摘要:
A wafer-level package that employs one or more integrated hydrogen getters within the wafer-level package on a substrate wafer or a cover wafer. The hydrogen getters are provided between and among the integrated circuits on the substrate wafer or the cover wafer, and are deposited during the integrated circuit fabrication process. In one non-limiting embodiment, the substrate wafer is a group III-V semiconductor material, and the hydrogen getter includes a titanium layer, a nickel layer, and a palladium layer.
摘要:
A wafer-level package that employs one or more integrated hydrogen getters within the wafer-level package on a substrate wafer or a cover wafer. The hydrogen getters are provided between and among the integrated circuits on the substrate wafer or the cover wafer, and are deposited during the integrated circuit fabrication process. In one non-limiting embodiment, the substrate wafer is a group III-V semiconductor material, and the hydrogen getter includes a titanium layer, a nickel layer, and a palladium layer.
摘要:
A method for fabricating wafer-level packages including lateral interconnects. The method includes precutting a cover wafer at the locations where the cover wafer will be completely cut through to separate the wafer-level packages. The cover wafer is bonded to the substrate wafer using bonding rings so as to seal the integrated circuit within a cavity between the cover wafer and the substrate wafer, where the precuts face the substrate wafer. The cover wafer is then cut at the precut locations to remove the unwanted portions of the cover wafer between the packages and expose contacts or probe pads for the lateral interconnects. The substrate wafer is then cut between the wafer-level packages to separate the packages.
摘要:
A method for fabricating wafer-level packages including lateral interconnects. The method includes precutting a cover wafer at the locations where the cover wafer will be completely cut through to separate the wafer-level packages. The cover wafer is bonded to the substrate wafer using bonding rings so as to seal the integrated circuit within a cavity between the cover wafer and the substrate wafer, where the precuts face the substrate wafer. The cover wafer is then cut at the precut locations to remove the unwanted portions of the cover wafer between the packages and expose contacts or probe pads for the lateral interconnects. The substrate wafer is then cut between the wafer-level packages to separate the packages.
摘要:
A semiconductor structure, such as a wafer-level package or a vertically stacked structure. The wafer-level package includes a substrate wafer on which an integrated circuit is formed. A cover wafer is bonded to the substrate wafer to provide a cavity between the substrate wafer and the cover wafer in which the integrated circuit is hermetically sealed. Vias are formed through the substrate wafer and make electrical contact with signal and ground traces formed on the substrate wafer within the cavity, where the traces are electrically coupled to the integrated circuit. Probe pads are formed on the substrate wafer outside of the cavity and are in electrical contact with the vias. A support post is provided directly beneath the probe pad so that when pressure is applied to the probe pad from the probe for testing purposes, the support post prevents the substrate wafer from flexing and being damaged.
摘要:
A semiconductor structure, such as a wafer-level package or a vertically stacked structure. The wafer-level package includes a substrate wafer on which an integrated circuit is formed. A cover wafer is bonded to the substrate wafer to provide a cavity between the substrate wafer and the cover wafer in which the integrated circuit is hermetically sealed. Vias are formed through the substrate wafer and make electrical contact with signal and ground traces formed on the substrate wafer within the cavity, where the traces are electrically coupled to the integrated circuit. Probe pads are formed on the substrate wafer outside of the cavity and are in electrical contact with the vias. A support post is provided directly beneath the probe pad so that when pressure is applied to the probe pad from the probe for testing purposes, the support post prevents the substrate wafer from flexing and being damaged.