公开(公告)号：US6001446A

公开(公告)日：1999-12-14

申请号：US884266

申请日：1997-06-27

申请人： Junji Nakada ,  Makoto Kashiwaya ,  Kunihiko Sano

发明人： Junji Nakada ,  Makoto Kashiwaya ,  Kunihiko Sano

IPC分类号： G11B5/66 ,  G11B5/64 ,  G11B5/667 ,  G11B5/73 ,  G11B5/738 ,  G11B5/84 ,  G11B5/85 ,  G11B5/851

CPC分类号： G11B5/7325 ,  G11B5/656 ,  G11B5/8404 ,  G11B5/851 ,  Y10S428/90 ,  Y10T428/265

摘要： A magnetic recording medium 101 constituted by a nonmagnetic support 101 made from a high polymer film having a thickness in a range of from 10 .mu.m to 200 .mu.m, a nonmagnetic subbing layer 102 made from a Cr alloy and formed on at least one of opposite surfaces of the nonmagnetic support 101 in the form of a film by sputtering, and a magnetic layer 103 made from a Co alloy and formed on the nonmagnetic subbing layer 102 in the form of a film by sputtering. Preferably, the magnetic recording medium 101 further has a protective layer 104 made from diamond-like carbon, and a lubricating layer 105 made from a hydrocarbon or fluorocarbon lubricant.

摘要翻译： 由厚度为10μm〜200μm的高分子膜制成的非磁性支撑体101构成的磁记录介质101，由Cr合金制成的非磁性层叠层102， 通过溅射形成膜的非磁性支撑体101的相对表面，以及由Co合金制成的磁性层103，并通过溅射形成在非磁性层压层102上。 优选地，磁记录介质101还具有由类金刚石碳制成的保护层104和由碳氢化合物或碳氟化合物润滑剂制成的润滑层105。

公开(公告)号：US06688951B2

公开(公告)日：2004-02-10

申请号：US09534555

申请日：2000-03-27

申请人： Makoto Kashiwaya ,  Junji Nakada

发明人： Makoto Kashiwaya ,  Junji Nakada

IPC分类号： B24B700

CPC分类号： B41J2/3353 ,  B24B19/26 ,  B24B21/004 ,  B24B27/0023

摘要： A thermal head lapping apparatus includes a pallet for holding at least one thermal head, a transport device for transporting the thermal head held on the pallet successively to a specified processing position, and a lapping device for forcing a lapping material being moved onto the thermal head that has been transported to said processing position. As a result, the apparatus is capable of advantageously performing lapping treatment with a good efficiency on surfaces to be coated with protective layers or the formed protective layers in a process of fabricating a thermal head, thereby improving the production efficiency of the thermal head and fabricating with a good productivity the suitably lapped thermal head of high quality that ensures high quality image recording.

摘要翻译： 一种热头研磨装置，包括用于保持至少一个热敏头的托盘，用于将保持在托盘上的热敏头连续运送到指定加工位置的运送装置，以及用于迫使研磨材料移动到热敏头上的研磨装置 已经被运送到所述处理位置。 结果，该装置能够在制造热敏头的过程中有利地在保护层或形成的保护层的表面上以良好的效率执行研磨处理，从而提高热敏头的生产效率和制造 具有良好的生产效率，适合搭配高品质的热敏头，确保高质量的图像记录。

公开(公告)号：US06748959B1

公开(公告)日：2004-06-15

申请号：US09534207

申请日：2000-03-24

申请人： Makoto Kashiwaya ,  Junji Nakada

发明人： Makoto Kashiwaya ,  Junji Nakada

IPC分类号： C25F500

CPC分类号： C23C14/0605 ,  C23C14/564 ,  C23C16/26 ,  C23C16/4407

摘要： The carbon layer forming method starts a film deposition process of a carbon layer by vapor phase deposition after a content of particles having a particle size of 0.5 &mgr;m or more is adjusted in a film deposition system of the carbon layer to 1000 particles/ft3/min or less. The carbon layer forming method by means of a vapor phase deposition technique such as sputtering or CVD ensures that a high-quality carbon layer having significantly reduced pinholes or cracks can be obtained. Since the carbon protective layer obtained by this method has no cracking and delamination due to pinholes and cracks, the thermal head having the carbon protective layer has a sufficient durability to ensure that high reliability is exhibited over an extended period of time to perform thermal recording of high-quality images consistently over an extended period of operation.

