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公开(公告)号:US20220010452A1
公开(公告)日:2022-01-13
申请号:US17482513
申请日:2021-09-23
Applicant: Intel Corporation
Inventor: Chandrasekharan NAIR , Darko GRUJICIC , Rengarajan SHANMUGAM , Srinivasan RAMAN , Roy DITTLER , Daniel SOWA , Robert BARESEL, II , Marcel WALL , Rahul MANEPALLI
Abstract: The present disclosure is directed to an electroless plating process using a panel basket for holding semiconductor panels comprising a plurality of metal pads and shielding the metal pads from contaminants and over-etching and under-etching caused by the contaminants.