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    Chemical mechanical polishing pad and chemical mechanical polishing method
    1.
    发明授权
    Chemical mechanical polishing pad and chemical mechanical polishing method 有权
    化学机械抛光垫和化学机械抛光方法

    公开(公告)号：US07183213B2

    公开(公告)日：2007-02-27

    申请号：US10892096

    申请日：2004-07-16

    申请人： Hiroshi Shiho ,  Yukio Hosaka ,  Kou Hasegawa ,  Nobuo Kawahashi

    发明人： Hiroshi Shiho ,  Yukio Hosaka ,  Kou Hasegawa ,  Nobuo Kawahashi

    IPC分类号： H01L21/302

    CPC分类号： B24B37/205 ,  B24B37/013

    摘要： A chemical mechanical polishing pad. The pad contains a water-insoluble matrix and Water-soluble particles dispersed in the water-insoluble matrix material and has a polishing surface and a non-polishing surface on a side opposite to the polishing surface. The pad has a light transmitting area which optically communicates from the polishing surface to the non-polishing surface. The non-polishing surface of the light transmitting area has a surface roughness (Ra) of 10 pm or less.

    摘要翻译： 化学机械抛光垫。 垫包含分散在水不溶性基质材料中的水不溶性基质和水溶性颗粒，并且在与抛光表面相对的一侧上具有抛光表面和非抛光表面。 垫具有从抛光表面与非抛光表面光学连通的透光区域。 透光区域的非抛光面的表面粗糙度（Ra）为10μm以下。

    Chemical mechanical polishing pad and chemical mechanical polishing method
    2.
    发明申请
    Chemical mechanical polishing pad and chemical mechanical polishing method 有权
    化学机械抛光垫和化学机械抛光方法

    公开(公告)号：US20050014376A1

    公开(公告)日：2005-01-20

    申请号：US10892096

    申请日：2004-07-16

    申请人： Hiroshi Shiho ,  Yukio Hosaka ,  Kou Hasegawa ,  Nobuo Kawahashi

    发明人： Hiroshi Shiho ,  Yukio Hosaka ,  Kou Hasegawa ,  Nobuo Kawahashi

    IPC分类号： B24B37/013 ,  B24B37/20 ,  H01L21/302 ,  H01L21/461

    CPC分类号： B24B37/205 ,  B24B37/013

    摘要： A chemical mechanical polishing pad. The pad contains a water-insoluble matrix and water-soluble particles dispersed in the water-insoluble matrix material and has a polishing surface and a non-polishing surface on a side opposite to the polishing surface. The pad has a light transmitting area which optically communicates from the polishing surface to the non-polishing surface. The non-polishing surface of the light transmitting area has a surface roughness (Ra) of 10 μm or less.

    摘要翻译： 化学机械抛光垫。 垫包含分散在水不溶性基质材料中的水不溶性基质和水溶性颗粒，并且在与抛光表面相对的一侧上具有抛光表面和非抛光表面。 垫具有从抛光表面与非抛光表面光学连通的透光区域。 透光区域的非抛光表面的表面粗糙度（Ra）为10μm以下。

    Polishing pad for semiconductor wafer, polishing multilayered body for semiconductor wafer having same, and method for polishing semiconductor wafer
    3.
    发明授权
    Polishing pad for semiconductor wafer, polishing multilayered body for semiconductor wafer having same, and method for polishing semiconductor wafer 有权
    用于半导体晶片的抛光垫，用于其半导体晶片的抛光多层体，以及用于研磨半导体晶片的方法

    公开(公告)号：US07323415B2

    公开(公告)日：2008-01-29

    申请号：US10529742

    申请日：2004-04-23

    申请人： Hiroshi Shiho ,  Yukio Hosaka ,  Kou Hasegawa ,  Nobuo Kawahashi

    发明人： Hiroshi Shiho ,  Yukio Hosaka ,  Kou Hasegawa ,  Nobuo Kawahashi

    IPC分类号： H01L21/302

    CPC分类号： B24B37/205

    摘要： An objective of the present invention is to provide a polishing pad for a semiconductor wafer and a laminated body for polishing of a semiconductor wafer equipped with the same which can perform optical endpoints detection without lowering the polishing performance as well as methods for polishing of a semiconductor wafer using them. The polishing pad of the present invention comprises a substrate 11 for a polishing pad provided with a through hole penetrating from surface to back, a light transmitting part 12 fitted in the through hole, the light transmitting part comprises a water-insoluble matrix material (1,2-polybutadiene) and a water-soluble particle (β-cyclodextrin) dispersed in the water-insoluble matrix material, and the water-soluble particle is less than 5% by volume based on 100% by volume of the total amount of the water-insoluble matrix material and the water-soluble particle. In addition, the laminated body for polishing of the present invention comprises a supporting layer on a backside of the polishing pad. These polishing pad and laminated body for polishing can comprise a fixing layer 13 on a backside.

