公开(公告)号：US11328411B2

公开(公告)日：2022-05-10

申请号：US17246034

申请日：2021-04-30

Applicant: KLA Corporation

Inventor： Hong Chen ,  Kenong Wu ,  Xiaochun Li ,  James A. Smith ,  Eugene Shifrin ,  Qing Luo ,  Michael Cook ,  Wei Si ,  Leon Yu ,  Bjorn Brauer ,  Nurmohammed Patwary ,  Ramon Ynzunza ,  Neil Troy

IPC: G06T7/00 ,  G01N21/88 ,  G01N21/95

Abstract: Systems and methods for detecting defects on a reticle are provided. One system includes computer subsystem(s) configured for performing at least one repeater defect detection step in front-end processing during an inspection process performed on a wafer having features printed in a lithography process using a reticle. The at least one repeater defect detection step performed in the front-end processing includes identifying any defects detected at corresponding locations in two or more test images by double detection and any defects detected by stacked defect detection as first repeater defect candidates. One or more additional repeater defect detections may be performed on the first repeater defect candidates to generate final repeater defect candidates and identify defects on the reticle from the final repeater defect candidates.

公开(公告)号：US20240161272A1

公开(公告)日：2024-05-16

申请号：US18342609

申请日：2023-06-27

Applicant: KLA Corporation

Inventor： Sangbong Park ,  Ge Cong ,  Eugene Shifrin ,  Richard Wallingford

IPC: G06T7/00 ,  G06T5/50

CPC classification number: G06T7/001 ,  G06T5/50 ,  G06T2207/20081 ,  G06T2207/20224 ,  G06T2207/30148 ,  G06T2207/30168

Abstract: Methods and systems for detecting defects on a specimen are provided. One method includes generating first and second mode test, reference, and difference images of a specimen for first and second modes of an inspection subsystem, respectively. The method also includes combining the first and second mode test images, the first and second mode reference images, and the first and second mode difference images as an input for defect detection. In addition, the method includes detecting defects on the specimen based on at least the first and second mode difference images.

公开(公告)号：US11778720B2

公开(公告)日：2023-10-03

申请号：US17028902

申请日：2020-09-22

Applicant: KLA Corporation

Inventor： Matthew Derstine ,  Ilya Bezel ,  Anatoly Shchemelinin ,  Eugene Shifrin

IPC: H05G2/00 ,  H01S3/131 ,  H05H1/46

CPC classification number: H05G2/008 ,  H01S3/1312 ,  H05H1/46

Abstract: A system for generating laser sustained broadband light includes a pump source configured to generate a pumping beam, a gas containment structure for containing a gas and a multi-pass optical assembly. The multi-pass optical assembly includes one or more optical elements configured to perform a plurality of passes of the pumping beam through a portion of the gas to sustain a broadband-light-emitting plasma. The one or more optical elements are arranged to collect an unabsorbed portion of the pumping beam transmitted through the plasma and direct the collected unabsorbed portion of the pumping beam back into the portion of the gas.

公开(公告)号：US20210342992A1

公开(公告)日：2021-11-04

申请号：US17246034

申请日：2021-04-30

Applicant: KLA Corporation

Inventor： Hong Chen ,  Kenong Wu ,  Xiaochun Li ,  James A. Smith ,  Eugene Shifrin ,  Qing Luo ,  Michael Cook ,  Wei Si ,  Leon Yu ,  Bjorn Brauer ,  Nurmohammed Patwary ,  Ramon Ynzunza ,  Neil Troy

IPC: G06T7/00 ,  G01N21/88 ,  G01N21/95

Abstract: Systems and methods for detecting defects on a reticle are provided. One system includes computer subsystem(s) configured for performing at least one repeater defect detection step in front-end processing during an inspection process performed on a wafer having features printed in a lithography process using a reticle. The at least one repeater defect detection step performed in the front-end processing includes identifying any defects detected at corresponding locations in two or more test images by double detection and any defects detected by stacked defect detection as first repeater defect candidates. One or more additional repeater defect detections may be performed on the first repeater defect candidates to generate final repeater defect candidates and identify defects on the reticle from the final repeater defect candidates.

公开(公告)号：US20210231292A1

公开(公告)日：2021-07-29

申请号：US17228543

申请日：2021-04-12

Applicant: KLA Corporation

Inventor： Ilya Bezel ,  Anatoly Shchemelinin ,  Eugene Shifrin ,  Matthew Panzer ,  Matthew Derstine ,  Jincheng Wang ,  Anant Chimmalgi ,  Rajeev Patil ,  Rudolf Brunner

IPC: F21V9/06 ,  H01J61/52 ,  H01J61/12 ,  H01J61/14 ,  H01J61/16 ,  H01J61/20 ,  H01J61/34 ,  H01J61/35 ,  H01J61/40 ,  H01J65/04

Abstract: A plasma cell for use in a laser-sustained plasma light source includes a plasma bulb configured to contain a gas suitable for generating a plasma. The plasma bulb is transparent to light from a pump laser, wherein the plasma bulb is transparent to at least a portion of a collectable spectral region of illumination emitted by the plasma. The plasma bulb of the plasma cell is configured to filter short wavelength radiation, such as VUV radiation, emitted by the plasma sustained within the bulb in order to keep the short wavelength radiation from impinging on the interior surface of the bulb.

公开(公告)号：US20210022233A1

公开(公告)日：2021-01-21

申请号：US17028902

申请日：2020-09-22

Applicant: KLA Corporation

Inventor： Matthew Derstine ,  Ilya Bezel ,  Anatoly Shchemelinin ,  Eugene Shifrin

IPC: H05G2/00 ,  H05H1/24

Abstract: A system for generating laser sustained broadband light includes a pump source configured to generate a pumping beam, a gas containment structure for containing a gas and a multi-pass optical assembly. The multi-pass optical assembly includes one or more optical elements configured to perform a plurality of passes of the pumping beam through a portion of the gas to sustain a broadband-light-emitting plasma. The one or more optical elements are arranged to collect an unabsorbed portion of the pumping beam transmitted through the plasma and direct the collected unabsorbed portion of the pumping beam back into the portion of the gas.