公开(公告)号：US5743838A

公开(公告)日：1998-04-28

申请号：US747775

申请日：1996-11-13

Applicant: James E. Willis

Inventor： James E. Willis

IPC: A63B21/04 ,  A63B21/055 ,  A63B21/16 ,  A63B21/02

CPC classification number: A63B21/0552 ,  A63B21/1609 ,  A63B21/04 ,  A63B21/0407 ,  A63B21/0442 ,  A63B21/0555 ,  A63B21/0557 ,  A63B21/1645 ,  A63B2208/0233

Abstract: A method and apparatus for an exercising device. The exercising device includes an elongated flexible body having a first extremity and a second extremity disposed to either side of a central portion and an elongated elastic member. The elongated elastic member includes a first end and a second end. The first and second ends are (i) adapted to accommodate a human limb and (ii) adapted to removably couple to the central portion of the elongated flexible body. A plurality of ring structures are disposed along an axis extending between the first extremity and the second extremity of the elongated flexible body, a first clip is disposed at the first end of the elongated elastic member and a second clip is disposed at the second end of the elongated elastic member. The first and second clips are adapted to couple the first and the second ends of the elongated elastic member to ones of the plurality of ring structures. The plurality of ring structures desirably includes a piece of cloth material sewn to the body so as to permanently capture flat portions of D-rings and attach the D-rings along the axis and to the elongated flexible body.

Abstract translation: 一种锻炼装置的方法和装置。 锻炼装置包括细长的柔性体，其具有设置在中心部分的任一侧和细长的弹性构件的第一末端和第二末端。 细长的弹性构件包括第一端和第二端。 第一和第二端是（i）适于容纳人的肢体和（ii）适于可移除地联接到细长的柔性体的中心部分。 沿着在细长柔性体的第一末端和第二末端之间延伸的轴线设置多个环形结构，第一夹子设置在细长弹性构件的第一端处，第二夹子设置在第二端部的第二端 细长的弹性构件。 第一和第二夹子适于将细长弹性构件的第一和第二端联接到多个环形结构中的一个。 多个环结构理想地包括缝合到主体的一块布料，以便永久地捕获D形环的平坦部分并且沿着轴线和细长的柔性体附接D形环。

公开(公告)号：US07763404B2

公开(公告)日：2010-07-27

申请号：US11535247

申请日：2006-09-26

Applicant: James E. Willis ,  Manuel Perez ,  Asao Yamashita

Inventor： James E. Willis ,  Manuel Perez ,  Asao Yamashita

IPC: G03F9/00

CPC classification number: G03B27/42 ,  G01N21/4788 ,  G01N21/956 ,  G01N2021/95615 ,  G03F7/40

Abstract: The present invention provides methods and system for improving the accuracy of measurements made using optical metrology. The present invention relates to methods and systems for changing the optical properties of tunable resists that can be used in the production of electronic devices such as integrated circuits. Further, the invention provides methods and systems for using a modifiable resist layer that provides a first set of optical properties before exposure and a second set of optical properties after exposure.

Abstract translation: 本发明提供了使用光学测量提高测量精度的方法和系统。 本发明涉及用于改变可用于生产诸如集成电路的电子器件的可调谐抗蚀剂的光学性质的方法和系统。 此外，本发明提供了用于使用在曝光之前提供第一组光学特性并且在曝光后提供第二组光学性质的可修改抗蚀剂层的方法和系统。

公开(公告)号：US07555395B2

公开(公告)日：2009-06-30

申请号：US11535320

申请日：2006-09-26

Applicant: James E. Willis ,  James E. Klekotka

Inventor： James E. Willis ,  James E. Klekotka

IPC: G06F19/00

CPC classification number: G03F7/70625 ,  G03F7/70516

Abstract: The present invention provides methods and system for improving the accuracy of measurements made using optical metrology. The present invention relates to methods and systems for changing the optical properties of tunable resists that can be used in the production of electronic devices such as integrated circuits. Further, the invention provides methods and systems for using a modifiable resist layer that provides a first set of optical properties before exposure and a second set of optical properties after exposure.