摘要翻译： 碳层形成方法在碳层的成膜体系中调整粒径为0.5μm以上的粒子的含量为1000个/ ft 3以上后，通过气相沉积开始碳层的成膜处理 > / min以内。 通过诸如溅射或CVD的气相沉积技术的碳层形成方法确保可以获得具有显着减小的针孔或裂纹的高质量碳层。 由于通过该方法获得的碳保护层由于针孔和裂纹而没有破裂和分层，所以具有碳保护层的热敏头具有足够的耐久性，以确保在延长的时间段内显示高可靠性以进行热记录 高质量的图像在长时间的运行中始终如一。

公开(公告)号：US06316054B1

公开(公告)日：2001-11-13

申请号：US09534568

申请日：2000-03-27

申请人： Makoto Kashiwaya ,  Junji Nakada

发明人： Makoto Kashiwaya ,  Junji Nakada

IPC分类号： C23C1600

CPC分类号： B41J2/3355 ,  B41J2/3359 ,  C23C14/0605 ,  C23C14/541 ,  Y02T50/67

摘要： The method of forming a carbon layer by vapor phase deposition starts a film deposition process of the carbon layer after a surface to be coated with the carbon layer is heated while adjusting a partial pressure of moisture in a film deposition system of the carbon layer to 5×10−6 Torr or less. This carbon layer forming method by means of a vapor phase deposition technique such as sputtering ensures that a high-quality carbon layer having high adhesion to the lower layer and significantly reduced pinholes or cracks is obtained.

摘要翻译： 通过气相沉积形成碳层的方法开始在碳层被涂覆的表面被加热之后碳层的成膜过程，同时将碳层的膜沉积系统中的水分分压调节至5×10 -6托或更低。 通过诸如溅射的气相沉积技术的该碳层形成方法确保了获得对下层具有高粘附性和显着降低针孔或裂缝的高质量碳层。

公开(公告)号：US20070138410A1

公开(公告)日：2007-06-21

申请号：US11640995

申请日：2006-12-19

申请人： Takeo Kido ,  Makoto Kashiwaya ,  Junji Nakada

发明人： Takeo Kido ,  Makoto Kashiwaya ,  Junji Nakada

IPC分类号： G01J1/58 ,  G01N21/64 ,  G01T1/00

CPC分类号： G01T1/202 ,  C23C14/0042 ,  C23C14/10 ,  G01J1/58

摘要： A gas barrier film includes a substrate film and a gas barrier layer formed on the substrate film. The gas barrier layer is an inorganic compound layer that is made of an inorganic compound having a grain size of 3 nm to 20 nm and has grain boundaries at intervals of 1 nm to 20 nm. A stimulable phosphor panel includes a substrate, a stimulable phosphor layer formed on the substrate and the gas barrier film with which the stimulable phosphor layer is covered and sealed. A gas barrier film producing method prepares the substrate film and performs impedance controlled reactive sputtering on the substrate film at a film deposition pressure of 0.01 Pa to 0.13 Pa to form the gas barrier layer on the substrate film to thereby produce the gas barrier film.

摘要翻译： 阻气膜包括基板膜和形成在基板膜上的阻气层。 阻气层是由粒径为3nm〜20nm的无机化合物构成的无机化合物层，其间隔为1nm〜20nm。 可刺激的荧光体面板包括基板，形成在基板上的可激励荧光体层和可刺激的荧光体层被覆盖和密封的阻气膜。 阻气膜制造方法在0.01Pa〜0.13Pa的成膜压力下，在基板膜上准备基板膜并进行阻抗控制的反应溅射，以在基板膜上形成阻气层，从而产生阻气膜。

