公开(公告)号：US20160329186A1

公开(公告)日：2016-11-10

申请号：US15109230

申请日：2014-12-16

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Wen LI ,  Ryo KADOI ,  Kazuki IKEDA ,  Hiroyuki TAKAHASHI ,  Hajime KAWANO

IPC: H01J37/147 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/1472 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/1504 ,  H01J2237/1508 ,  H01J2237/152 ,  H01J2237/1534 ,  H01J2237/2804 ,  H01J2237/2806

Abstract: A processing apparatus and a processing method are provided, which use a charged particle beam device that achieves defection of secondary electrons/reflected electrons at a large angle and cancels out noises of an electromagnetic deflector and an electrostatic deflector to suppress a position shift of a primary electron beam caused by circuit noises of a primary beam/secondary beam separation circuit. In the charged particle beam device that includes an electronic optical system radiating a concentrated electron beam onto a sample placed on a stage to perform scanning and captures an image of the sample, a reference signal and a signal generation unit of a voltage-source control signal applied to the electrostatic deflector generating the electrostatic deflector and a reference signal and a signal generation unit of a current-source control signal applied to the electromagnetic deflector generating a magnetic field are made common in an overlapping-electromagnetic-deflector control unit that controls a path of the secondary electrons/reflected electrons incident on a detector, and frequency characteristics and phase characteristics of the voltage control signal are coincident with those of the current-source control signal.

Abstract translation: 提供一种处理装置和处理方法，其使用以大角度实现二次电子/反射电子的偏离的带电粒子束装置，并且消除电磁偏转器和静电偏转器的噪声，以抑制初级 电子束由主光束/次光束分离电路的电路噪声引起。 在带电粒子束装置中，包括电子光学系统，该电子光学系统将集中的电子束辐射到放置在载物台上的样品上以进行扫描并捕获样品的图像，参考信号和电压源控制信号的信号产生单元 施加到产生静电偏转器的静电偏转器，并且施加到产生磁场的电磁偏转器的电流源控制信号的参考信号和信号产生单元在控制路径的重叠电磁偏转器控制单元中是共同的 的入射到检测器上的二次电子/反射电子，并且电压控制信号的频率特性和相位特性与电流源控制信号的频率特性和相位特性一致。

公开(公告)号：US20170271121A1

公开(公告)日：2017-09-21

申请号：US15613941

申请日：2017-06-05

Applicant: Hitachi High-Technologies Corporation

Inventor： Wen LI ,  Ryo KADOI ,  Kazuki IKEDA ,  Hiroyuki TAKAHASHI ,  Hajime KAWANO

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/244

Abstract: A processing apparatus and a processing method are provided, which use a charged particle beam device that achieves defection of secondary electrons/reflected electrons at a large angle and cancels out noises of an electromagnetic deflector and an electrostatic deflector to suppress a position shift of a primary electron beam caused by circuit noises of a primary beam/secondary beam separation circuit. In the charged particle beam device that includes an electronic optical system radiating a concentrated electron beam onto a sample placed on a stage to perform scanning and captures an image of the sample, a reference signal and a signal generation unit of a voltage-source control signal applied to the electrostatic deflector generating the electrostatic deflector and a reference signal and a signal generation unit of a current-source control signal applied to the electromagnetic deflector generating a magnetic field are made common in an overlapping-electromagnetic-deflector control unit that controls a path of the secondary electrons/reflected electrons incident on a detector, and frequency characteristics and phase characteristics of the voltage control signal are coincident with those of the current-source control signal.

公开(公告)号：US20200043695A1

公开(公告)日：2020-02-06

申请号：US16491819

申请日：2017-03-06

Applicant: Hitachi High-Technologies Corporation

Inventor： Kazuki IKEDA ,  Wen LI ,  Takuma NISHIMOTO ,  Hiroyuki TAKAHASHI ,  Wataru MORI ,  Makoto SUZUKI ,  Hajime KAWANO

IPC: H01J37/147 ,  H01J37/22 ,  H01J37/28

Abstract: A charged particle beam device includes a deflection unit that deflects a charged particle beam released from a charged particle source to irradiate a sample, a reflection plate that reflects secondary electrons generated from the sample, and a control unit that controls the deflection unit based on an image generated by detecting the secondary electrons reflected from the reflection plate. The deflection unit includes an electromagnetic deflection unit that electromagnetically scans with the charged particle beam by a magnetic field and an electrostatic deflection unit that electrostatically scans with the charged particle beam by an electric field. The control unit controls the electromagnetic deflection unit and the electrostatic deflection unit, superimposes an electromagnetic deflection vector generated by the electromagnetic scanning and an electrostatic deflection vector generated by the electrostatic scanning, and controls at least a trajectory of the charged particle beam.

