公开(公告)号：US20250010425A1

公开(公告)日：2025-01-09

申请号：US18897639

申请日：2024-09-26

Applicant: NHK SPRING CO., LTD.

Inventor： Masahiro FUJII ,  Daisuke FUJINO ,  Yoshihito ARAKI ,  Naoya AIKAWA ,  Nobuyuki FURUGORI ,  Tomonori KASONO

IPC: B24B37/04

Abstract: A polishing device according to an embodiment comprises: a supporting unit for supporting a polishing tool, a stage for holding an object to be polished; a first drive unit for causing the support unit and the stage to move relative to one another along a shape of a polishing surface of the object to be polished, and a second drive unit for causing the support unit to control synchronously with the first drive unit such that one predetermined end of a polishing member attached to the polishing tool faces in a movement direction of the polishing member.

公开(公告)号：US20240032156A1

公开(公告)日：2024-01-25

申请号：US18374271

申请日：2023-09-28

Applicant: NHK SPRING CO., LTD.

Inventor： Naoya KIDA ,  Jun FUTAKUCHIYA ,  Daisuke FUJINO ,  Yuki TANI

IPC: H05B3/56 ,  H05B3/18

CPC classification number: H05B3/56 ,  H05B3/18 ,  H05B2203/016

Abstract: A sheathed heater with improved reliability is provided. Alternatively, a substrate support device including the sheathed heater with improved reliability is provided. The sheathed heater of the present invention includes a first metal wire, a first terminal connected to a first end of the first metal wire, a first conductive flexible member connected to the first terminal and connected to a second metal wire, a second terminal connected to a second end of the first metal wire, and a second conductive flexible member connected to the second terminal and connected to a third metal wire, wherein the first conductive flexible member and the second conductive flexible member are arranged adjacent to each other.