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公开(公告)号：US08410460B2
公开(公告)日：2013-04-02
申请号：US11785432
申请日：2007-04-17
IPC分类号： G01J3/10
CPC分类号： G01N21/8806 , G01N21/956
摘要： The pattern defect inspection apparatus and its method of the present invention comprises: a recipe setting unit for setting an inspection recipe and/or a review recipe; an illumination optical system including: a laser light source for emitting ultraviolet laser light; a quantity-of-light adjusting unit for adjusting a quantity of the ultraviolet laser light emitted from the laser light source; and an illumination range forming unit for forming on a sample an illumination range of the ultraviolet laser light; a coherence reducing system; and a detection optical system including: a condensing optical system; a diffracted-light control optical system; and a detecting unit.
摘要翻译： 本发明的图案缺陷检查装置及其方法包括：配方设定单元，用于设定检查食谱和/或检查食谱; 一种照明光学系统，包括：用于发射紫外线激光的激光源; 光量调节单元，用于调节从激光光源发射的紫外激光的量; 以及照明范围形成单元，用于在样品上形成紫外激光的照明范围; 一致性降低系统; 以及检测光学系统，包括：聚光光学系统; 衍射光控制光学系统; 和检测单元。
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2.发明授权Method and apparatus for detecting defects of a sample using a dark field signal and a bright field signal 失效使用暗场信号和亮场信号来检测样本的缺陷的方法和装置公开(公告)号：US07463350B2
公开(公告)日：2008-12-09
申请号：US10981721
申请日：2004-11-05
IPC分类号： G01N21/00
CPC分类号： G01N21/95684
摘要： Disclosed is a method and apparatus for inspecting defects of patterns of a sample at high speed and with high sensitivity while damage of the sample arising from high-power pulsed light is reduced. Light emitted from a pulsed laser light source is transmitted through a pseudo continuous-wave forming optical system having an optical system capable of reducing energy per pulse and yet maintaining the entire amount of light of the pulsed light, a beam formation optical system, and a coherence reduction optical system, and a beam deflected by a deformation illumination optical system is made to reflect on a PBS to be irradiated on a wafer. The apparatus is configured so that the diffracted light from the wafer is focused by an objective lens, transmitted through light modulation units, focused to form a plurality of images on a plurality of image sensors in a visual-field divided parallel detection unit 12, and then defects are detected by a signal processing unit.
摘要翻译： 公开了一种用于在高功率脉冲光下产生的样品损坏的情况下高速且高灵敏度地检查样品的图案的缺陷的方法和装置。 从脉冲激光光源发出的光通过伪连续波形成光学系统传输，该光学系统具有能够减少每脉冲能量并且仍保持脉冲光的光量，光束形成光学系统和 相干降低光学系统和由变形照明光学系统偏转的光束在PBS上反射以照射在晶片上。 该装置被配置为使得来自晶片的衍射光被物镜聚焦，透镜通过光调制单元被聚焦以在视野分割并行检测单元12中的多个图像传感器上形成多个图像，以及 那么由信号处理单元检测到缺陷。
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公开(公告)号：US20050110988A1
公开(公告)日：2005-05-26
申请号：US10981721
申请日：2004-11-05
IPC分类号： G01N21/956 , G01N21/88
CPC分类号： G01N21/95684
摘要： Disclosed is a method and apparatus for inspecting defects of patterns of a sample at high speed and with high sensitivity while damage of the sample arising from high-power pulsed light is reduced. Light emitted from a pulsed laser light source is transmitted through a pseudo continuous-wave forming optical system having an optical system capable of reducing energy per pulse and yet maintaining the entire amount of light of the pulsed light, a beam formation optical system, and a coherence reduction optical system, and a beam deflected by a deformation illumination optical system is made to reflect on a PBS to be irradiated on a wafer. The apparatus is configured so that the diffracted light from the wafer is focused by an objective lens, transmitted through light modulation units, focused to form a plurality of images on a plurality of image sensors in a visual-field divided parallel detection unit 12, and then defects are detected by a signal processing unit.
摘要翻译： 公开了一种用于在高功率脉冲光下产生的样品损坏的情况下高速且高灵敏度地检查样品的图案的缺陷的方法和装置。 从脉冲激光光源发出的光通过伪连续波形成光学系统传输，该光学系统具有能够减少每脉冲能量并且仍保持脉冲光的光量，光束形成光学系统和 相干降低光学系统和由变形照明光学系统偏转的光束在PBS上反射以照射在晶片上。 该装置被配置为使得来自晶片的衍射光被物镜聚焦，透镜通过光调制单元被聚焦以在视野分割并行检测单元12中的多个图像传感器上形成多个图像，以及 那么由信号处理单元检测到缺陷。
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公开(公告)号：US07359044B2
公开(公告)日：2008-04-15
申请号：US11180536
申请日：2005-07-14
IPC分类号： G01N21/00
CPC分类号： G01N21/95 , G01N2021/9513
摘要： A method of inspecting pattern defects can detect target defects in various processes stably by reducing erroneous detection of grains and morphology and decreasing the influence of an intensity nonuniformity in interference light. For this purpose, lights emitted from two sources of illumination capable of outputting a plurality of wavelengths are reflected by a beam splitter and irradiated onto a wafer. Diffracted light from the wafer is converged by an objective lens, is made to pass through light modulation units and imaged on an image sensor in a light detection unit. Then, defects are detected in a signal processing unit. Further, the optical modulation unit is made to have a structure that uses a plurality of optical components selectively and which can be optimized according to target defects.