公开(公告)号：US20050056798A1

公开(公告)日：2005-03-17

申请号：US10917510

申请日：2004-08-13

申请人： Makoto Kashiwaya ,  Junji Nakada ,  Yasuo Iwabuchi

发明人： Makoto Kashiwaya ,  Junji Nakada ,  Yasuo Iwabuchi

IPC分类号： G21K4/00 ,  C09K11/02 ,  C09K11/61 ,  C09K11/77 ,  C23C14/06 ,  C23C14/24 ,  G01T1/00

CPC分类号： G21K4/00 ,  C09K11/7733 ,  C23C14/0694 ,  C23C14/228 ,  C23C14/24

摘要： The process and apparatus introduce a carrier gas into a vacuum evaporation chamber, evaporate a film forming material from a evaporation source and deposit the evaporated film forming material on a substrate in sheet form to form a stimulable phosphor layer, thereby producing a evaporated phosphor sheet having a stimulable phosphor layer formed on the substrate. The stimulable phosphor layer is formed with substantially all areas of the evaporation source except opening for evaporation being masked to block movement of heat toward the substrate. The evaporated phosphor sheet includes the substrate and a CsBr:Eu evaporated stimulable phosphor layer deposited on the substrate. A maximum intensity of instantaneous light emission from the stimulable phosphor layer at 640 nm upon excitation by uv radiation is lower than a maximum intensity of the instantaneous light emission at 440 nm.

摘要翻译： 该方法和装置将载气引入真空蒸发室，从蒸发源蒸发成膜材料，并将薄膜形成材料以片状形式沉积在基板上，形成可刺激的荧光体层，从而产生蒸发的荧光体片， 形成在基板上的可激发的荧光体层。 可激发的荧光体层形成有蒸发源的基本上所有区域，除了用于蒸发的开口被掩蔽以阻止热量朝向衬底的移动。 蒸发的荧光体片材包括基底和沉积在基底上的CsBr：Eu蒸发的可激发的荧光体层。 通过紫外线辐射激发时，640nm处的可刺激荧光体层的瞬时发光的最大强度低于440nm处的瞬时发光的最大强度。

公开(公告)号：US06558563B2

公开(公告)日：2003-05-06

申请号：US09822872

申请日：2001-04-02

申请人： Makoto Kashiwaya ,  Junji Nakada

发明人： Makoto Kashiwaya ,  Junji Nakada

IPC分类号： B44C122

CPC分类号： B41J2/3353 ,  B41J2/3355 ,  B41J2/3357 ,  B41J2/3359

摘要： A thermal head fabricating method forms a lower protective layer made of ceramics for protecting a plurality of heat-generating resistors and electrodes, subjects the lower protective layer to etching processing by a plasma and forms a carbon protective layer on the thus subjected lower protective layer. The etching processing is performed using a mask which defines an area where the carbon protective layer is formed, a protective layer is formed on a surface of the mask, and the protective layer is made of a material which is etched at an extremely slow rate or substantially not etched compared with ceramics composing the lower protective layer and/or which does not impart an adverse effect to the carbon protective layer that is subsequently formed.

摘要翻译： 热敏头制造方法形成由陶瓷制成的下保护层，用于保护多个发热电阻器和电极，使下保护层通过等离子体进行蚀刻处理，并在如此承受的下保护层上形成碳保护层。 使用限定形成碳保护层的区域的掩模进行蚀刻处理，在掩模的表面上形成保护层，并且保护层由以非常慢的速度蚀刻的材料制成，或 与构成下保护层的陶瓷基本上不被蚀刻和/或不对随后形成的碳保护层产生不利影响。

公开(公告)号：US06243941B1

公开(公告)日：2001-06-12

申请号：US09356506

申请日：1999-07-19

申请人： Makoto Kashiwaya ,  Junji Nakada

发明人： Makoto Kashiwaya ,  Junji Nakada

IPC分类号： H05B300

CPC分类号： B41J2/3353 ,  B41J2/3355 ,  B41J2/3357 ,  B41J2/3359 ,  Y10T29/49083

摘要： The thermal head fabrication method provides a thermal head having a lower protective layer composed of at least one sub-layer on heat generators and electrodes, an intermediate protective layer composed of at least one sub-layer on the lower protective layer and an upper protective layer composed of at least one sub-layer with carbon as a main component on the intermediate protective layer. At least one of surfaces of the lower and intermediate protective layers is cleaned by ion irradiation processing, by polishing with a lapping tape or an adhesive tape, or by heating processing in vacuum before forming a higher protective layer. This allows the thermal head to have excellent adhesion between any individual layers and sufficient durability to ensure that the thermal recording of high-quality images is consistently performed over an extended period of time.

