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1.发明授权Probe storage container, prober apparatus, probe arranging method and manufacturing method of probe storage container 有权探头存储容器，探头装置，探头安装方法和探头存储容器的制造方法公开(公告)号：US07875156B2
公开(公告)日：2011-01-25
申请号：US12027644
申请日：2008-02-07
IPC分类号： C23C14/34
CPC分类号： G01R1/06705 , Y10T29/49826
摘要： A probe storage container can supply a probe in a prober apparatus without being exposed to an atmospheric air. Preferably, the probe is stored in the probe storage container by removing an oxide film in a leading end portion of the probe in accordance with a dry treatment using an ion source, for example, without being exposed to the atmospheric air. It is thus possible to replace and attach the probe with respect to the prober apparatus without being exposed to the atmospheric air, avoiding formation of an oxide film on a surface of the probe. Further, a worker attaching the probe to the prober apparatus can work without being directly in contact with the probe, and it is possible to prevent the leading end portion of the probe from being broken. Accordingly, it is possible to stably measure an electric characteristic of a semiconductor device or the like on the wafer.
摘要翻译： 探头存储容器可以在探测设备中提供探针而不暴露于大气中。 优选地，通过根据例如使用离子源的干燥处理而不暴露于大气中，通过除去探针的前端部分中的氧化膜来将探针存储在探针存储容器中。 因此，可以相对于探针装置替换和附接探针而不暴露于大气中，避免在探针的表面上形成氧化膜。 此外，将探头附接到探测器装置的工作者可以在不直接与探针接触的情况下工作，并且可以防止探针的前端部分破裂。 因此，可以稳定地测量晶片上的半导体器件等的电特性。
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2.发明申请Probe Storage Container, Prober Apparatus, Probe Arranging Method and Manufacturing Method of Probe Storage Container 审中-公开探头存储容器，探测仪器，探头布置方法和探头存储容器的制造方法公开(公告)号：US20110093991A1
公开(公告)日：2011-04-21
申请号：US12977384
申请日：2010-12-23
IPC分类号： G01Q70/02
CPC分类号： G01R1/06705 , Y10T29/49826
摘要： An object of the present invention relates to an arrangement of a manufactured probe in a prober apparatus without being exposed to an atmospheric air.The present invention relates to a probe storage container which can supply a probe in a prober apparatus without being exposed to an atmospheric air. Preferably, the probe is stored in the probe storage container by removing an oxide film in a leading end portion of the probe in accordance with a dry treatment using an ion source or the like, without being exposed to the atmospheric air. In accordance with the present invention, it is possible to replace and attach the probe with respect to the prober apparatus without being exposed to the atmospheric air, and it is possible to avoid a formation of the oxide film on a surface of the probe. Further, a worker attaching the probe to the prober apparatus can work without being directly in contact with the probe, and it is possible to prevent the leading end portion of the probe from being broken. Accordingly, it is possible to stably measure an electric characteristic of a semiconductor device or the like on the wafer.
摘要翻译： 本发明的一个目的涉及一种制造的探针在探测设备中的布置，而不暴露于大气中。 探针存储容器本发明涉及一种探针存储容器，其可以在探测设备中提供探针而不暴露于大气中。 优选地，通过根据使用离子源等的干法处理而不暴露于大气中，通过在探针的前端部分除去氧化膜来将探针存储在探针存储容器中。 根据本发明，可以相对于探针装置替换和附接探针而不暴露于大气中，并且可以避免在探针的表面上形成氧化膜。 此外，将探头附接到探测器装置的工作者可以在不直接与探针接触的情况下工作，并且可以防止探针的前端部分破裂。 因此，可以稳定地测量晶片上的半导体器件等的电特性。
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3.发明申请Probe Storage Container, Prober Apparatus, Probe Arranging Method and Manufacturing Method of Probe Storage Container 有权探头存储容器，探测仪器，探头布置方法和探头存储容器的制造方法公开(公告)号：US20080204058A1
公开(公告)日：2008-08-28
申请号：US12027644
申请日：2008-02-07
CPC分类号： G01R1/06705 , Y10T29/49826
摘要： An object of the present invention relates to an arrangement of a manufactured probe in a prober apparatus without being exposed to an atmospheric air.The present invention relates to a probe storage container which can supply a probe in a prober apparatus without being exposed to an atmospheric air. Preferably, the probe is stored in the probe storage container by removing an oxide film in a leading end portion of the probe in accordance with a dry treatment using an ion source or the like, without being exposed to the atmospheric air. In accordance with the present invention, it is possible to replace and attach the probe with respect to the prober apparatus without being exposed to the atmospheric air, and it is possible to avoid a formation of the oxide film on a surface of the probe. Further, a worker attaching the probe to the prober apparatus can work without being directly in contact with the probe, and it is possible to prevent the leading end portion of the probe from being broken. Accordingly, it is possible to stably measure an electric characteristic of a semiconductor device or the like on the wafer.
