Conductive atomic force microscopy system with enhanced sensitivity and methods of using such a system

    公开(公告)号:US11175307B1

    公开(公告)日:2021-11-16

    申请号:US17005883

    申请日:2020-08-28

    Abstract: An illustrative method disclosed herein includes measuring at least one electrical-related parameter of a doped semiconductor material by simultaneously irradiating at least a portion of an upper surface of the doped semiconductor material, urging a conductive tip of a cantilever beam probe into conductive contact with the upper surface of the irradiated portion of the doped semiconductor material, and generating an electrical current that flows through the doped semiconductor material, through a measurement device that is operatively coupled to the cantilever beam probe and through the cantilever beam probe, wherein the measurement device measures the at least one electrical-related parameter of the doped semiconductor material.

    SYSTEM AND METHOD FOR PERFORMING THREE-DIMENSIONAL COMPOSITIONAL ANALYSES

    公开(公告)号:US20210356429A1

    公开(公告)日:2021-11-18

    申请号:US16874712

    申请日:2020-05-15

    Abstract: In APT systems and methods, a sample is analyzed by concurrently applying different types of energy to the tip of the sample, thereby causing atom evaporation from the end of the tip. Evaporated atoms are analyzed to determine chemical nature and original position information, which is used to generate a compositional profile. To ensure an accurate profile, the applied energy includes: a D.C. voltage, which lowers the critical energy level (Q) for atom evaporation; first laser pulses, which are applied to opposing first sides of the tip near the end to further lower Q and which are phase-shifted so resulting standing wave patterns of heat distribution have energy maxima that are offset and below a threshold to avoid damage to tip side surfaces; and second laser pulse(s), which is/are applied to second side(s) of the tip near the distal end to reach Q and cause atom evaporation from the end.

    THERMAL MANAGEMENT OF AN OPTICAL COMPONENT FOR TEMPERATURE CONTROL

    公开(公告)号:US20230266533A1

    公开(公告)日:2023-08-24

    申请号:US17679431

    申请日:2022-02-24

    CPC classification number: G02B6/1228 G02B2006/12135

    Abstract: Structures including an optical component and methods of fabricating a structure including an optical component. The structure includes a substrate, an optical component including a waveguide core, and a back-end-of-line stack including a heat spreader layer. The optical component is positioned in a vertical direction between the substrate and the back-end-of-line stack. The waveguide core contains a first material having a first thermal conductivity, and the heat spreader layer contains a second material having a second thermal conductivity that is greater than the first thermal conductivity of the first material.

    OPTICAL COMPONENTS WITH ENHANCED HEAT DISSIPATION

    公开(公告)号:US20230266529A1

    公开(公告)日:2023-08-24

    申请号:US17679405

    申请日:2022-02-24

    CPC classification number: G02B6/122 G02B6/43 G02B6/0026

    Abstract: Structures including an optical component and methods of fabricating a structure including an optical component. The structure includes a waveguide core and a back-end-of-line stack including a first metallization level, a second metallization level, and a heat sink having a metal feature in the second metallization level. The heat sink is positioned adjacent to a section of the waveguide core. The first metallization level including a dielectric layer positioned between the metal feature and the section of the waveguide core.

    System and method for performing three-dimensional compositional analyses

    公开(公告)号:US11217424B2

    公开(公告)日:2022-01-04

    申请号:US16874712

    申请日:2020-05-15

    Abstract: In APT systems and methods, a sample is analyzed by concurrently applying different types of energy to the tip of the sample, thereby causing atom evaporation from the end of the tip. Evaporated atoms are analyzed to determine chemical nature and original position information, which is used to generate a compositional profile. To ensure an accurate profile, the applied energy includes: a D.C. voltage, which lowers the critical energy level (Q) for atom evaporation; first laser pulses, which are applied to opposing first sides of the tip near the end to further lower Q and which are phase-shifted so resulting standing wave patterns of heat distribution have energy maxima that are offset and below a threshold to avoid damage to tip side surfaces; and second laser pulse(s), which is/are applied to second side(s) of the tip near the distal end to reach Q and cause atom evaporation from the end.

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