    摘要翻译： 本发明的目的是提供一种用于半导体晶片的抛光垫和用于抛光其配备的半导体晶片的层叠体，其可以在不降低抛光性能的情况下进行光学终点检测以及半导体的抛光方法 晶圆使用它们。 本发明的抛光垫包括用于抛光垫的基板11，该抛光垫具有从表面向后穿透的通孔，安装在通孔中的透光部12，透光部包括水不溶性基质材料（1 ，2-聚丁二烯）和分散在水不溶性基质材料中的水溶性颗粒（β-环糊精），并且水溶性颗粒的体积百分比小于5体积％ 水不溶性基质材料和水溶性颗粒。 另外，本发明的研磨用层叠体在研磨垫的背面具有支撑层。 这些抛光垫和用于抛光的层压体可以在背面上包括固定层13。

    Polishing pad
    6.
    发明授权
    Polishing pad 有权
    抛光垫

    公开(公告)号：US06992123B2

    公开(公告)日：2006-01-31

    申请号：US10700554

    申请日：2003-11-05

    申请人： Hiroshi Shiho ,  Hiromi Aoi ,  Kou Hasegawa ,  Nobuo Kawahashi

    发明人： Hiroshi Shiho ,  Hiromi Aoi ,  Kou Hasegawa ,  Nobuo Kawahashi

    IPC分类号： C08L1/00 ,  C08L1/26 ,  C08L3/00 ,  C08L5/00 ,  C08L89/00

    CPC分类号： B24B37/24 ,  B24D3/32 ,  B24D3/344 ,  C09K3/1436

    摘要： A polishing pad of the present invention contains a water-insoluble matrix material comprising a crosslinked polymer such as a crosslinked 1,2-polybutadiene and water-soluble particles dispersed in the material, such as saccharides. The solubility of the water-soluble particles in water is 0.1 to 10 wt % at 25° C., and the amount of water-soluble particles eluted from the pad when the pad is immersed in water is 0.05 to 50 wt % at 25° C. Further, in the polishing pad of the present invention, the solubility of the water-soluble particles in water is 0.1 to 10 wt % at 25° C. at a pH of 3 to 11, and solubility thereof in water at 25° C. at a pH of 3 to 11 is within ±50% of solubility thereof in water at 25° C. at a pH of 7. In addition, the water-soluble particles contain an amino group, an epoxy group, an isocyanurate group, and the like. This polishing pad has good slurry retainability even if using slurries different in pH and also has excellent polishing properties such as a polishing rate and planarity.

    摘要翻译： 本发明的抛光垫含有包含交联聚合物如交联的1,2-聚丁二烯的水不溶性基质材料和分散在该物质中的水溶性颗粒，例如糖类。 水溶性颗粒在水中的溶解度在25℃为0.1〜10重量％，当将垫浸入水中时，从垫中洗脱的水溶性颗粒的量在25℃为0.05〜50重量％ 此外，在本发明的研磨垫中，水溶性颗粒在水中的溶解度在25℃，pH为3〜11时为0.1〜10重量％，在25℃下在水中的溶解度 在pH为3〜11的条件下，在pH为7的情况下，25℃下在水中的溶解度的±50％以内。另外，水溶性粒子含有氨基，环氧基，异氰脲酸酯基 ，等等。 该抛光垫即使使用pH不同的浆料也具有良好的浆料保持性，并且还具有抛光速度和平面性等优异的抛光性能。

    Chemical mechanical polishing pad, production method thereof, and chemical mechanical polishing process
    7.
    发明申请
    Chemical mechanical polishing pad, production method thereof, and chemical mechanical polishing process 审中-公开
    化学机械抛光垫，其生产方法和化学机械抛光工艺

    公开(公告)号：US20050222336A1

    公开(公告)日：2005-10-06

    申请号：US11050730

    申请日：2005-02-07

    申请人： Takahiro Okamoto ,  Hiroyuki Miyauchi ,  Kouji Kawahara ,  Hiroshi Shiho ,  Kou Hasegawa ,  Nobuo Kawahashi

    发明人： Takahiro Okamoto ,  Hiroyuki Miyauchi ,  Kouji Kawahara ,  Hiroshi Shiho ,  Kou Hasegawa ,  Nobuo Kawahashi

    IPC分类号： B24B37/24 ,  B24D13/14 ,  B24D18/00 ,  C08F8/00

    CPC分类号： B24B37/24 ,  B24D18/00

    摘要： A chemical mechanical polishing pad comprising a water-insoluble matrix which comprises (A) a styrene polymer and (B) a diene polymer. A method for producing the above chemical mechanical polishing pad, the method comprising the steps of preparing a composition comprising (A) a styrene polymer, (B) a diene polymer and (C) a crosslinking agent, shaping the above composition into a predetermined shape, and heating the composition during or after shaping to cure it. A chemical mechanical polishing process which comprises polishing a surface to be polished of an object to be polished by use of the chemical mechanical polishing pad. According to the present invention, it is possible to provide a chemical mechanical polishing pad which can be suitably applied to polishing of metal film and insulation film, particularly to an STI technique, provides a flat polished surface, can provide a high polishing rate and has a satisfactory useful life.

