公开(公告)号：US20240203664A1

公开(公告)日：2024-06-20

申请号：US18081362

申请日：2022-12-14

Applicant: Intel Corporation

Inventor： Yosef KORNBLUTH ,  Bainye Francoise ANGOUA ,  Whitney BRYKS ,  Daniel ROSALES-YEOMANS ,  Aaditya Anand CANDADAI ,  Holly CLINGAN ,  Jade Sharee LEWIS ,  Patrick QUACH ,  Srinivas V. PIETAMBARAM

IPC: H01G4/33 ,  H01G4/10

CPC classification number: H01G4/33 ,  H01G4/105

Abstract: Embodiments disclosed herein include a core for a package substrate. In an embodiment, the core comprises a first substrate with a first surface and a second surface, a first recess into the first surface of the first substrate, a first layer in the first recess, where the first layer is electrically conductive, a second layer over the first layer, where the second layer is a dielectric layer, and a third layer over the second layer, where the third layer is electrically conductive. In an embodiment, the core further comprises a second substrate with a third surface and a fourth surface, where the third surface of the second substrate faces the first surface of the first substrate, a second recess in the third surface of the second substrate, and a fourth layer in the second recess, where the fourth layer is electrically conductive, and the fourth layer contacts the third layer.

公开(公告)号：US20210078296A1

公开(公告)日：2021-03-18

申请号：US16574252

申请日：2019-09-18

Applicant: Intel Corporation

Inventor： Jieying KONG ,  Gang DUAN ,  Srinivas PIETAMBARAM ,  Patrick QUACH ,  Dilan SENEVIRATNE

IPC: B32B17/10 ,  B32B15/20 ,  H01L23/48 ,  H01L23/00

Abstract: Embodiments of the present disclosure may generally relate to systems, apparatus, and/or processes directed to a manufacturing process flow for packages that include one or more glass layers that include patterning features, such as electrically conductive traces, RDLs, and vias within the packages. In embodiments, a package may include a glass layer with a first side and a second side opposite the first side, where the glass layer is a dielectric layer. The package may include another layer coupled with the first side of the glass layer, and a pattern on the second side of the glass layer to receive a deposited material in at least a portion of the pattern.

公开(公告)号：US20240153857A1

公开(公告)日：2024-05-09

申请号：US17983230

申请日：2022-11-08

Applicant: Intel Corporation

Inventor： Bainye Francoise ANGOUA ,  Whitney BRYKS ,  Yosef KORNBLUTH ,  Daniel ROSALES-YEOMANS ,  Holly CLINGAN ,  Patrick QUACH ,  Jade Sharee LEWIS ,  Aaditya Anand CANDADAI

IPC: H01L23/498 ,  H01L23/15 ,  H01L23/544

CPC classification number: H01L23/49827 ,  H01L23/15 ,  H01L23/49822 ,  H01L23/544 ,  H01L24/16 ,  H01L2223/54426 ,  H01L2224/16225

Abstract: Embodiments disclose a package substrate. In an embodiment, the package substrate comprises a core, where the core comprises: a first sub-core, where the first sub-core comprises a glass and a first through glass via (TGV), and a second sub-core, where the second sub-core comprises the glass and a second TGV. In an embodiment, the first TGV directly contacts the second TGV.

公开(公告)号：US20230405976A1

公开(公告)日：2023-12-21

申请号：US18241067

申请日：2023-08-31

Applicant: Intel Corporation

Inventor： Jieying KONG ,  Gang DUAN ,  Srinivas PIETAMBARAM ,  Patrick QUACH ,  Dilan SENEVIRATNE

IPC: B32B17/10 ,  B32B15/20 ,  H01L23/00 ,  H01L23/48

CPC classification number: B32B17/10192 ,  B32B15/20 ,  H01L24/09 ,  H01L23/481 ,  H01L2224/02379

Abstract: Embodiments of the present disclosure may generally relate to systems, apparatus, and/or processes directed to a manufacturing process flow for packages that include one or more glass layers that include patterning features, such as electrically conductive traces, RDLs, and vias within the packages. In embodiments, a package may include a glass layer with a first side and a second side opposite the first side, where the glass layer is a dielectric layer. The package may include another layer coupled with the first side of the glass layer, and a pattern on the second side of the glass layer to receive a deposited material in at least a portion of the pattern.