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公开(公告)号：US4817707A
公开(公告)日：1989-04-04
申请号：US99018
申请日：1987-09-21
申请人： Kazuo Aoyama , Yukitaka Murata , Kiyoshi Hattori , Akio Okamoto , Kiyoshi Takahashi , Takashi Sasaki , Shigeko Hanari
发明人： Kazuo Aoyama , Yukitaka Murata , Kiyoshi Hattori , Akio Okamoto , Kiyoshi Takahashi , Takashi Sasaki , Shigeko Hanari
CPC分类号： F24D3/16 , Y10S165/044 , Y10S165/905
摘要： A heating soft floor mat is described comprising a base sheet composed of a thermoplastic resin foamed article as a heat insulating layer having meanderingly formed thereon grooves for conduits, conduits for heating medium disposed in the grooves, and cover material having flexibility covering the surface side thereof, wherein the thermoplastic resin foamed article is a crosslinked polyethylene foamed article containing closed cells having a degree of expansion of from 10 to 40 and the conduits are composed of low density crosslinked polyethylene having a density of less than 0.910 g/cm.sup.3.
摘要翻译： 一种加热软地板垫被描述为包括由热塑性树脂发泡制品构成的基片，作为隔热层，其上形成有用于导管的沟槽，用于设置在槽中的加热介质导管，以及覆盖其表面侧的柔性的覆盖材料 其中，所述热塑性树脂发泡体是包含膨胀度为10〜40的闭孔的交联聚乙烯发泡体，所述导管由密度小于0.910g / cm 3的低密度交联聚乙烯构成。
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公开(公告)号：US20070079934A1
公开(公告)日：2007-04-12
申请号：US11512431
申请日：2006-08-30
IPC分类号： H01L21/306 , C23F1/00 , C23C16/00
CPC分类号： C23C16/45565 , C04B41/009 , C04B41/53 , C04B41/91 , C04B35/505
摘要： To provide an inexpensive gas dispersion plate having a high corrosion resistance to halogen-based corrosive gasses and a plasma thereof, and capable of preventing particle generation from the gas hole, thereby contributing to an improvement in the production yield of the semiconductor devices. The gas dispersion plate includes one or plural gas holes in a base material formed by a Y2O3 ceramic material having a relative density of 96% or more, in which an edge part of the gas hole is formed by a sand blasting process into a rounded shape with a radius of curvature of 0.2 mm or more.
摘要翻译： 为了提供对卤素类腐蚀性气体和其等离子体具有高耐蚀性的廉价的气体分散板，并且能够防止从气孔产生颗粒，从而有助于提高半导体器件的产量。 气体分散板包括由相对密度为96％以上的Y 2 O 3 O 3陶瓷材料形成的基材中的一个或多个气孔，其中 气孔的边缘部分通过喷砂处理形成为具有0.2mm或更大的曲率半径的圆形。
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公开(公告)号：US20100069227A1
公开(公告)日：2010-03-18
申请号：US12557656
申请日：2009-09-11
IPC分类号： C04B35/50
CPC分类号： C04B35/505 , C04B35/495 , C04B2235/3225 , C04B2235/3229 , C04B2235/3251 , C04B2235/5436 , C04B2235/5445 , C04B2235/6582 , C04B2235/6584 , C04B2235/77 , C04B2235/80
摘要： The present invention provides ceramics for a plasma-treatment apparatus which are excellent in corrosion resistance against a halogen-type corrosive gas, plasma, etc., attain reduction in resistance, and inhibit impurity metal contamination caused by composition materials of these ceramics even in a halogen plasma process, and which can be used suitably for the component of the plasma-treatment apparatus for manufacturing a semiconductor, a liquid crystal, etc. The ceramics are used which are prepared in such a way that 3% by weight to 30% by weight of a cerium oxide relative to yttria and 3% by weight to 50% by weight of niobium pentoxide relative to yttria are added to yttria, which are fired in a reducing atmosphere to have an open porosity of 1.0% or less.
摘要翻译： 本发明提供了一种用于等离子体处理装置的陶瓷，其对于卤素型腐蚀性气体，等离子体等的耐腐蚀性优异，电阻降低，并且抑制由这些陶瓷的组成材料引起的杂质金属污染，即使在 卤素等离子体工艺，其可以适用于半导体制造用等离子体处理装置的部件，液晶等。使用这样的陶瓷，其制造方法为将3重量％〜30重量％ 将氧化钇相对于氧化钇的重量和相对于氧化钇的3重量％〜50重量％的五氧化二铌添加到氧化钇中，氧化钇在还原气氛中烧成，开放孔隙率为1.0％以下。
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