Abstract:
Provided are a polishing composition for chemical mechanical polishing, a method of preparing the polishing composition, and a chemical mechanical polishing method using the polishing composition. The polishing composition which is a water-based polishing composition for planarizing a metal compound thin film including two or more metal elements includes nano-diamond particles as a polishing material and poly(sodium 4-styrenesulfonate) as a dispersion stabilizer for the nano-diamond particles in the polishing composition. Since the nano-diamond particles in the polishing composition have hydrophobic surfaces and poly(sodium 4-styrenesulfonate) effectively stabilizes the nano-diamond particles to prevent the nano-diamond particles from aggregating, excellent polishing characteristics for the metal compound thin film may be obtained due to the nano-diamond particles which have a nano size, high hardness, and excellent dispersibility.
Abstract:
A separator for a fuel cell and a method for manufacturing the same comprise two sheets of metal plates integrally formed to minimize contact resistance between an upper metal plate and a lower metal plate. The method for manufacturing the separator includes steps of preparing an upper metal plate and a lower metal plate, each plate having opposing main sides, and applying a coating liquid containing a polymer composite material on both sides of the upper and lower metal plates, to form first and second composite material layers on both sides of the upper plates and third and fourth composite material layers on both sides of the lower plates. The method further includes stacking the upper metal plate on the lower metal plate, before drying the respective composite material layers, and integrally bonding the second composite material layer and the third composite material layer to form a single intermediate composite material layer.
Abstract:
Provided is a carbon layer derived from carbide ceramics, wherein metal or non-metal atoms are extracted selectively from the surface of carbide ceramics to form voids, which, in turn, are filled with carbon synthesized by a carbon compound, thereby providing improved roughness and hardness, as well as to a method for preparing the same.
Abstract:
A polishing slurry for a chemical mechanical planarization process includes polishing particles and polyhedral nanoscale particles having a smaller size than the polishing particles and including a bond of silicon (Si) and oxygen (O).