Read head shield having improved stability
    3.
    发明授权
    Read head shield having improved stability 有权
    读头保护罩具有改善的稳定性

    公开(公告)号:US06801409B2

    公开(公告)日:2004-10-05

    申请号:US09952725

    申请日:2001-09-14

    IPC分类号: G11B539

    摘要: A read head shield having improved stability includes a ferromagnetic (FM) layer and an anti-ferromagnetic (AFM) layer adjacent the FM layer. The FM layer has a patterned shape and a domain configuration that is defined by a plurality of local magnetic domains that are stabilized in accordance with the patterned shape. The AFM layer is annealed to imprint thereon the stabilized local magnetic domains of the FM layer. The AFM layer operates to increase the stability of the domain configuration of the FM layer thereby providing improved resistance to domain configuration shift caused by the application of a strong magnetic field.

    摘要翻译: 具有改进的稳定性的读头屏蔽包括邻近FM层的铁磁(FM)层和反铁磁(AFM)层。 FM层具有由根据图案形状稳定的多个局部磁畴限定的图案形状和畴结构。 对AFM层进行退火以在其上压印FM层的稳定的局部磁畴。 AFM层操作以增加FM层的畴结构的稳定性,从而提供由施加强磁场引起的对域配置位移的改进的阻力。

    Growth of oxide exchange bias layers
    4.
    发明授权
    Growth of oxide exchange bias layers 失效
    氧化物交换偏压层的生长

    公开(公告)号:US5783262A

    公开(公告)日:1998-07-21

    申请号:US762087

    申请日:1996-12-09

    摘要: An oxide (NiO, CoO, NiCoO) antiferromagnetic exchange bias layer produced by ion beam sputtering of an oxide target in pure argon (Ar) sputtering gas, with no oxygen gas introduced into the system. Antiferromagnetic oxide layers are used, for example, in magnetoresistive readback heads to shift the hysteresis loops of ferromagnetic films away from the zero field axis. For example, NiO exchange bia layers have been fabricated using ion beam sputtering of an NiO target using Ar ions, with the substrate temperature at 200.degree. C., the ion beam voltage at 1000V and the beam current at 20 mA, with a deposition rate of about 0.2 .ANG./sec. The resulting NiO film was amorphous.

    摘要翻译: 通过在纯氩(Ar)溅射气体中的氧化物靶的离子束溅射产生的氧化物(NiO,CoO,NiCoO)反铁磁性交换偏压层,没有氧气引入到系统中。 反铁磁性氧化物层用于例如磁阻回读头以使铁磁膜的磁滞回线偏离零场轴。 例如,使用Ar离子的NiO靶的离子束溅射制造NiO交换层,衬底温度在200℃,离子束电压为1000V,束电流为20mA,沉积速率 约0.2安培/秒。 所得NiO膜是无定形的。