公开(公告)号：US4994586A

公开(公告)日：1991-02-19

申请号：US357201

申请日：1989-05-25

申请人： Nobumasa Arashiba ,  Takashi Shimizu ,  Masaru Takeshita ,  Akira Otsu

发明人： Nobumasa Arashiba ,  Takashi Shimizu ,  Masaru Takeshita ,  Akira Otsu

IPC分类号： C07D301/19 ,  C07D303/04

CPC分类号： C07D301/19 ,  C07D303/04

摘要： A novel method for preparing an epoxy compound is disclosed which comprises the step of reacting an olefin compound having 4 to 16 carbon atoms with an organic hydroperoxide in an inactive solvent in the presence of a molybdenum compound and at least one metal halide selected from the group consisting of halides of alkali metals and alkaline earth metals, in order to form the corresponding epoxy compound. Typical examples of the aforesaid metal halide include sodium chloride, potassium iodide, sodium bromide and barium chloride. According to the present invention, the epoxy compound having 4 to 16 carbon atoms can be prepared in an extremely high yield.

公开(公告)号：US20120034561A1

公开(公告)日：2012-02-09

申请号：US13242879

申请日：2011-09-23

申请人： Hikaru Momose ,  Atsushi Ootake ,  Akifumi Ueda ,  Tadayuki Fujiwara ,  Masaru Takeshita ,  Ryotaro Hayashi ,  Takeshi Iwai

发明人： Hikaru Momose ,  Atsushi Ootake ,  Akifumi Ueda ,  Tadayuki Fujiwara ,  Masaru Takeshita ,  Ryotaro Hayashi ,  Takeshi Iwai

IPC分类号： G03F7/20 ,  C08F224/00 ,  G03F7/004

CPC分类号： C08F220/28 ,  G03F7/0397 ,  Y10S430/111

摘要： The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.

摘要翻译： 本发明的抗蚀剂聚合物包含具有氰基的特定结构单元，具有酸解离基的结构单元和具有内酯骨架的特定结构单元。 当在DUV准分子激光光刻或电子束光刻中使用上述聚合物作为抗蚀剂树脂时，其表现出高灵敏度和高分辨率，并且提供良好的抗蚀剂图案形状，线边缘粗糙度的发生程度小或微凝胶的产生 。

公开(公告)号：US08097396B2

公开(公告)日：2012-01-17

申请号：US11597005

申请日：2005-05-25

申请人： Hiroaki Shimizu ,  Masaru Takeshita

发明人： Hiroaki Shimizu ,  Masaru Takeshita

IPC分类号： G03F7/004 ,  G03F7/028 ,  G03F7/039

CPC分类号： G03F7/0397 ,  Y10S430/111

摘要： A positive resist composition that includes a resin component (A) that exhibits increased alkali solubility under action of acid, and an acid generator component (B) that generates acid on exposure, wherein the component (A) is a copolymer (A1) that includes a structural unit (a1) derived from an acrylate that contains an acid dissociable, dissolution inhibiting group, a structural unit (a2) derived from an α-lower alkyl acrylate that contains a lactone ring, and a structural unit (a3) derived from an (α-lower alkyl)acrylate that contains a polar group-containing polycyclic group.

摘要翻译： 包含在酸作用下表现出增加的碱溶性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B）的正型抗蚀剂组合物，其中组分（A）是共聚物（A1），其包含 衍生自含有酸解离性溶解抑制基团的丙烯酸酯的结构单元（a1），衍生自含有内酯环的丙烯酸α-低级烷基酯的结构单元（a2）和衍生自 （α-低级烷基）丙烯酸酯，含有极性基团的多环基。

公开(公告)号：US20120009520A1

公开(公告)日：2012-01-12

申请号：US13177390

申请日：2011-07-06

申请人： Masaru Takeshita ,  Yoshiyuki Utsumi

发明人： Masaru Takeshita ,  Yoshiyuki Utsumi

IPC分类号： G03F7/20 ,  G03F7/004

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/2041

摘要： A positive resist composition including a resin component (A1) having a structural unit (a1) derived from an acrylate ester which may have an atom other than hydrogen or a group bonded to the carbon atom on the α position and containing an acid dissociable, dissolution inhibiting group, and a structural unit (a0) containing an —SO2— containing cyclic group; a compound (C1) represented by general formula (c1) shown below; and an acid-generator component (B) which generates acid upon exposure, wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Y1 represents a divalent aliphatic hydrocarbon group; R1 represents a hydrogen atom, a fluorine atom, an alkyl group or a fluorinated alkyl group; p represents an integer of 1 to 10; and A+ represents an organic cation.

