公开(公告)号：US06415630B1

公开(公告)日：2002-07-09

申请号：US09403887

申请日：2000-01-11

申请人： Frank Coriand ,  Andreas Menzel ,  Walter Nadrag ,  Wolfgang Schmidt

发明人： Frank Coriand ,  Andreas Menzel ,  Walter Nadrag ,  Wolfgang Schmidt

IPC分类号： C03B508

CPC分类号： C03B19/02 ,  C03B20/00

摘要： In a method for producing a streak-free quartz glass sheet with a highly homogeneous degree of refraction, a quartz glass rod is lowered into a melting pot parallel to a longitudinal axis of the quartz glass rod. A cross-section of the melting pot is larger than a cross-section of the quartz glass rod and determines a contour of the quartz glass sheet. The quartz glass rod is heated in the melting pot to a flow temperature whereupon the quartz glass rod is lowered until the quartz glass rod melts and a height of the quartz glass flowing in the melting pot reaches a desired quartz glass sheet thickness. The melting pot and the quartz glass rod move relative to each other in a direction which is perpendicular to the longitudinal axis of the quartz glass rod during the melting process. Preferably, the movement involves a rotational and a transverse movement.

摘要翻译： 在制造具有高度均匀的折射率的无条纹石英玻璃板的方法中，将石英玻璃棒降低到与石英玻璃棒的纵向轴线平行的熔炉中。 熔炉的横截面大于石英玻璃棒的横截面，并确定石英玻璃板的轮廓。 将石英玻璃棒在熔炉中加热到流动温度，随后石英玻璃棒降低直到石英玻璃棒熔化，并且在熔炉中流动的石英玻璃的高度达到期望的石英玻璃板厚度。 在熔融过程中，熔池和石英玻璃棒在垂直于石英玻璃棒的纵向轴线的方向上相对移动。 优选地，该运动涉及旋转和横向运动。

公开(公告)号：US06553789B1

公开(公告)日：2003-04-29

申请号：US09830808

申请日：2001-04-27

申请人： Rolf Martin ,  Andreas Menzel ,  Frank Coriand ,  Wolfgang Schmidt

发明人： Rolf Martin ,  Andreas Menzel ,  Frank Coriand ,  Wolfgang Schmidt

IPC分类号： C03B2304

CPC分类号： C03B23/047 ,  C03B23/049 ,  C03B32/00

摘要： A method produces homogenous quartz glass plates without streaks. The method is applied to starting quartz glass body which has an X—X geometrical axis and good refractive index homogeneity in its central area, and a refractive index homogeneity decreasing as the axis lies further from a central area. The body is divided into at least two concave parts by longitudinal cuts parallel to the axis once the central area has been processed out of the body. The parts are placed separately in corresponding molds and heated therein such that they are molded to form quartz glass plates having a desired thickness.

摘要翻译： 一种方法产生没有条纹的均质石英玻璃板。 该方法适用于在其中心区域具有X-X几何轴和良好的折射率均匀性的起始石英玻璃体，并且随着轴距中心区域的偏离，折射率均匀性降低。 一旦中心区域被处理出体外，身体通过平行于轴的纵向切口被分成至少两个凹部。 将这些部件分开放置在相应的模具中并在其中加热，使得它们被模制成具有期望厚度的石英玻璃板。

公开(公告)号：US06920766B2

公开(公告)日：2005-07-26

申请号：US10161433

申请日：2002-05-30

申请人： Frank Coriand ,  Andreas Menzel ,  Andreas Voitsch

发明人： Frank Coriand ,  Andreas Menzel ,  Andreas Voitsch

IPC分类号： G02B1/00 ,  C03B8/04 ,  C03B19/14 ,  C03B20/00 ,  C03C3/06 ,  C03C4/00 ,  C03B19/06

CPC分类号： C03C4/0085 ,  C03B19/1407 ,  C03B19/1423 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/62 ,  C03C3/06 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40

