Abstract:
A method of patterning a transparent conductive film adaptive for selectively etching a transparent conductive film without any mask processes, a thin film transistor for a display device using the same and a fabricating method thereof are disclosed. In the method of patterning the transparent conductive film, an inorganic material substrate is prepared. An organic material pattern is formed at a desired area of the inorganic material substrate. A thin film having a different crystallization rate depending upon said inorganic material and said organic material is formed. The thin film is selectively etched in accordance with said crystallization rate.
Abstract:
An array substrate for a liquid crystal display device includes a substrate, a gate line and a data line on the substrate, the gate line and the data line crossing each other to define a pixel area, a thin film transistor electrically connected to the gate and data line and includes a gate electrode, an active layer, a source electrode, and a drain electrode, a passivation layer covering the gate line, the data line, and the thin film transistor, and having a contact hole situated on the active layer to expose portions of the drain electrode and the active layer, and a pixel electrode on the passivation layer and connected to the drain electrode through the contact hole.