公开(公告)号：US20180096839A1

公开(公告)日：2018-04-05

申请号：US15284773

申请日：2016-10-04

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Ryan Ryoung-Han KIM ,  Wenhui WANG ,  Azat LATYPOV ,  Tamer COSKUN ,  Lei SUN

IPC: H01L21/027 ,  H01L21/66 ,  H01L21/8234 ,  H01L21/306

CPC classification number: H01L21/0276 ,  H01L21/0337 ,  H01L21/30604 ,  H01L21/3086 ,  H01L21/31144 ,  H01L21/32139 ,  H01L21/823431 ,  H01L21/823481 ,  H01L22/12 ,  H01L22/30

Abstract: Methods for fabricating integrated circuits are provided. In one example, a method includes providing a circuit structure layer over a substrate and at least one etch layer over the circuit structure layer, in the at least one etch layer patterning at least one primary pattern feature having at least one primary pattern feature dimension and at least one assist pattern feature having at least one assist pattern feature dimension, where the primary pattern feature dimension is greater than the assist pattern feature dimension, reducing the at least one primary pattern feature dimension and closing the assist pattern feature to form an etch pattern, and etching a circuit structure feature using the etch pattern.

公开(公告)号：US20150287176A1

公开(公告)日：2015-10-08

申请号：US14243528

申请日：2014-04-02

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Tamer COSKUN ,  Yi ZOU

IPC: G06T7/00

CPC classification number: G03F7/70433

Abstract: A method and apparatus for hybrid test pattern generation for optical proximity correction (OPC) model calibration is disclosed. Embodiments may include receiving a mask pattern of a chip layout, extracting one or more patterns from the mask pattern, determining one or more parametric data sets for the one or more patterns, retrieving one or more calibration parametric data sets based on one or more other mask patterns, determining a difference between the one or more parametric data sets and the one or more calibration parametric data sets, and adding the one or more parametric data sets to the one or more calibration parametric data sets if the difference satisfies a threshold value.

Abstract translation: 公开了一种用于光学邻近校正（OPC）模型校准的混合测试图案生成的方法和装置。 实施例可以包括接收芯片布局的掩模图案，从掩模图案中提取一个或多个图案，确定一个或多个图案的一个或多个参数数据集，基于一个或多个其他的方法检索一个或多个校准参数数据集 确定所述一个或多个参数数据集与所述一个或多个校准参数数据集之间的差异，以及如果所述差满足阈值，则将所述一个或多个参数数据集加到所述一个或多个校准参数数据集中。