Method and apparatus for forming an electrical contact with a semiconductor substrate
    2.
    发明申请
    Method and apparatus for forming an electrical contact with a semiconductor substrate 有权
    用于形成与半导体衬底的电接触的方法和装置

    公开(公告)号:US20020088715A1

    公开(公告)日:2002-07-11

    申请号:US10093185

    申请日:2002-03-05

    Applicant: NU-TOOL, INC.

    CPC classification number: H01L21/6715 C25D17/001 H01L21/2885 H01L21/67075

    Abstract: The present invention is directed to a method and apparatus for plating a surface of a semiconductor workpiece (wafer, flat panel, magnetic films, etc.) using a liquid conductor that makes contact with the outer surface of the workpiece. The liquid conductor is stored in a reservoir and pump through an inlet channel to the liquid chamber. The liquid conductor is injected into a liquid chamber such that the liquid conductor makes contact with the outer surface of the workpiece. An inflatable tube is also provided to prevent the liquid conductor from reaching the back face of the workpiece. A plating solution can be applied to the front face of the workpiece where a retaining ring/seal further prevents the plating solution and the liquid conductor from making contact with each other. In an alternative embodiment, electrical contacts may be formed using an inflatable tube that has either been coated with a conductive material or contains a conductive object. The inflatable tube further provides uniform contact and pressure along the periphery of the workpiece, which may not necessarily be perfectly flat, because the tube can conform according to the shape of the periphery of the workpiece. Further, the present invention can be used to dissolve/etch a metal layer from the periphery of the workpiece.

    Abstract translation: 本发明涉及一种使用与工件的外表面接触的液体导体对半导体工件的表面(晶片,平板,磁性膜等)进行电镀的方法和装置。 液体导体储存在储存器中并通过入口通道泵送到液体室。 液体导体被注入到液体室中,使得液体导体与工件的外表面接触。 还设有可充气管以防止液体导体到达工件的背面。 可以将电镀液施加到工件的前表面,其中保持环/密封件进一步防止电镀溶液和液体导体彼此接触。 在替代实施例中,可以使用已经涂覆有导电材料或包含导电物体的可充气管来形成电接触。 可膨胀管还可以沿着工件的周边提供均匀的接触和压力,这可能不一定是完全平坦的,因为管可以根据工件的周边的形状来适应。 此外,本发明可用于从工件的周边溶解/蚀刻金属层。

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