摘要翻译： 本发明的一个目的涉及一种制造的探针在探测设备中的布置，而不暴露于大气中。 探针存储容器本发明涉及一种探针存储容器，其可以在探测设备中提供探针而不暴露于大气中。 优选地，通过根据使用离子源等的干法处理而不暴露于大气中，通过在探针的前端部分除去氧化膜来将探针存储在探针存储容器中。 根据本发明，可以相对于探针装置替换和附接探针而不暴露于大气中，并且可以避免在探针的表面上形成氧化膜。 此外，将探头附接到探测器装置的工作者可以在不直接与探针接触的情况下工作，并且可以防止探针的前端部分破裂。 因此，可以稳定地测量晶片上的半导体器件等的电特性。
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公开(公告)号：US20070257200A1
公开(公告)日：2007-11-08
申请号：US11730803
申请日：2007-04-04
申请人： Hiroyasu Kaga , Yuichi Madokoro , Shigeru Izawa , Tohru Ishitani , Kaoru Umemura
发明人： Hiroyasu Kaga , Yuichi Madokoro , Shigeru Izawa , Tohru Ishitani , Kaoru Umemura
IPC分类号： H01J27/02
CPC分类号： H01J27/02 , H01J27/22 , H01J37/08 , H01J2237/0805
摘要： An emitter of a Ga liquid metal ion source is constituted to include W12 of a base material and Ga9 of an ion source element covering a surface as construction materials. By making back-sputtered particles become elements (W and Ga) of the Ga liquid metal ion sour source, if back-sputtered particles attach to the Ga liquid metal ion source, contamination which may change physical characteristics of Ga9 does not occur. A W aperture is used as a beam limiting (GUN) aperture to place Ga of approx. 25 mg (of melting point of 30° C.) on a surface of a portion included in a beam emission region (Ga store). When emitting ions to the beam limiting (GUN) aperture, Ga in the emission region melts and diffuses on a surface of the beam emission region of the W aperture.
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5.发明授权Method and apparatus for fine movement of specimen stage of electron microscope 失效电子显微镜样品台精细运动的方法和装置
公开(公告)号：US5012092A
公开(公告)日：1991-04-30
申请号：US456522
申请日：1989-12-26
CPC分类号： G05B19/231 , H01J37/20 , G05B2219/35459 , G05B2219/45182
摘要： Method and apparatus for fine movement of a specimen stage of an electron microscope wherein a value of enlargement magnification M of the electron microscope is set, a manipulation unit adapted to move an image enlarged by the electron microscope in X or Y direction is then manipulated; a pulse signal PX2 or PY2 which accords with a manipulation amount of the manipulation unit is delivered, the specimen stage is moved in the X or Y direction in accordance with the delivered pulse signal, a pulse signal PX1 and PY1 which accords with a moving distance of the specimen stage in the X or Y direction is delivered, and the operation of movement of the specimen stage is stopped when the relation represented by PX2.multidot.K/M=PX1 or the relation represented by PY2.multidot.K/M=PY1 stands, where K is a constant.