摘要翻译： 一种正型抗蚀剂组合物，其包含具有来自丙烯酸酯的结构单元（a1）的树脂组分（A1），所述结构单元（a1）可以具有除氢之外的原子或与α位上的碳原子键合的基团，并且含有酸可离解，溶解 和含有-SO 2的环状基团的结构单元（a0）; 由下述通式（c1）表示的化合物（C1） 和暴露后产生酸的酸发生剂组分（B），其中R表示氢原子，1至5个碳原子的烷基或1至5个碳原子的卤代烷基; Y1表示二价脂族烃基; R1表示氢原子，氟原子，烷基或氟代烷基; p表示1〜10的整数， 而A +代表有机阳离子。

公开(公告)号：US07767378B2

公开(公告)日：2010-08-03

申请号：US11718388

申请日：2005-11-04

申请人： Hiroaki Shimizu ,  Masaru Takeshita

发明人： Hiroaki Shimizu ,  Masaru Takeshita

IPC分类号： G03F7/039

CPC分类号： G03F7/0397 ,  C08F220/28 ,  Y10S430/111

摘要： A method for producing a resist composition including a resin component (A) that exhibits changed alkali solubility under the action of acid and an acid generator component (B) that generates acid upon exposure, the method including the steps of: obtaining the component (A) by mixing a plurality of copolymers, which are composed of the same structural units but have mutually different measured values for the contact angle.

摘要翻译： 一种制备抗蚀剂组合物的方法，该抗蚀剂组合物包括在酸的作用下显示出碱溶性变化的树脂组分（A）和暴露时产生酸的酸产生剂组分（B）的方法，所述方法包括以下步骤：获得组分 ）通过混合由相同结构单元组成但具有相互不同的接触角测量值的多个共聚物。

公开(公告)号：US07682770B2

公开(公告)日：2010-03-23

申请号：US10576405

申请日：2004-10-20

申请人： Hideo Hada ,  Masaru Takeshita ,  Ryotaro Hayashi ,  Syogo Matsumaru ,  Taku Hirayama ,  Hiroaki Shimizu

发明人： Hideo Hada ,  Masaru Takeshita ,  Ryotaro Hayashi ,  Syogo Matsumaru ,  Taku Hirayama ,  Hiroaki Shimizu

IPC分类号： G03F7/039 ,  G03F7/028

CPC分类号： G03F7/0045 ,  G03F7/0397 ,  Y10S430/122

摘要： A resist composition is provided that yields fine resolution, and improved levels of line edge roughness and depth of focus. This composition includes a resin component (A) that undergoes a change in alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure, wherein the component (A) is a resin with a weight average molecular weight of no more than 8,000 containing structural units (a) derived from a (meth)acrylate ester, and the component (B) includes at least one sulfonium compound represented by a general formula (b-1) or a general formula (b-2) shown below.

摘要翻译： 提供了抗蚀剂组合物，其产生精细的分辨率，并且改善了线边缘粗糙度和聚焦深度的水平。 该组合物包含在酸作用下发生碱溶解性变化的树脂成分（A）和暴露时产生酸的酸发生剂成分（B），其中，成分（A）为重均分子量 由（甲基）丙烯酸酯衍生的含有结构单元（a）的重量不大于8,000，组分（B）包括至少一种由通式（b-1）或通式（b- 2）如下所示。

公开(公告)号：US20090246683A1

公开(公告)日：2009-10-01

申请号：US12064288

申请日：2006-08-16

申请人： Ryoji Watanabe ,  Masaru Takeshita

发明人： Ryoji Watanabe ,  Masaru Takeshita

IPC分类号： G03F7/20 ,  G03F7/004

CPC分类号： G03F7/0045 ,  C08F220/28 ,  G03F7/0397 ,  Y10S430/111 ,  Y10S430/122

摘要： A positive resist composition and method of forming a resist pattern are provided which enable formation of a resist pattern having excellent shape with reduced LWR.The positive resist composition includes a resin component (A) which exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon irradiation, the resin component (A) having a structural unit (a1) which has an acetal-type protection group, and the acid-generator component (B) including an acid generator (B1) having a cation moiety represented by general formula (b-5) shown below: wherein Ra and Rb each independently represents an alkyl group, an alkoxy group, a halogen atom or a hydroxyl group; Rc represents an aryl group or alkyl group which may or may not have a substituent; and n′ and n″ each independently represents an integer of 0 to 3.

