Electrochemically Fabricated Structures Having Dielectric or Active Bases and Methods of and Apparatus for Producing Such Structures
    1.
    发明申请
    Electrochemically Fabricated Structures Having Dielectric or Active Bases and Methods of and Apparatus for Producing Such Structures 审中-公开
    具有电介质或活性碱的电化学结构和用于生产这种结构的方法和装置

    公开(公告)号:US20140209470A1

    公开(公告)日:2014-07-31

    申请号:US14184362

    申请日:2014-02-19

    CPC classification number: C25D1/003 B81C1/00373 B81C2201/0181 B81C2201/019

    Abstract: Multilayer structures are electrochemically fabricated on a temporary (e.g. conductive) substrate and are thereafter bonded to a permanent (e.g. dielectric, patterned, multi-material, or otherwise functional) substrate and removed from the temporary substrate. In some embodiments, the structures are formed from top layer to bottom layer, such that the bottom layer of the structure becomes adhered to the permanent substrate, while in other embodiments the structures are formed from bottom layer to top layer and then a double substrate swap occurs. The permanent substrate may be a solid that is bonded (e.g. by an adhesive) to the layered structure or it may start out as a flowable material that is solidified adjacent to or partially surrounding a portion of the structure with bonding occurring during solidification. The multilayer structure may be released from a sacrificial material prior to attaching the permanent substrate or it may be released after attachment.

    Abstract translation: 多层结构在临时的(例如导电的)衬底上电化学地制造,然后在永久(例如电介质,图案化,多材料或其他功能)的衬底上结合并从临时衬底去除。 在一些实施例中,结构由顶层到底层形成,使得结构的底层变得粘附到永久性基底上,而在其它实施例中,结构由底层到顶层形成,然后是双层衬底交换 发生。 永久性基材可以是与层状结构结合的固体(例如通过粘合剂),或者可以作为在凝固期间发生结合而邻近或部分地围绕结构的一部分固化的可流动材料开始。 多层结构可以在附着永久性基底之前从牺牲材料上释放,或者在附着后可以释放多层结构。

    Microprobe Tips and Methods for Making
    3.
    发明申请
    Microprobe Tips and Methods for Making 审中-公开
    微型技巧和制作方法

    公开(公告)号:US20150108002A1

    公开(公告)日:2015-04-23

    申请号:US14572472

    申请日:2014-12-16

    CPC classification number: C25D1/003

    Abstract: Embodiments of the present invention are directed to the formation of microprobe tips elements having a variety of configurations. In some embodiments tips are formed from the same building material as the probes themselves, while in other embodiments the tips may be formed from a different material and/or may include a coating material. In some embodiments, the tips are formed before the main portions of the probes and the tips are formed in proximity to or in contact with a temporary substrate. Probe tip patterning may occur in a variety of different ways, including, for example, via molding in patterned holes that have been isotropically or anisotropically etched silicon, via molding in voids formed in exposed photoresist, via molding in voids in a sacrificial material that have formed as a result of the sacrificial material mushrooming over carefully sized and located regions of dielectric material, via isotropic etching of the tip material around carefully sized and placed etching shields, via hot pressing, and the like.

    Abstract translation: 本发明的实施例涉及形成具有各种构造的微探针尖元件。 在一些实施例中,尖端由与探针本身相同的建筑材料形成,而在其它实施例中,尖端可以由不同的材料形成和/或可以包括涂层材料。 在一些实施例中,尖端在探针的主要部分之前形成,并且尖端形成在临时衬底附近或与临时衬底接触。 探针尖端图案化可以以各种不同的方式发生,包括例如通过在各向异性或各向异性地蚀刻硅的图案化孔中模制,通过在曝光的光致抗蚀剂中形成的空隙中模制,通过在牺牲材料中的空隙中模制, 由于牺牲材料通过电介质材料的细小尺寸和定位的区域,经由热压等等仔细地尺寸和放置的蚀刻屏蔽部分上的尖端材料的各向同性蚀刻而形成。

Patent Agency Ranking