公开(公告)号：US20250112085A1

公开(公告)日：2025-04-03

申请号：US18375244

申请日：2023-09-29

Applicant: Intel Corporation

Inventor： Bohan Shan ,  Ziyin Lin ,  Haobo Chen ,  Yiqun Bai ,  Kyle Arrington ,  Jose Waimin ,  Ryan Carrazzone ,  Hongxia Feng ,  Dingying Xu ,  Srinivas Pietambaram ,  Minglu Liu ,  Seyyed Yahya Mousavi ,  Xinyu Li ,  Gang Duan ,  Wei Li ,  Bin Mu ,  Mohit Gupta ,  Jeremy Ecton ,  Brandon C. Marin ,  Xiaoying Guo ,  Ashay Dani

IPC: H01L21/762 ,  H01L21/768 ,  H01L23/00 ,  H01L23/498 ,  H01L23/538 ,  H01L25/065

Abstract: An apparatus is provided which comprises: a plurality of interconnect layers within a substrate, organic dielectric material over the plurality of interconnect layers, copper pads on a surface of a cavity within the organic dielectric material, an integrated circuit bridge device coupled with the copper pads, wherein a surface of the integrated circuit bridge device is elevated above an opening of the cavity, underfill material between the integrated circuit bridge device and the surface of the cavity, and build-up layers formed over the organic dielectric material around the integrated circuit bridge device. Other embodiments are also disclosed and claimed.