patent Agency Ranking
6.发明申请PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME AND ELECTRONIC DEVICE 有权图案形成方法，抗紫外线敏感性或辐射敏感性树脂组合物，电阻膜，使用其的电子器件的制造方法和电子器件公开(公告)号：US20140349224A1
公开(公告)日：2014-11-27
申请号：US14451901
申请日：2014-08-05
Applicant: FUJIFILM CORPORATION
Inventor： Hiroo TAKIZAWA , Tomotaka TSUCHIMURA , Takeshi KAWABATA , Takuya TSURUTA
CPC classification number: G03F7/0388 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/0397 , G03F7/20 , G03F7/2002 , G03F7/325
Abstract: There is provided a pattern forming method comprising (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin containing an acid-decomposable repeating unit and being capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a compound capable of decomposing by the action of an acid to generate an acid, and (D) a solvent; (2) a step of exposing the film by using an actinic ray or radiation, and (4) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern.
Abstract translation: 提供了一种图案形成方法，其包括（1）通过使用含有（A）含有酸可分解重复单元的树脂并且能够降低溶解度的光化射线敏感性或辐射敏感性树脂组合物形成膜的步骤 对于含有机溶剂的显影剂，通过酸的作用，（B）能够在用光化射线或辐射照射时能够产生酸的化合物，（C）能够通过酸的作用分解以产生酸的化合物， 酸，和（D）溶剂; （2）通过使用光化射线或辐射使膜曝光的步骤，以及（4）通过使用含有机溶剂的显影剂显影曝光的膜以形成负图案的步骤。
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公开(公告)号：US20210079210A1
公开(公告)日：2021-03-18
申请号：US17105302
申请日：2020-11-25
Applicant: FUJIFILM Corporation
Inventor： Hiroaki TSUYAMA , Takuya TSURUTA , Kyohei ARAYAMA , Tetsushi MIYATA
Abstract: A composition includes a near infrared absorbing pigment, a compound represented by Formula (1), a primary to tertiary amine compound having a molecular weight of 500 or less and a boiling point of 300° C. or lower, a resin, and a solvent, in which the compound represented by Formula (1) has a solubility in propylene glycol methyl ether acetate at 25° C. of 0.1 g/L or higher, and a content of the amine compound in a total solid content of the composition is 10 to 5000 mass ppm. P1L1-(X1)n)m (1)
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公开(公告)号：US20170005266A1
公开(公告)日：2017-01-05
申请号：US15259164
申请日：2016-09-08
Applicant: FUJIFILM Corporation
Inventor： Yuzo NAGATA , Hiroo TAKIZAWA , Tomotaka TSUCHIMURA , Takuya TSURUTA
CPC classification number: H01L51/004 , C08F12/22 , C08F12/24 , C08F20/28 , C08F212/14 , C08F2500/02 , C08F2800/10 , C08F2810/20 , H01L21/02118 , H01L29/786 , H01L51/0043 , H01L51/0055 , H01L51/0071 , H01L51/0094 , H01L51/052 , H01L51/0545 , H01L51/0566 , C08F2220/325 , C08F212/32 , C08F220/36 , C08F2220/302 , C08F2220/343
Abstract: Provided is a semiconductor element having a semiconductor layer and an insulating layer adjacent to the semiconductor layer, in which the insulating layer is formed of a crosslinked product of a polymer compound having a repeating unit (IA) represented by the following General Formula (IA) and a repeating unit (IB) represented by the following General Formula (IB). In General Formula (IA), R1a represents a hydrogen atom, a halogen atom, or an alkyl group. L1a and L2a each independently represent a single bond or a linking group. X represents a crosslinkable group. m2a represents an integer of 1 to 5, and in a case where m2a is 2 or more, m2a number of X's may be the same or different from each other, m1a represents an integer of 1 to 5, and in a case where m1a is 2 or more, m1a number of (-L2a-(X)m2a)'s may be the same or different from each other. In General Formula (IB), R1b represents a hydrogen atom, a halogen atom, or an alkyl group. L1b represents a single bond or a linking group, and Ar1b represents an aromatic ring, m1b represents an integer of 1 to 5.
Abstract translation: 在通式（IA）中，R 1a表示氢原子，卤素原子或烷基。 L1a和L2a各自独立地表示单键或连接基团。 X表示可交联基团。 m2a表示1〜5的整数，并且在m2a为2以上的情况下，m 1a的数X可以相同或不同，m1a表示1〜5的整数，在m1a为 2个以上时，m1a个（-L2a-（X）m2a）可以相同也可以不同。 在通式（IB）中，R 1b表示氢原子，卤素原子或烷基。 L1b表示单键或连接基，Ar1b表示芳香环，m1b表示1〜5的整数。
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9.发明申请PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PRODUCTION METHOD FOR ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE 有权图案形成方法，主动感光或辐射敏感性树脂组合物，耐蚀膜，使用其的电子器件的制造方法和电子设备公开(公告)号：US20160147155A1
公开(公告)日：2016-05-26
申请号：US15011863
申请日：2016-02-01
Applicant: FUJIFILM Corporation
Inventor： Hiroo TAKIZAWA , Takuya TSURUTA , Tomotaka TSUCHIMURA
CPC classification number: G03F7/325 , C08F12/22 , C08F12/32 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/0382 , G03F7/0388 , G03F7/0392 , G03F7/0397 , G03F7/2004 , G03F7/2059
Abstract: There are provided A pattern formation method, including: (1) forming a film using an active light-sensitive or radiation-sensitive resin composition; (2) exposing the film to active light or radiation; and (3) developing the exposed film using a developer including an organic solvent, wherein the active light-sensitive or radiation-sensitive resin composition contains a resin (A) having specific 3 repeating units.
Abstract translation: 提供了一种图案形成方法，包括：（1）使用活性光敏或辐射敏感树脂组合物形成膜; （2）将膜暴露于活性光或辐射; 和（3）使用包含有机溶剂的显影剂显影所述曝光膜，其中所述活性光敏或辐射敏感性树脂组合物含有具有特定3个重复单元的树脂（A）。
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公开(公告)号：US20200183277A1
公开(公告)日：2020-06-11
申请号：US16789229
申请日：2020-02-12
Applicant: FUJIFILM Corporation
Inventor： Hiroaki TSUYAMA , Takuya TSURUTA , Kyohei ARAYAMA , Kazutaka TAKAHASHI , Tetsushi MIYATA
Abstract: A composition includes: an infrared absorbing pigment; an acid or a base that undergoes neutralization or a salt interchange reaction with the infrared absorbing pigment; an acidic or basic resin; and a solvent, in which in a case where the acid is included, the acidic resin is included, in a case where the base is included, the basic resin is included, and in a case where a pKa of the acid is represented by pKa1A, a conjugate acid pKa of the base is represented by pKa1B, a pKa of the acidic resin is represented by pKa2A, and a conjugate acid pKa of the basic resin is represented by pKa2B, any one of the following Expression A or Expression B is satisfied. pKa1A>pKa2A Expression A pKa1B
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