公开(公告)号：US20180106610A1

公开(公告)日：2018-04-19

申请号：US15562810

申请日：2016-04-06

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Ryo KADOI ,  Wen LI ,  Kazuki IKEDA ,  Hajime KAWANO ,  Hiroyuki TAKAHASHI

IPC: G01B15/00 ,  H01J37/147 ,  H01J37/28 ,  H01J37/20

Abstract: A charged particle apparatus includes: a charged particle source unit; a blanking electrode unit that blanks a charged particle beam launched from the charged particle source unit; a deflecting electrode unit that deflects the charged particle beam launched from the charged particle source unit and passing through the blanking electrode unit; an objective lens unit that converges the charged particle beam deflected by the deflecting electrode unit and radiates the charged particle beam to a surface of a sample; a secondary charged particle detection unit that detects a secondary charged particle generated from the sample irradiated with the charged particle beam; a signal processing unit that processes a signal obtained by detecting the secondary charged particle by the secondary charged particle detection unit; and a control unit that controls the entire apparatus. The control unit includes a transient signal correction unit that corrects a transient signal when the blanking of the charged particle beam is turned off by the blanking electrode. Thus, an image with no distortion can be obtained even when the blanking electrode is operated to turn on and off at a high speed and it is possible to perform measurement or inspection of a minute pattern with high precision.

公开(公告)号：US20160276128A1

公开(公告)日：2016-09-22

申请号：US15041873

申请日：2016-02-11

Applicant: Hitachi High-Technologies Corporation

Inventor： Kazuki IKEDA ,  Wen LI ,  Hajime KAWANO ,  Hiroyuki TAKAHASHI ,  Makoto SUZUKI

IPC: H01J37/22 ,  H01J37/28 ,  H01J37/244

CPC classification number: H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/2448 ,  H01J2237/2817

Abstract: To provide a charged particle beam apparatus capable of obtaining an image with high contrast and high visibility, the apparatus has: a charged particle optical system; a detection part to detect secondary charged particles generated from the sample; an image formation part to receive a detection signal from the detection part and form an image of the sample; an image processing part to process the image formed with the image formation part; and a display part to display the result of processing with the image processing part, wherein the image formation part has a pulse-count signal processing part to generate cumulative histogram information on a pulse signal component in the detection signal, set a threshold value for pulse signal detection using information on the generated cumulative histogram, and output a detection signal having a value higher than the set threshold value as a pulse signal.

Abstract translation: 为了提供能够获得具有高对比度和高可见度的图像的带电粒子束装置，该装置具有：带电粒子光学系统; 用于检测从样品产生的二次带电粒子的检测部; 图像形成部，其从检测部接收检测信号，形成样本的图像; 图像处理部分，用于处理与图像形成部分形成的图像; 以及显示部分，用于显示与图像处理部分的处理结果，其中图像形成部分具有脉冲计数信号处理部分，以生成关于检测信号中的脉冲信号分量的累积直方图信息，设置脉冲的阈值 使用关于生成的累积直方图的信息进行信号检测，并将具有高于设定阈值的检测信号作为脉冲信号输出。

公开(公告)号：US20200020504A1

公开(公告)日：2020-01-16

申请号：US16494454

申请日：2017-03-27

Applicant: Hitachi High-Technologies Corporation

Inventor： Akio YAMAMOTO ,  Kazuki IKEDA ,  Wen LI ,  Hiroyuki TAKAHASHI ,  Shahedul HOQUE ,  Shunsuke MIZUTANI

IPC: H01J37/22 ,  H01J37/244

Abstract: A charged-particle beam system comprises: a charged-particle beam device containing a detection unit for detecting electrons generated by irradiating a sample with a charged-particle beam released from a charged particle source; and a signal detection unit in which a detection signal from the detection unit is input through a wiring. The signal detection unit comprises: a separation unit for separating into a rising signal and a falling signal the detection signal from the detection unit; a falling signal processing unit for at least eliminating ringing in the falling signal; and a combination unit generating and delivering a combined signal produced by combining the rising signal, which has been separated by the separation unit, with the falling signal wherefrom the ringing has been eliminated by the falling signal processing unit.

公开(公告)号：US20170207061A1

公开(公告)日：2017-07-20

申请号：US15365545

申请日：2016-11-30

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Wen LI ,  Kazuki IKEDA ,  Takuma NISHIMOTO ,  Hiroyuki TAKAHASHI ,  Hajime KAWANO

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2448

Abstract: In an image forming method of charged particle beam apparatus for scanning a sample by irradiating the sample with a converged charged particle beam and detecting secondary charged particles generated from the sample by a detection unit, receiving and processing an output signal from the detection unit, and receiving the processed signal and forming an image of the sample, receiving and processing the output signal are performed by analogically processing the output signal and by performing pulse-count processing on the output signal, and pulse-count processing is performed by removing a ringing pulse in the output signal and counting pulses in the signal from which the ringing pulse has been removed.