摘要： A synthetic quartz glass preform is produced by flame hydrolysis with subsequent cooling and is suitable for the application of high-energy DUV radiation in the wave length range under 250 nm. The preform has a core area which contains ≧1150 ppm OH, a strain double refraction of ≦5 nm/cm and a resistance to high-energy DUV radiation as a result of a transmission reduction of ΔT ≦0.1%/cm thickness. The quartz glass has been exposed to the following radiation: wavelength λ1=248 nm, laser shot frequency ≧300 Hz, laser shot value ≧109 and lumination ≦10 mJ/cm2, and wavelength λ2=193 nm, laser shot frequency ≧300 Hz, laser shot value ≧109 and lumination

摘要翻译： 合成石英玻璃预成型体通过随后的冷却通过火焰水解制备，并且适用于在250nm以下的波长范围内应用高能DUV辐射。 预成型件具有包含> = 1150ppm OH的核心区域，<= 5nm / cm的应变双折射和由于ΔT<= 0.1％/ cm厚度的透射率降低而导致的高能量DUV辐射的耐受性 。 石英玻璃暴露于以下辐射：波长λ1 = 248nm，激光射击频率> 300Hz，激光射击值> = 10 9和照明< 激光拍摄频率> = 300Hz，激光拍摄值> = 10/9> 10nm / >和照明<5MJ / CM <2> 。 用于生产预成型件的装置包括水平定位的具有彼此面对的两个不同尺寸开口的马弗。 较大的开口用于去除预制件，较小的开口用于引入燃烧器。 马弗炉的内腔从较大的开口变窄到较小的开口。

公开(公告)号：US06423656B1

公开(公告)日：2002-07-23

申请号：US09381490

申请日：1999-09-10

申请人： Frank Coriand ,  Andreas Menzel ,  Andreas Voitsch

发明人： Frank Coriand ,  Andreas Menzel ,  Andreas Voitsch

IPC分类号： C03C900

CPC分类号： C03C4/0085 ,  C03B19/1407 ,  C03B19/1423 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/62 ,  C03C3/06 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40

摘要： The invention relates to a synthetic quartz glass preform which is produced according to the flame hydrolysis technique with subsequent cooling and is suitable for the application of high-energy DUV radiation in the wave length range under 250 nm. Said preform has a core area which contains ≧1150 ppm OH, a strain double refraction of ≦5 nm/cm and a resistance to high-energy DUV radiation as a result of a transmission reduction of &Dgr; T ≦0.1 %/cm thickness. The quartz glass has been exposed to the following radiation: wavelength &lgr;1=248 nm, laser shot frequency ≧300 Hz, laser shot value ≧109 and rumination ≦10 mJ/cm2, and wavelength &lgr;2=193 nm, laser shot frequency ≧300 Hz, laser shot value ≧109 and rumination ≦5 mJ/cm2. A device for producing said preform comprises a horizontally positioned muffle with two different-sized openings facing each other. The larger of said openings is for removing the preform, the smaller opening being for introducing a burner. The internal chamber of the muffle narrows from the larger opening to the smaller opening.

摘要翻译： 本发明涉及一种根据火焰水解技术制备的合成石英玻璃预制件，随后冷却，适用于在250nm以下的波长范围内应用高能量DUV辐射。 所述预制棒具有包含> = 1150ppm OH的核心区域，<= 5nm / cm的应变双折射和由于DELTA T <= 0.1％/ cm的透射率降低而导致的对高能量DUV辐射的耐受性 厚度。 石英玻璃暴露于以下辐射：波长lambd1 = 248nm，激光射击频率> = 300Hz，激光射击值> = 109和反射<= 10mJ / cm 2，波长lambd2 = 193nm，激光射击频率 > = 300Hz，激光拍摄值> = 109，反光<= 5mJ / cm 2。 用于生产所述预制件的装置包括水平定位的马弗炉，其具有彼此面对的两个不同尺寸的开口。 所述开口中较大的一个用于去除预型件，较小的开口用于引入燃烧器。 马弗炉的内腔从较大的开口变窄到较小的开口。

