摘要:
According to the invention, configurations of X-windings and Y-windings in a synchronous permanent planar motor are improved, X-windings and Y-windings overlap in the direction normal to the planar magnet array and distribute on the entire surface of the thrust core, such that effective wires in the X-windings and Y-windings are lengthened and increased in number, therefore the electromagnetic force generated by the SPMPM of this invention is increased correspondingly; X-windings and Y-windings are mounted on a thrust core made of iron material, thus the electromagnetic force is further increased; in addition, two separated anti-yawing member are provided on the mover for counteracting yawing of the mover, accordingly interference between anti-yawing torque and the electromagnetic force for propelling is eliminated.
摘要:
According to the invention, configurations of X-windings and Y-windings in a synchronous permanent planar motor are improved, X-windings and Y-windings overlap in the direction normal to the planar magnet array and distribute on the entire surface of the thrust core, such that effective wires in the X-windings and Y-windings are lengthened and increased in number, therefore the electromagnetic force generated by the SPMPM of this invention is increased correspondingly; X-windings and Y-windings are mounted on a thrust core made of iron material, thus the electromagnetic force is further increased; in addition, two separated anti-yawing member are provided on the mover for counteracting yawing of the mover, accordingly interference between anti-yawing torque and the electromagnetic force for propelling is eliminated.
摘要:
A dual-stage switching system for lithographic machine includes a wafer stage to be operated in an exposure station and another wafer stage to be operated in a pre-processing station. The two wafer stages are provided on a base, with four 2-DOF driving units capable of moving along X direction and Y direction being provided along the edge of the base, and the wafer stages being disposed in a space surrounded by the four 2-DOF driving units and suspended on an upper surface of the base by air bearings. Each of the 2-DOF driving units includes upper and lower linear guides and a guiding sleeve, with the upper and lower linear guides being installed vertical to each other in their corresponding guiding sleeve. Two adjacent 2-DOF driving units cooperatively drive the wafer stage) to move in the X direction and Y direction.
摘要:
This invention discloses a scanning mechanism of an ion implanter. The mechanism is a PR-PRR type parallel mechanism with two subchains and two DOFs, driving the wafer holder to scan when the first subchain and the second subchain are translated in the same direction at the same speed and adjusting the rotational angle of the wafer holder when the first moving link (30) and the second moving link (32) in the first subchain and the second subchain have different translation amounts in the same direction or opposite directions. The driving motor for the scanning mechanism is provided outside the implant chamber. The invention also solves problems like low rigidity and large accumulation errors of existing serial scanning mechanisms and the effect of the electromagnetic field of the motor within the ion implant chamber on the trajectory of the ion beam.
摘要:
A nanometer precision six-DOF magnetic suspension micro-stage and the application thereof are provided which are mainly used in semiconductor photolithography devices. The micro-stage includes a cross support and four two-DOF actuators. Each 2-DOF actuator comprises a vertically polarized permanent magnet, a horizontal force coil and a vertical force coil; the permanent magnet being mounted on an end of the cross support, the horizontal force coil and the vertical force coil being arranged on a side of and below the permanent magnet respectively and being spaced apart from the permanent magnet; the cross support and four vertically polarized permanent magnets constitute a mover of the micro-stage; the horizontal force coil and the vertical force coil being fixed by a coil framework respectively and constituting a stator of the micro-stage; and the stator being mounted on a base of the micro-stage. A dual-wafer table positioning system of a photolithography machine may be constructed by two said micro-stages in combination with a two-DOF large stroke linear motor. The present invention features simple structure, large driving force, small mass and absence of cable disturbance, and is possible to realize high precision, high acceleration six-DOF micro-motion.