摘要翻译： 检查图案缺陷的方法可以通过减少误差检测晶粒和形态并减少干涉光中的强度不均匀性的影响来稳定地检测各种工艺中的目标缺陷。 为此，从能够输出多个波长的两个照明源发射的光被分束器反射并照射到晶片上。 来自晶片的衍射光被物镜会聚，使其通过光调制单元并且成像在光检测单元中的图像传感器上。 然后，在信号处理单元中检测到缺陷。 此外，光调制单元具有选择性地使用多个光学部件并且可以根据目标缺陷进行优化的结构。
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公开(公告)号：US07295305B2
公开(公告)日：2007-11-13
申请号：US10914115
申请日：2004-08-10
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/4788 , G01N21/956
摘要： An apparatus for inspecting a defect, has a light source; a rotating diffuser plate for reducing coherence of light emitted from the light source after its light intensity was adjusted and its illumination range is formed; oscillating mirrors that variably change the beam whose coherence was reduced on a pupil, irradiates it onto a wafer, and forms an image thereof. An image sensor images the wafer by focusing reflected light from the wafer and detects an image signal; a camera observes the detected image; and an image processing unit detects a defect of a pattern formed on the wafer based on the detected image signal. Thus, conditions for illuminating the sample can be changed variably in an arbitrary and easy manner, and a more minute defect can be detected with high sensitivity by changing transmissivity and phase conditions of a pupil filter on the detection side.
摘要翻译： 用于检查缺陷的装置，具有光源; 旋转扩散板，用于在调整其光强度并且形成其照明范围之后，减少从光源发射的光的相干性; 可变地改变在瞳孔上相干性降低的光束的振动反射镜将其照射到晶片上并形成其图像。 图像传感器通过聚焦来自晶片的反射光来检测晶片，并检测图像信号; 相机观察检测到的图像; 并且图像处理单元基于检测到的图像信号检测在晶片上形成的图案的缺陷。 因此，照射样品的条件可以以任意和容易的方式可变地改变，并且通过改变检测侧的瞳孔滤光片的透射率和相位条件，可以以高灵敏度检测更多的微小缺陷。
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公开(公告)号：US20070195316A1
公开(公告)日：2007-08-23
申请号：US11785432
申请日：2007-04-17
IPC分类号： G01N21/00
CPC分类号： G01N21/8806 , G01N21/956
摘要： The pattern defect inspection apparatus and its method of the present invention comprises: a recipe setting unit for setting an inspection recipe and/or a review recipe; an illumination optical system including: a laser light source for emitting ultraviolet laser light; a quantity-of-light adjusting unit for adjusting a quantity of the ultraviolet laser light emitted from the laser light source; and an illumination range forming unit for forming on a sample an illumination range of the ultraviolet laser light; a coherence reducing system; and a detection optical system including: a condensing optical system; a diffracted-light control optical system; and a detecting unit.
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公开(公告)号：US07205549B2
公开(公告)日：2007-04-17
申请号：US10765920
申请日：2004-01-29
IPC分类号： G01J1/42
CPC分类号： G01N21/8806 , G01N21/956
摘要： The pattern defect inspection apparatus and its method of the present invention comprises: a recipe setting unit for setting an inspection recipe and/or a review recipe; an illumination optical system including: a laser light source for emitting ultraviolet laser light; a quantity-of-light adjusting unit for adjusting a quantity of the ultraviolet laser light emitted from the laser light source; and an illumination range forming unit for forming on a sample an illumination range of the ultraviolet laser light; a coherence reducing system; and a detection optical system including: a condensing optical system; a diffracted-light control optical system; and a detecting unit.