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公开(公告)号：US20080210883A1
公开(公告)日：2008-09-04
申请号：US12076481
申请日：2008-03-19
申请人： Hiroyasu Kaga , Yuichi Madokoro , Shigeru Izawa , Tohru Ishitani , Kaoru Umemura
发明人： Hiroyasu Kaga , Yuichi Madokoro , Shigeru Izawa , Tohru Ishitani , Kaoru Umemura
IPC分类号： G21G5/00
CPC分类号： H01J27/02 , H01J27/22 , H01J37/08 , H01J2237/0805
摘要： An emitter of a Ga liquid metal ion source is constituted to include W12 of a base material and Ga9 of an ion source element covering a surface as construction materials. By making back-sputtered particles become elements (W and Ga) of the Ga liquid metal ion sour source, if back-sputtered particles attach to the Ga liquid metal ion source, contamination which may change physical characteristics of Ga9 does not occur. A W aperture is used as a beam limiting (GUN) aperture to place Ga of approx. 25 mg (of melting point of 30° C.) on a surface of a portion included in a beam emission region (Ga store). When emitting ions to the beam limiting (GUN) aperture, Ga in the emission region melts and diffuses on a surface of the beam emission region of the W aperture.
摘要翻译： Ga液体金属离子源的发射极构成为包括基材的W12和覆盖表面的离子源元素的Ga9作为构造材料。 通过使反溅射的颗粒成为Ga液态金属离子源的元素（W和Ga），如果反溅射的颗粒附着到Ga液态金属离子源，则不会发生可能改变Ga9的物理特性的污染物。 使用W光圈作为光束限制（GUN）光圈来放置大约的Ga。 在束发射区域（Ga储存）中包含的部分的表面上25mg（熔点为30℃））。 当将离子发射到光束限制（GUN）孔径时，发射区域中的Ga在W光阑的束发射区域的表面上熔化并扩散。
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公开(公告)号：US07211805B2
公开(公告)日：2007-05-01
申请号：US11312367
申请日：2005-12-21
申请人： Hiroyasu Kaga , Yuichi Madokoro , Shigeru Izawa , Tohru Ishitani , Kaoru Umemura
发明人： Hiroyasu Kaga , Yuichi Madokoro , Shigeru Izawa , Tohru Ishitani , Kaoru Umemura
CPC分类号： H01J27/02 , H01J27/22 , H01J37/08 , H01J2237/0805
摘要： An emitter of a Ga liquid metal ion source is constituted to include W12 of a base material and Ga9 of an ion source element covering a surface as construction materials. By making back-sputtered particles become elements (W and Ga) of the Ga liquid metal ion sour source, if back-sputtered particles attach to the Ga liquid metal ion source, contamination which may change physical characteristics of Ga9 does not occur. A W aperture is used as a beam limiting (GUN) aperture to place Ga of approx. 25 mg (of melting point of 30° C.) on a surface of a portion included in a beam emission region (Ga store). When emitting ions to the beam limiting (GUN) aperture, Ga in the emission region melts and diffuses on a surface of the beam emission region of the W aperture.
摘要翻译： Ga液体金属离子源的发射极构成为包括基材的W12和覆盖表面的离子源元素的Ga9作为构造材料。 通过使反溅射的颗粒成为Ga液态金属离子源的元素（W和Ga），如果反溅射的颗粒附着到Ga液态金属离子源，则不会发生可能改变Ga9的物理特性的污染物。 使用W光圈作为光束限制（GUN）光圈来放置大约的Ga。 在束发射区域（Ga储存）中包含的部分的表面上25mg（熔点为30℃））。 当将离子发射到光束限制（GUN）孔径时，发射区域中的Ga在W光阑的束发射区域的表面上熔化并扩散。
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公开(公告)号：US20050101591A1
公开(公告)日：2005-05-12
申请号：US10508783
申请日：2003-03-24
申请人： Shigeki Seto , Asao Tanioka , Makoto Ikeda , Shigeru Izawa
发明人： Shigeki Seto , Asao Tanioka , Makoto Ikeda , Shigeru Izawa
IPC分类号： A61P1/00 , A61P1/04 , A61P1/08 , A61P11/06 , A61P11/14 , A61P13/00 , A61P13/02 , A61P13/10 , A61P19/02 , A61P25/02 , A61P25/04 , A61P25/06 , A61P29/00 , A61P43/00 , C07D498/04 , A61K31/553 , A61K31/538 , C07D491/02
CPC分类号： C07D498/04
摘要： A fused bicyclic pyridine derivative represented by the following general formula (1), or a salt thereof: wherein the rings A and B are each a benzene ring, which may have 1 to 3 substituents (any adjacent two of which may be bound to one another to form a ring) that are each independently selected from the group consisting of a halogen atom, a substituted or unsubstituted C1 to C6 alkyl group, and a substituted or unsubstituted C1 to C6 alkoxyl group; R is a C1 to C6 alkylsulfonyl group, a C1 to C6 alkylcarbonyl group, a C1 to C6 alkoxycarbonyl group, or a formyl group; m is 1 or 2; n is 2 or 3; and q is 1 or 2.