Abstract translation: 本发明提供了使用光学测量提高测量精度的方法和系统。 本发明涉及用于改变可用于生产诸如集成电路的电子器件的可调谐抗蚀剂的光学性质的方法和系统。 此外，本发明提供了用于使用在曝光之前提供第一组光学特性并且在曝光后提供第二组光学性质的可修改抗蚀剂层的方法和系统。

公开(公告)号：US20080076045A1

公开(公告)日：2008-03-27

申请号：US11535247

申请日：2006-09-26

Applicant: James E. Willis ,  Manuel Perez ,  Asao Yamashita

Inventor： James E. Willis ,  Manuel Perez ,  Asao Yamashita

IPC: G03B27/00 ,  G03C5/00 ,  G03B27/42

CPC classification number: G03B27/42 ,  G01N21/4788 ,  G01N21/956 ,  G01N2021/95615 ,  G03F7/40

Abstract: The present invention provides methods and system for improving the accuracy of measurements made using optical metrology. The present invention relates to methods and systems for changing the optical properties of tunable resists that can be used in the production of electronic devices such as integrated circuits. Further, the invention provides methods and systems for using a modifiable resist layer that provides a first set of optical properties before exposure and a second set of optical properties after exposure.

Abstract translation: 本发明提供了使用光学测量提高测量精度的方法和系统。 本发明涉及用于改变可用于生产诸如集成电路的电子器件的可调谐抗蚀剂的光学性质的方法和系统。 此外，本发明提供了用于使用在曝光之前提供第一组光学特性并且在曝光后提供第二组光学性质的可修改抗蚀剂层的方法和系统。

公开(公告)号：US20080077352A1

公开(公告)日：2008-03-27

申请号：US11535278

申请日：2006-09-26

Applicant: James E. Willis ,  James E. Klekotka

Inventor： James E. Willis ,  James E. Klekotka

IPC: G01B11/00

CPC classification number: G03F7/70625

Abstract: The present invention provides methods and system for improving the accuracy of measurements made using optical metrology. The present invention relates to methods and systems for changing the optical properties of tunable resists that can be used in the production of electronic devices such as integrated circuits. Further, the invention provides methods and systems for using a modifiable resist layer that provides a first set of optical properties before exposure and a second set of optical properties after exposure.

Abstract translation: 本发明提供了使用光学测量提高测量精度的方法和系统。 本发明涉及用于改变可用于生产诸如集成电路的电子器件的可调谐抗蚀剂的光学性质的方法和系统。 此外，本发明提供了用于使用在曝光之前提供第一组光学特性并且在曝光后提供第二组光学性质的可修改抗蚀剂层的方法和系统。

公开(公告)号：US20080076046A1

公开(公告)日：2008-03-27

申请号：US11535384

申请日：2006-09-26

Applicant: James E. Willis ,  James E. Klekotka

Inventor： James E. Willis ,  James E. Klekotka

IPC: G03C5/00

CPC classification number: G03F7/40 ,  G01N21/4788 ,  G01N21/95607 ,  G01N2021/95615

Abstract: The present invention provides methods and system for improving the accuracy of measurements made using optical metrology. The present invention relates to methods and systems for changing the optical properties of tunable resists that can be used in the production of electronic devices such as integrated circuits. Further, the invention provides methods and systems for using a modifiable resist layer that provides a first set of optical properties before exposure and a second set of optical properties after exposure.

公开(公告)号：US07300730B1

公开(公告)日：2007-11-27

申请号：US11535429

申请日：2006-09-26

Applicant: James E. Willis ,  James E. Klekotka

Inventor： James E. Willis ,  James E. Klekotka

IPC: G03C5/00

CPC classification number: G03F7/091

Abstract: The present invention provides methods and system for improving the accuracy of measurements made using optical metrology. The present invention relates to methods and systems for changing the optical properties of tunable resists that can be used in the production of electronic devices such as integrated circuits. Further, the invention provides methods and systems for using a modifiable resist layer that provides a first set of optical properties before exposure and a second set of optical properties after exposure.

Abstract translation: 本发明提供了使用光学测量提高测量精度的方法和系统。 本发明涉及用于改变可用于生产诸如集成电路的电子器件的可调谐抗蚀剂的光学性质的方法和系统。 此外，本发明提供了用于使用在曝光之前提供第一组光学特性并且在曝光后提供第二组光学性质的可修改抗蚀剂层的方法和系统。

