RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND
    2.
    发明申请
    RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND 有权
    辐射敏感性树脂组合物,抗蚀剂图案形成方法,酸发生器和化合物

    公开(公告)号:US20140342288A1

    公开(公告)日:2014-11-20

    申请号:US14282270

    申请日:2014-05-20

    Abstract: The present invention provides a radiation-sensitive resin composition that contains a polymer having a structural unit that includes an acid-labile group; and an acid generator, wherein the acid generator includes a compound including a sulfonate anion having SO3−, wherein a hydrogen atom or an electron-donating group bonds to an α carbon atom with respect to SO3−, and an electron-withdrawing group bonds to a β carbon atom with respect to SO3−; and a radiation-degradable onium cation. The compound preferably has a group represented by the following formula (1-1) or (1-2). In the following formulae (1-1) and (1-2), R1 and R2 each independently represent a hydrogen atom or a monovalent electron-donating group. R3 represent a monovalent electron-withdrawing group. R4 represents a hydrogen atom or a monovalent hydrocarbon group.

    Abstract translation: 本发明提供了含有具有包含酸不稳定基团的结构单元的聚合物的辐射敏感性树脂组合物, 和酸发生剂,其中酸产生剂包括包含具有SO 3 - 的磺酸根阴离子的化合物,其中氢原子或给电子基团相对于SO 3键与α碳原子键合,并且吸电子基团与 一个 碳原子相对于SO3-; 和辐射可降解的鎓阳离子。 该化合物优选具有下式(1-1)或(1-2)表示的基团。 在下式(1-1)和(1-2)中,R 1和R 2各自独立地表示氢原子或一价给电子基团。 R3表示一价吸电子基团。 R4表示氢原子或一价烃基。

    RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND RESIST PATTERN-FORMING METHOD
    3.
    发明申请
    RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND RESIST PATTERN-FORMING METHOD 有权
    辐射敏感性树脂组合物,聚合物和电阻形成方法

    公开(公告)号:US20130203000A1

    公开(公告)日:2013-08-08

    申请号:US13830880

    申请日:2013-03-14

    Abstract: A radiation-sensitive resin composition includes a polymer component, a radiation-sensitive acid generating agent, and a nitrogen-containing compound having a ring structure. The polymer component includes, in an identical polymer or different polymers, a first structural unit represented by a formula (1) and a second structural unit represented by a formula (2). R1 represents a hydrogen atom or a methyl group. Z is a group which represents a divalent monocyclic alicyclic hydrocarbon group taken together with R2. R2 represents a carbon atom. R3 represents a methyl group or an ethyl group. R4 represents a hydrogen atom or a methyl group. X is a group which represents a divalent bridged alicyclic hydrocarbon group having no less than 10 carbon atoms taken together with R5. R5 represents a carbon atom. R6 represents a branched alkyl group having 3 or 4 carbon atoms.

    Abstract translation: 辐射敏感性树脂组合物包括聚合物组分,辐射敏感性酸产生剂和具有环结构的含氮化合物。 聚合物组分包括在相同聚合物或不同聚合物中的由式(1)表示的第一结构单元和由式(2)表示的第二结构单元。 R1表示氢原子或甲基。 Z表示与R2一起取代的二价单环脂肪族烃基的基团。 R2表示碳原子。 R3表示甲基或乙基。 R4表示氢原子或甲基。 X表示与R5一起具有不少于10个碳原子的二价桥连脂环烃基的基团。 R5表示碳原子。 R6表示具有3或4个碳原子的支链烷基。

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