公开(公告)号：US20050007595A1

公开(公告)日：2005-01-13

申请号：US10887421

申请日：2004-07-08

申请人： Christian Muehlig ,  Wolfgang Triebel ,  Siegfried Kufert ,  Sylvia Bark-Zollmann ,  Ute Natura ,  Frank Coriand

发明人： Christian Muehlig ,  Wolfgang Triebel ,  Siegfried Kufert ,  Sylvia Bark-Zollmann ,  Ute Natura ,  Frank Coriand

IPC分类号： G01N17/00 ,  G01N21/00 ,  G01N21/31 ,  G01N21/33 ,  G01N21/59 ,  G01N21/64 ,  G01N21/84 ,  G02B6/10

CPC分类号： G01N21/6402 ,  G01N17/004

摘要： The present invention refers to a method for the quantitative measurement of the pulse laser stability of synthetic silica glass, whereby this method avoids time-consuming and demanding measurements and saves material. First, the absorption of silica glass is measured for different energy densities, and a non-linear function α1 (H) is determined on the basis of the measured values. Second, the silica glass is subject to radiation with a higher energy density up to the point at which a constant absorption value is achieved. In the following, the absorption of the silica glass is measured at different energy densities, and a non-linear function α2 (H) is determined. The difference between the two non-linear functions indicates the increase of absorption that depends on the energy density.

摘要翻译： 本发明涉及合成二氧化硅玻璃的脉冲激光稳定性的定量测定方法，该方法避免了耗时和苛刻的测量并节约了材料。 首先，测量不同能量密度的石英玻璃的吸收，并且基于测量值确定非线性函数α1（H）。 第二，石英玻璃经受具有较高能量密度的辐射直到达到恒定吸收值的程度。 在下文中，以不同的能量密度测量石英玻璃的吸收，并且确定非线性函数α2（H）。 两个非线性函数之间的差异表明吸收的增加取决于能量密度。

公开(公告)号：US07271911B2

公开(公告)日：2007-09-18

申请号：US10887421

申请日：2004-07-08

申请人： Christian Muehlig ,  Wolfgang Triebel ,  Siegfried Kufert ,  Sylvia Bark-Zollmann ,  Ute Natura ,  Frank Coriand

发明人： Christian Muehlig ,  Wolfgang Triebel ,  Siegfried Kufert ,  Sylvia Bark-Zollmann ,  Ute Natura ,  Frank Coriand

IPC分类号： G01N21/00

CPC分类号： G01N21/6402 ,  G01N17/004

摘要： The present invention refers to a method for the quantitative measurement of the pulse laser stability of synthetic fused silica, whereby this method avoids time-consuming and demanding measurements and saves material. First, the absorption of fused silica is measured for different energy densities, and a non-linear function α1(H) is determined on the basis of the measured values. Second, the fused silica is subject to radiation with a higher energy density up to the point at which a constant absorption value is achieved. In the following, the absorption of the fused silica is measured at different energy densities, and a non-linear function α2(H) is determined. The difference between the two non-linear functions indicates the increase of absorption that depends on the energy density.

摘要翻译： 本发明涉及一种用于定量测量合成熔凝石英脉冲激光稳定性的方法，由此该方法避免了耗时和苛刻的测量并节省了材料。 首先，对不同的能量密度测量熔融石英的吸收，并且基于测量值来确定非线性函数α1（H）。 第二，熔融二氧化硅经受具有较高能量密度的辐射，直到达到恒定吸收值的程度。 在下文中，以不同的能量密度测量熔融二氧化硅的吸收，并且确定非线性函数α2（H）。 两个非线性函数之间的差异表明吸收的增加取决于能量密度。