公开(公告)号：US5663997A

公开(公告)日：1997-09-02

申请号：US379696

申请日：1995-01-27

Applicant: James E. Willis ,  Andrew L. Heilveil ,  Robert Dejaiffe

Inventor： James E. Willis ,  Andrew L. Heilveil ,  Robert Dejaiffe

IPC: G01N23/223

CPC classification number: G01N23/223 ,  G01N2223/076

Abstract: A method and apparatus for determining the composition of glass, and for sorting glass according to composition. Glass of unknown composition is irradiated and an x-ray fluorescence spectrum is detected from the glass. The detected x-ray fluorescence spectrum is then compared with a plurality of fluorescence spectra corresponding to glasses of known composition. The glass of unknown composition is then determined to correspond in composition to the glass of known composition having an x-ray fluorescence spectrum most closely matching the spectrum detected from the glass of unknown composition. The glass may then be sorted according to determined composition. In operation, a substantially continuous stream of glass pieces is irradiated and detected while the stream is moving. Once the composition of a piece of glass in the stream is determined, it is diverted into an appropriate container of like compositioned glass.

Abstract translation: 一种用于确定玻璃的组成以及根据组成分选玻璃的方法和装置。 照射未知组成的玻璃并从玻璃检测出X射线荧光光谱。 然后将检测到的X射线荧光光谱与对应于已知组合物的玻璃的多个荧光光谱进行比较。 然后确定未知组合物的玻璃与已知组合物的玻璃相符，其具有与未知组合物玻璃检测到的光谱最接近的x射线荧光光谱。 然后可以根据确定的组成对玻璃进行分类。 在操作中，当流移动时，照射并检测基本连续的玻璃片流。 一旦确定了流中的一块玻璃的组成，就将其转入合适的类似玻璃的容器中。

公开(公告)号：US07477960B2

公开(公告)日：2009-01-13

申请号：US11058321

申请日：2005-02-16

Applicant: James E. Willis ,  Merritt Funk ,  Kevin Lally ,  Kevin Pinto ,  Masayuki Tomoyasu ,  Raymond Peterson ,  Radha Sundararajan

Inventor： James E. Willis ,  Merritt Funk ,  Kevin Lally ,  Kevin Pinto ,  Masayuki Tomoyasu ,  Raymond Peterson ,  Radha Sundararajan

IPC: G06F19/00

CPC classification number: G05B19/4184 ,  G05B2219/31356 ,  G05B2219/32179 ,  G05B2219/45031 ,  Y02P80/40 ,  Y02P90/14 ,  Y02P90/20 ,  Y02P90/22 ,  Y02P90/86

Abstract: A method for implementing FDC in an APC system including receiving an FDC model from memory; providing the FDC model to a process model calculation engine; computing a vector of predicted dependent process parameters using the process model calculation engine; receiving a process recipe comprising a set of recipe parameters, providing the process recipe to a process module; executing the process recipe to produce a vector of measured dependent process parameters; calculating a difference between the vector of predicted dependent process parameters and the vector of measured dependent process parameters; comparing the difference to a threshold value; and declaring a fault condition when the difference is greater than the threshold value.

Abstract translation: 一种用于在APC系统中实现FDC的方法，包括从存储器接收FDC模型; 将FDC模型提供给过程模型计算引擎; 使用过程模型计算引擎计算预测的依赖过程参数的向量; 接收包括一组配方参数的处理配方，向处理模块提供处理配方; 执行过程配方以产生测量的依赖过程参数的向量; 计算预测的依赖过程参数的向量与测量的依赖过程参数的向量之间的差; 将差值与阈值进行比较; 并且当差值大于阈值时声明故障状况。

公开(公告)号：US20080077362A1

公开(公告)日：2008-03-27

申请号：US11535320

申请日：2006-09-26

Applicant: James E. Willis ,  James E. Klekotka

Inventor： James E. Willis ,  James E. Klekotka

IPC: G06F15/00 ,  G06F15/18 ,  G01B11/30

CPC classification number: G03F7/70625 ,  G03F7/70516

Abstract: The present invention provides methods and system for improving the accuracy of measurements made using optical metrology. The present invention relates to methods and systems for changing the optical properties of tunable resists that can be used in the production of electronic devices such as integrated circuits. Further, the invention provides methods and systems for using a modifiable resist layer that provides a first set of optical properties before exposure and a second set of optical properties after exposure.

Abstract translation: 本发明提供了使用光学测量提高测量精度的方法和系统。 本发明涉及用于改变可用于生产诸如集成电路的电子器件的可调谐抗蚀剂的光学性质的方法和系统。 此外，本发明提供了用于使用在曝光之前提供第一组光学特性并且在曝光后提供第二组光学性质的可修改抗蚀剂层的方法和系统。