    摘要翻译： 一种包含水不溶性基质的化学机械抛光垫，其包含（A）苯乙烯聚合物和（B）二烯聚合物。 一种制备上述化学机械抛光垫的方法，所述方法包括以下步骤：制备包含（A）苯乙烯聚合物，（B）二烯聚合物和（C）交联剂的组合物，将上述组合物成形为预定形状 并且在成形期间或之后加热组合物以使其固化。 一种化学机械抛光工艺，其包括通过使用化学机械抛光垫抛光待抛光物体的待抛光表面。 根据本发明，可以提供一种适用于金属膜和绝缘膜的抛光的化学机械抛光垫，特别是对于STI技术，提供平坦的抛光表面，可以提供高抛光速率并具有 令人满意的使用寿命。

    Window member for chemical mechanical polishing and polishing pad
    9.
    发明授权
    Window member for chemical mechanical polishing and polishing pad 有权
    化学机械抛光和抛光垫窗构件

    公开(公告)号：US06832949B2

    公开(公告)日：2004-12-21

    申请号：US10279843

    申请日：2002-10-25

    申请人： Tomohisa Konno ,  Masayuki Motonari ,  Masayuki Hattori ,  Kou Hasegawa ,  Nobuo Kawahashi

    发明人： Tomohisa Konno ,  Masayuki Motonari ,  Masayuki Hattori ,  Kou Hasegawa ,  Nobuo Kawahashi

    IPC分类号： B24B500

    CPC分类号： B24B37/205

    摘要： An object of the present invention is to provide a window member for chemical mechanical polishing, which is excellent in antifouling property and transparency and is excellent in anti-scratching and, further, can easily perform detection of a polishing endpoint of the surface of a semiconductor wafer by passing a light for endpoint detection, in polishing of a semiconductor wafer using an optical endpoint detecting apparatus and also to a polishing pad. A window member for chemical mechanical polishing of the present invention is provided with a substrate part (comprised of polyurethane resin and the like), which is transparent partly at least, an antifouling resin layer formed on at least one side of the substrate part. This antifouling resin layer is preferably comprised of a fluorine-based polymer having a polysiloxane segment in a main chain. A polishing pad may be the one that a window member is fitted in a through hole of a substrate for a polishing pad (comprised of polyurethane resin and the like, disc-like, belt-like or the like) provided with a through hole penetrating from surface to back, or adhered to a substrate for a polishing pad so as to cover an opening part of the through hole.

    摘要翻译： 本发明的目的是提供一种化学机械抛光用的窗构件，其防污性和透明性优异，抗划伤性优异，并且还可以容易地进行半导体表面的研磨终点的检测 使用光学终点检测装置对抛光用的半导体晶片进行端点检测的光，也可以使用抛光垫。 本发明的化学机械抛光用窗构件具有至少部分透明地形成在基板部的至少一侧上的防污树脂层的基板部（由聚氨酯树脂等构成）。 该防污树脂层优选由在主链中具有聚硅氧烷链段的氟系聚合物构成。 抛光垫可以是窗构件装配在用于抛光垫（由聚氨酯树脂等构成的盘状，带状等）的通孔的通孔中，该基板设置有贯通孔 或者粘附到用于抛光垫的基板上，以覆盖通孔的开口部分。

    Composition for polishing pad and polishing pad using the same
    10.
    发明授权
    Composition for polishing pad and polishing pad using the same 有权
    用于抛光垫的组合物和使用其的抛光垫

    公开(公告)号：US06790883B2

    公开(公告)日：2004-09-14

    申请号：US09867541

    申请日：2001-05-31

    申请人： Toshihiro Ogawa ,  Kou Hasegawa ,  Nobuo Kawahashi

    发明人： Toshihiro Ogawa ,  Kou Hasegawa ,  Nobuo Kawahashi

    IPC分类号： C08L300

    CPC分类号： B24B37/24 ,  B24D3/32 ,  C08L3/02 ,  C08L21/00 ,  C08L101/00 ,  C08L2666/26

    摘要： An object of the invention is to provide a polishing pad having the excellent slurry retaining properties and the large removal rate and a composition for a polishing pad which can form such the polishing pad. A composition for polishing pad of the invention is comprising a water-insoluble matrix material containing a crosslinked polymer and a water-soluble particle dispersed in the water-insoluble matrix material. The elongation remaining after breaking is 100% or less when a test piece comprising the water-insoluble matrix material is broken at 80° C. according to JIS K 6251. A polishing pad of the invention is that at least a part of the polishing pad comprises the composition for polishing pad.

    摘要翻译： 本发明的目的是提供一种抛光垫，该抛光垫具有优异的浆料保持性能和较大的去除速率以及可形成这种抛光垫的抛光垫组合物。 本发明的抛光垫组合物包含含有交联聚合物的水不溶性基质材料和分散在水不溶性基质材料中的水溶性颗粒。 根据JIS K 6251，当包含水不溶性基质材料的试验片在80℃下破裂时，断裂后剩余的伸长率为100％以下。本发明的研磨垫是至少一部分研磨垫 包括用于抛光垫的组合物。