摘要:
A two-dimensional locating method of a motion platform based on a magnetic steel array involves the following steps: placing more than four linear Hall sensors at any different positions within one or more polar distances of the magnetic steel array on the surface of the motion platform in a motion system; determining a magnetic flux density distribution model according to the magnetic steel array; determining the mounting positions of the above-mentioned linear Hall sensors, which are converted into phases with respect to the mass center of the motion platform; recording the magnetic flux density measured values of the linear Hall sensors as the motion proceeds; solving the phases of the mass center of the motion platform in a plane, with the measured values being served as observed quantities and the magnetic flux density distribution model being served as a computation model; and determining the position of the mass center of the motion platform with respect to an initial phase according to the phase, so as to realize the planar location of the motion platform. The present invention provides a simple, fast and robust method for computing mass center positions for a motion system containing a magnetic steel array.
摘要:
A micro stage with 6 degrees of freedom used in super-precise processing and sensing equipment filed is disclosed. The micro stage has three sets of electromagnetic driving units arranged in a horizontal plane for driving the micro stage to obtain movements within the horizontal plane with 3 degrees of freedom in X, Y and θz directions and three electromagnetic driving units arranged in a vertical direction for driving the micro stage to obtain additional movements with 3 degrees of freedom in Z, θx and θy directions. Direct driving by electromagnetic force is used in the invention, resulting in advantages over stacked structures of having a simple structure, a compact profile, a low driven weight center, low stator inertia, etc. Thus, there is no mechanical friction and damping, and high displacement resolution can be provided. The positioning error of a wafer table of a lithographic machine can be compensated, and the leveling and focusing of the lithographic machine can be achieved. The invention is also applicable in super-precise processing and sensing fields for achieving 6 degree-of-freedom motions. The micro stage, which operates on the basis of Lorentz Law, provides a linear relation between the output pushing force and the input electrical current, and thus the movement control technique for it can be well established.
摘要:
A two-dimensional locating method of a motion platform based on a magnetic steel array involves the following steps: placing more than four linear Hall sensors at any different positions within one or more polar distances of the magnetic steel array on the surface of the motion platform in a motion system; determining a magnetic flux density distribution model according to the magnetic steel array; determining the mounting positions of the above-mentioned linear Hall sensors, which are converted into phases with respect to the mass center of the motion platform; recording the magnetic flux density measured values of the linear Hall sensors as the motion proceeds; solving the phases of the mass center of the motion platform in a plane, with the measured values being served as observed quantities and the magnetic flux density distribution model being served as a computation model; and determining the position of the mass center of the motion platform with respect to an initial phase according to the phase, so as to realize the planar location of the motion platform. The present invention provides a simple, fast and robust method for computing mass center positions for a motion system containing a magnetic steel array.
摘要:
A dual-stage switching system for lithographic machine includes a wafer stage to be operated in an exposure station and another wafer stage to be operated in a pre-processing station. The two wafer stages are provided on a base, with four 2-DOF driving units capable of moving along X direction and Y direction being provided along the edge of the base, and the wafer stages being disposed in a space surrounded by the four 2-DOF driving units and suspended on an upper surface of the base by air bearings. Each of the 2-DOF driving units includes upper and lower linear guides and a guiding sleeve, with the upper and lower linear guides being installed vertical to each other in their corresponding guiding sleeve. Two adjacent 2-DOF driving units cooperatively drive the wafer stage) to move in the X direction and Y direction.
摘要:
A micro stage with 6 degrees of freedom used in super-precise processing and sensing equipment fields is disclosed. The micro stage has three sets of electromagnetic driving units arranged in a horizontal plane for driving the micro stage to obtain movements within the horizontal plane with 3 degrees of freedom in X, Y and θz directions and three electromagnetic driving units arranged in a vertical direction for driving the micro stage to obtain additional movements with 3 degrees of freedom in Z, θx and θy directions. Direct driving by electromagnetic force is used in the invention. The invention is also applicable in super-precise processing and sensing fields for achieving 6 degree-of-freedom motions. The micro stage, which operates on the basis of Lorentz Law, provides a linear relation between the output pushing force and the input electrical current.