摘要翻译： 热头制造方法提供了一种热敏头，其具有由热发生器和电极上的至少一个子层组成的下保护层，由下保护层上的至少一个子层构成的中间保护层和上保护层 由在中间保护层上具有碳作为主要成分的至少一个子层组成。 通过离子辐射处理，通过研磨带或粘合带的研磨，或者在形成较高的保护层之前通过在真空中进行加热处理来清洁下部和中间保护层的至少一个表面。 这允许热敏头在任何单独的层之间具有优异的附着力和足够的耐久性，以确保高质量图像的热记录在长时间内一致地进行。

公开(公告)号：US07217944B2

公开(公告)日：2007-05-15

申请号：US10917510

申请日：2004-08-13

申请人： Makoto Kashiwaya ,  Junji Nakada ,  Yasuo Iwabuchi

发明人： Makoto Kashiwaya ,  Junji Nakada ,  Yasuo Iwabuchi

IPC分类号： G01N23/04

CPC分类号： G21K4/00 ,  C09K11/7733 ,  C23C14/0694 ,  C23C14/228 ,  C23C14/24

摘要： The process and apparatus introduce a carrier gas into a vacuum evaporation chamber, evaporate a film forming material from a evaporation source and deposit the evaporated film forming material on a substrate in sheet form to form a stimulable phosphor layer, thereby producing a evaporated phosphor sheet having a stimulable phosphor layer formed on the substrate. The stimulable phosphor layer is formed with substantially all areas of the evaporation source except opening for evaporation being masked to block movement of heat toward the substrate. The evaporated phosphor sheet includes the substrate and a CsBr:Eu evaporated stimulable phosphor layer deposited on the substrate. A maximum intensity of instantaneous light emission from the stimulable phosphor layer at 640 nm upon excitation by uv radiation is lower than a maximum intensity of the instantaneous light emission at 440 nm.

摘要翻译： 该方法和装置将载气引入真空蒸发室，从蒸发源蒸发成膜材料，并将薄膜形成材料以片状形式沉积在基板上，形成可刺激的荧光体层，从而产生蒸发的荧光体片， 形成在基板上的可激发的荧光体层。 可激发的荧光体层形成有蒸发源的基本上所有区域，除了用于蒸发的开口被掩蔽以阻止热量朝向衬底的移动。 蒸发的荧光体片材包括基底和沉积在基底上的CsBr：Eu蒸发的可激发的荧光体层。 通过紫外线辐射激发时，640nm处的可刺激荧光体层的瞬时发光的最大强度低于440nm处的瞬时发光的最大强度。

公开(公告)号：US20070048400A1

公开(公告)日：2007-03-01

申请号：US11515426

申请日：2006-09-05

申请人： Makoto Kashiwaya ,  Junji Nakada ,  Norio Shibata

发明人： Makoto Kashiwaya ,  Junji Nakada ,  Norio Shibata

IPC分类号： B29C59/04

CPC分类号： C23C14/562 ,  C23C14/042

摘要： The apparatus for producing sheeting includes a transport unit which transports a web of sheeting along its length direction, a pattern transfer unit which forms a pattern on a surface of the sheeting by transfer and that is provided in a pathway where the web of sheeting is transported by the transport unit, a film depositing unit which performs vacuum film deposition on the patterned surface of the web of sheeting and that is provided downstream of the pattern transfer unit in the pathway, and a pressure retaining unit which retains pressure within the film depositing unit and that is provided in a region of the film depositing unit into which the web of sheeting is transported and in a region of the film depositing unit from which the web of sheeting emerges.

摘要翻译： 用于生产片材的设备包括：输送单元，其沿长度方向输送片材幅材;图案转印单元，其通过转印在片材的表面上形成图案，并且设置在片材的幅材被输送的路径中 通过所述传送单元，在所述片材的幅材的图案化表面上进行真空膜沉积并且设置在所述路径中的图案转印单元的下游的膜沉积单元，以及保持在所述膜沉积单元内的压力的压力保持单元 并且其设置在成膜单元的区域中，片材的幅材被输送到该区域中，并且在成膜单元的区域中，片材幅材从该区域出现。