摘要翻译： 由以下通式（1）表示的稠合双环吡啶衍生物或其盐：其中环A和B各自为苯环，其可以具有1至3个取代基（其中相邻的两个可以与一个 另一个形成环），其各自独立地选自卤素原子，取代或未取代的C 1至C 6烷基，以及被取代或未取代的C 1至C 6 未取代的C 1至C 6烷氧基; R是C 1 -C 6烷基磺酰基，C 1 -C 6烷基羰基，C 1 -C 6烷基羰基，C C 1 -C 6烷氧基羰基或甲酰基; m为1或2; n为2或3; q为1或2。
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公开(公告)号：US3935645A
公开(公告)日：1976-02-03
申请号：US497045
申请日：1974-08-13
申请人： Michio Okamoto , Shigeru Izawa , Michio Hara
发明人： Michio Okamoto , Shigeru Izawa , Michio Hara
摘要： An arrangement for indicating a relative azimuth between two objects remote from each other, such as a control station and a mobile unit remotely controlled by the station, on which are respectively mounted first and second synchronous transmitters for generating and transmitting their respective signals corresponding respectively to true azimuths of the station and the unit. The control station is further provided with a relative azimuth indicating device including outer stational and inner rotatable dials, a rotatable indicator, first and second synchronous receivers, each having means for effecting rotation by receiving one of the signals corresponding thereto, and means for transmitting the respective rotations of the receivers to the inner dial and the indicator, respectively. Thus, not only the relative azimuth between the control station and the mobile unit but also their respective true azimuths are simultaneously read on the device at a glance by a controller in the correlation of the outer and inner dials and the indicator.
摘要翻译： 用于指示彼此远离的两个对象之间的相对方位角的布置，诸如由所述站远程控制的控制站和移动单元，其上分别安装有第一和第二同步发射机，用于生成和发送它们各自的信号，分别对应于 车站和单位的真正方位角。 控制站还设置有包括外部和内部可旋转拨盘的相对方位指示装置，可旋转指示器，第一和第二同步接收器，每个具有通过接收与其相对应的信号中的一个来实现旋转的装置，以及用于发送 分别将接收器转到内拨盘和指示器。 因此，不仅控制台和移动单元之间的相对方位角以及它们各自的真实方位在外表盘和内表盘与指示器的相关性中一起被控制器一目了然地在设备上读取。
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公开(公告)号：US07064119B2
公开(公告)日：2006-06-20
申请号：US10509224
申请日：2003-03-24
申请人： Shigeki Seto , Asao Tanioka , Makoto Ikeda , Shigeru Izawa
发明人： Shigeki Seto , Asao Tanioka , Makoto Ikeda , Shigeru Izawa
IPC分类号： C07D487/04 , A61K31/519 , A61K31/5377 , A61K31/541 , A61P1/02
CPC分类号： C07D487/04
摘要： A novel fused bicyclic pyrimidine derivative or a salt thereof that acts as a tachykinin receptor antagonist and, in particular, as an NK1 receptor antagonist is represented by the following general formula (1): wherein the rings A and B are each a benzene ring having 1 to 3 substituents (any adjacent two of which may be bound to one another to form a ring); the ring C is a nitrogen-containing ring; R is a hydrogen atom, a C1 to C6 alkyl group, a C1 to C6 alkylcarbonyl group, or a C1 to C6 alkylsulfonyl group; m is 1 or 2; and n is 2 or 3.
摘要翻译： 用作速激肽受体拮抗剂，特别是作为NK1受体拮抗剂的新型稠合双环嘧啶衍生物或其盐由以下通式（1）表示：其中环A和B各自为苯环， 1至3个取代基（任何相邻的两个可以彼此结合形成环）; 环C是含氮环; R是氢原子，C 1至C 6烷基，C 1 -C 6烷基羰基 基团或C 1至C 6烷基磺酰基; m为1或2; n为2或3。
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