摘要翻译： 提供一种正型抗蚀剂组合物和形成抗蚀剂图案的方法，其能够形成具有优异形状的抗蚀剂图案，其具有减小的LWR。 正型抗蚀剂组合物包括在酸作用下表现出增加的碱溶性的树脂组分（A）和在照射时产生酸的酸产生剂组分（B），具有结构单元（a1）的树脂组分（A）具有 缩醛型保护基和含有具有下述通式（b-5）表示的阳离子部分的酸发生剂（B1）的酸发生剂成分（B）：其中，Ra和Rb各自独立地表示烷基， 烷氧基，卤素原子或羟基; Rc表示可以具有或不具有取代基的芳基或烷基; n'和n“各自独立地表示0〜3的整数。

公开(公告)号：US20090075204A1

公开(公告)日：2009-03-19

申请号：US12299523

申请日：2007-05-18

申请人： Masaru Takeshita ,  Ryoji Watanabe

发明人： Masaru Takeshita ,  Ryoji Watanabe

IPC分类号： G03F7/027 ,  G03F7/20

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  Y10S430/111

摘要： A positive resist composition including a resin component (A) which exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a structural unit (a0-1) represented by general formula (a0-1) shown below and a structural unit (a0-2) represented by general formula (a0-2) shown below: wherein: R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; each of Y1 and Y3 independently represents an aliphatic cyclic group; Z represents a tertiary alkyl group-containing group or an alkoxyalkyl group; a represents an integer of 1 to 3, and b represents an integer of 0 to 2, such that a+b=1 to 3; each of c, d and e independently represents an integer of 0 to 3; each of g and h independently represents an integer of 0 to 3; and i represents an integer of 1 to 3.

摘要翻译： 包含在酸作用下表现出增加的碱溶性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B）的正型抗蚀剂组合物，包括结构单元（a0-1）的树脂组分（A） 由下述通式（a0-1）表示的结构单元（a0-2）和下述通式（a0-2）表示的结构单元（a0-2）表示：其中：R表示氢原子，卤素原子，低级烷基或 卤代低级烷基; Y 1和Y 3各自独立地表示脂族环基; Z表示含叔烷基的基团或烷氧基烷基; a表示1〜3的整数，b表示0〜2的整数，a + b = 1〜3。 c，d和e各自独立地表示0〜3的整数， g和h各自独立地表示0〜3的整数， i表示1〜3的整数。

公开(公告)号：US20090068592A1

公开(公告)日：2009-03-12

申请号：US12299529

申请日：2007-04-18

申请人： Masaru Takeshita ,  Ryoji Watanabe

发明人： Masaru Takeshita ,  Ryoji Watanabe

IPC分类号： G03F7/027 ,  G03F7/20

CPC分类号： G03F7/0397

摘要： A positive resist composition including a resin component (A) which exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a structural unit (a0) represented by general formula (a0) shown below and a structural unit (a1) derived from an acrylate ester having a polycyclic group-containing, acid dissociable, dissolution inhibiting group of a tertiary alkyl ester-type: wherein: R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; Y1 represents an aliphatic cyclic group; Z represents a tertiary alkyl group-containing group; a represents an integer of 1 to 3, and b represents an integer of 0 to 2, such that a+b 1 to 3; and each of c, d and e independently represents an integer of 0 to 3.

摘要翻译： 一种正型抗蚀剂组合物，其包含在酸作用下表现出增加的碱溶性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B），所述树脂组分（A）包含由 由下述通式（a0）表示的结构单元（a1）和由具有含多环基团的酸解离性溶解抑制基团的叔烷基酯型的丙烯酸酯衍生的结构单元（a1）：其中：R表示氢原子，卤素 原子，低级烷基或卤代低级烷基; Y1表示脂肪族环状基团; Z表示含叔烷基的基团; a表示1〜3的整数，b表示0〜2的整数，a + b 1〜3; c，d和e各自独立地表示0〜3的整数。

公开(公告)号：US07494759B2

公开(公告)日：2009-02-24

申请号：US11597696

申请日：2005-05-24

申请人： Hideo Hada ,  Masaru Takeshita ,  Satoshi Yamada

发明人： Hideo Hada ,  Masaru Takeshita ,  Satoshi Yamada

IPC分类号： G03F7/00 ,  G03F7/004

CPC分类号： G03F7/0397

摘要： A positive resist composition comprising (A) a resin component and (B) an acid generator component, wherein the component (A) is a copolymer which comprises constituent units (a1) derived from a mono(α-lower alkyl)acrylate having an acid-dissociable dissolution-inhibiting group, constituent units (b1) derived from a mono α-lower alkyl)acrylate having a lactone ring, and constituent units (c1) derived from a poly(α-lower alkyl)acrylate; and a positive resist composition comprising (A) a resin component and (B) an acid generator component, wherein the component (A) is a star polymer having a core containing acid-dissociable dissolution-inhibiting groups and arms bonded to the core.

摘要翻译： 一种正型抗蚀剂组合物，其包含（A）树脂组分和（B）酸产生剂组分，其中组分（A）是包含衍生自具有酸的单（α-低级烷基）丙烯酸酯的构成单元（a1）的共聚物 - 衍生自具有内酯环的单α-低级烷基）丙烯酸酯的结构单元（b1）和衍生自聚（α-低级烷基）丙烯酸酯的构成单元（c1）; 以及包含（A）树脂成分和（B）酸产生剂成分的正型抗蚀剂组合物，其中，成分（A）是具有含有酸解离性溶解抑制基团的核和与核结合的臂的星形聚合物。