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    FURAZANOBENZIMIDAZOLES AS PRODRUGS TO TREAT NEOPLASTIC OR AUTOIMMUNE DISEASES
    4.
    发明申请
    FURAZANOBENZIMIDAZOLES AS PRODRUGS TO TREAT NEOPLASTIC OR AUTOIMMUNE DISEASES 有权
    作为PROPRUGS治疗神经性或自身免疫性疾病的FURAZANOBENZIMIDAZOLES

    公开(公告)号：US20120264792A1

    公开(公告)日：2012-10-18

    申请号：US13384467

    申请日：2010-07-26

    申请人： Jens Pohlmann ,  Felix Bachmann

    发明人： Jens Pohlmann ,  Felix Bachmann

    IPC分类号： A61K31/4245 ,  A61P37/06 ,  A61P37/00 ,  C07D413/04 ,  A61P35/00

    CPC分类号： C07D413/04

    摘要： A compound of formula (II) wherein represents a divalent benzene residue which is unsubstituted or substituted by one or two additional substituents independently selected from lower alkyl, halo-lower alkyl, hydroxy-lower alkyl, lower alkoxy-lower alkyl, acyloxy-lower alkyl, phenyl, hydroxy, lower alkoxy, hydroxy-lower alkoxy, lower alkoxy-lower alkoxy, phenyl-lower alkoxy, lower alkylcarbonyloxy, amino, mono(lower alkyl)amino, di(lower alkyl)amino, mono(lower alkenyl)amino, di(lower alkenyl)amino, lower alkoxycarbonylamino, lower alkylcarbonylamino, substituted amino wherein the two substituents on nitrogen form together with the nitrogen heterocyclyl, lower alkylcarbonyl, carboxy, lower alkoxycarbonyl, cyano, halogen, and nitro; or wherein two adjacent substituents can be methylenedioxy; or a divalent pyridine residue (Z=N) which is unsubstituted or substituted additionally by lower alkyl, lower alkoxy, lower alkoxy-lower alkoxy, amino, optionally substituted by one or two substituents selected from lower alkyl, lower alkenyl and alkylcarbonyl, halo-lower alkyl, lower alkoxy-lower alkyl, or halogen; R1 represents hydrogen, lower alkylcarbonyl, hydroxy-lower alkyl or cyano-lower alkyl; and R2 represents a group selected from: or pharmaceutically acceptable salts thereof.

    摘要翻译： 式（II）的化合物，其表示未取代的或被一个或两个独立地选自低级烷基，卤代低级烷基，羟基 - 低级烷基，低级烷氧基 - 低级烷基，酰氧基 - 低级烷基 苯基，羟基，低级烷氧基，羟基 - 低级烷氧基，低级烷氧基 - 低级烷氧基，苯基 - 低级烷氧基，低级烷基羰基氧基，氨基，单（低级烷基）氨基，二（低级烷基）氨基，单（低级烯基）氨基， 二（低级烯基）氨基，低级烷氧基羰基氨基，低级烷基羰基氨基，取代氨基，其中氮上的两个取代基与氮杂环基，低级烷基羰基，羧基，低级烷氧基羰基，氰基，卤素和硝基形成。 或其中两个相邻的取代基可以是亚甲二氧基; 或未经取代或被低级烷基，低级烷氧基，低级烷氧基 - 低级烷氧基取代的二价吡啶残基（Z = N），任选被一个或两个选自低级烷基，低级烯基和烷基羰基，卤代烷基， 低级烷基，低级烷氧基 - 低级烷基或卤素; R 1表示氢，低级烷基羰基，羟基 - 低级烷基或氰基 - 低级烷基; 并且R 2表示选自下列的基团：或其药学上可接受的盐。