SUBSTRATE INTEGRATED INDUCTORS USING HIGH THROUGHPUT ADDITIVE DEPOSITION OF HYBRID MAGNETIC MATERIALS

    公开(公告)号:US20200312796A1

    公开(公告)日:2020-10-01

    申请号:US16651939

    申请日:2017-09-30

    Abstract: An inductor in a device package and a method of forming the inductor in the device package are described. The inductor includes a first conductive layer disposed on a substrate. The inductor also has one or more hybrid magnetic additively manufactured (HMAM) layers disposed over and around the first conductive layer to form one or more via openings over the first conductive layer. The inductor further includes one or more vias disposed into the one or more via openings, wherein the one or more vias are only disposed on the portions of the exposed first conductive layer. The inductor has a dielectric layer disposed over and around the one or more vias, the HMAM layers, and the substrate. The inductor also has a second conductive layer disposed over the one or more vias and the dielectric layer.

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