摘要翻译： 本发明的图案缺陷检查装置及其方法包括：配方设定单元，用于设定检查食谱和/或检查食谱; 一种照明光学系统，包括：用于发射紫外线激光的激光源; 光量调节单元，用于调节从激光光源发射的紫外激光的量; 以及照明范围形成单元，用于在样品上形成紫外激光的照明范围; 一致性降低系统; 以及检测光学系统，包括：聚光光学系统; 衍射光控制光学系统; 和检测单元。
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公开(公告)号：US20060012780A1
公开(公告)日：2006-01-19
申请号：US11180536
申请日：2005-07-14
IPC分类号： G01N21/88
CPC分类号： G01N21/95 , G01N2021/9513
摘要： A method of inspecting pattern defects can detect target defects in various processes stably by reducing erroneous detection of grains and morphology and decreasing the influence of an intensity nonuniformity in interference light. For this purpose, lights emitted from two sources of illumination capable of outputting a plurality of wavelengths are reflected by a beam splitter and irradiated onto a wafer. Diffracted light from the wafer is converged by an objective lens, is made to pass through light modulation units and imaged on an image sensor in a light detection unit. Then, defects are detected in a signal processing unit. Further, the optical modulation unit is made to have a structure that uses a plurality of optical components selectively and which can be optimized according to target defects.
摘要翻译： 检查图案缺陷的方法可以通过减少误差检测晶粒和形态并减少干涉光中的强度不均匀性的影响来稳定地检测各种工艺中的目标缺陷。 为此，从能够输出多个波长的两个照明源发射的光被分束器反射并照射到晶片上。 来自晶片的衍射光被物镜会聚，使其通过光调制单元并且成像在光检测单元中的图像传感器上。 然后，在信号处理单元中检测到缺陷。 此外，光调制单元具有选择性地使用多个光学部件并且可以根据目标缺陷进行优化的结构。
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公开(公告)号：US20050062963A1
公开(公告)日：2005-03-24
申请号：US10914115
申请日：2004-08-10
IPC分类号： G01B11/30 , G01N21/47 , G01N21/95 , G01N21/956 , G06T1/00 , H01L21/027 , H01L21/66 , G01N21/00 , G01J1/42
CPC分类号： G01N21/9501 , G01N21/4788 , G01N21/956
摘要： An apparatus for inspecting a defect, has a light source; a rotating diffuser plate for reducing coherence of light emitted from the light source after its light intensity was adjusted and its illumination range is formed; oscillating mirrors that variably change the beam whose coherence was reduced on a pupil, irradiates it onto a wafer, and forms an image thereof. An image sensor images the wafer by focusing reflected light from the wafer and detects an image signal; a camera observes the detected image; and an image processing unit detects a defect of a pattern formed on the wafer based on the detected image signal. Thus, conditions for illuminating the sample can be changed variably in an arbitrary and easy manner, and a more minute defect can be detected with high sensitivity by changing transmissivity and phase conditions of a pupil filter on the detection side.
摘要翻译： 用于检查缺陷的装置，具有光源; 旋转扩散板，用于在调整其光强度并且形成其照明范围之后，减少从光源发射的光的相干性; 可变地改变在瞳孔上相干性降低的光束的振动反射镜将其照射到晶片上并形成其图像。 图像传感器通过聚焦来自晶片的反射光来检测晶片，并检测图像信号; 相机观察检测到的图像; 并且图像处理单元基于检测到的图像信号检测在晶片上形成的图案的缺陷。 因此，照射样品的条件可以以任意和容易的方式可变地改变，并且通过改变检测侧的瞳孔滤光片的透射率和相位条件，可以以高灵敏度检测更多的微小缺陷。
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公开(公告)号：US20110063603A1
公开(公告)日：2011-03-17
申请号：US12950243
申请日：2010-11-19
申请人： Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
发明人： Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
CPC分类号： G01N21/94 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/9513 , G01N2021/95638 , H01L22/12
摘要： A defect inspection apparatus includes a movable stage for mounting a substrate having circuit patterns as an object of inspection, an irradiation optical system which irradiates a slit-shaped light beam from an oblique direction to the circuit patterns of the substrate, a detection optical system which includes an image sensor for receiving reflected/scattered light from the substrate by irradiation of the slit-shaped light beam and converting the received light into a signal, and an image processor which processes the signal. The irradiation optical system includes a cylindrical lens and a coherency reduction optical system, which receives the light beam and emits a plurality of slit-shaped light sub-beams which are spatially reduced in coherency in a light-converging direction of the cylindrical lens. The cylindrical lens focuses the plurality of slit-shaped light sub-beams into the slit-shaped light beam irradiated to the surface of the substrate.
摘要翻译： 缺陷检查装置包括：可移动台，用于安装具有作为检查对象的电路图案的基板;照射光学系统，其将来自倾斜方向的狭缝状光束照射到基板的电路图案;检测光学系统， 包括图像传感器，用于通过照射狭缝状光束并将接收到的光转换成信号来从基板接收反射/散射光，以及处理该信号的图像处理器。 照射光学系统包括柱面透镜和相干性降低光学系统，其接收光束并发射在柱面透镜的聚光方向上空间相减的多个狭缝状光子束。 柱面透镜将多个狭缝状光子束聚焦成照射到基板表面的狭缝状光束。
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