Methods and memory structures using tunnel-junction device as control element

    公开(公告)号:US07130207B2

    公开(公告)日:2006-10-31

    申请号:US10756661

    申请日:2004-01-12

    IPC分类号: G11C5/02

    摘要: A memory structure includes a memory storage element electrically coupled to a control element. The control element comprises a tunnel-junction device. The memory storage element may also comprise a tunnel-junction device. Methods for fusing a tunnel-junction device of a memory storage element without fusing a tunnel-junction device of an associated control element are disclosed. The memory storage element may have an effective cross-sectional area that is greater than an effective cross-sectional area of the control element. A memory structure comprises a memory storage element, a control element comprising a tunnel-junction device electrically coupled to the memory storage element and configured to control the state of the memory storage element, and a reference element. The reference element is configured as a reference to protect the control element when selectively controlling the state of the memory storage element. The reference element may comprise a tunnel-junction device and be used with a current source to fuse a memory storage element without fusing a tunnel-junction device of an associated control element. Methods of making the memory structure and using it in electronic devices are disclosed.

    Tunnel-junction structures and methods
    2.
    发明授权
    Tunnel-junction structures and methods 失效
    隧道结结构和方法

    公开(公告)号:US06821848B2

    公开(公告)日:2004-11-23

    申请号:US10286157

    申请日:2002-10-30

    IPC分类号: H01L21336

    摘要: Tunnel-junction structures are fabricated by any of a set of related methods that form two or more tunnel junctions simultaneously. The fabrication methods disclosed are compatible with conventional CMOS fabrication practices, including both single damascene and dual damascene processes. The simultaneously formed tunnel junctions may have different areas. In some embodiments, tub-well structures are formed with sloped sidewalls. In some embodiments, an oxide-metal-oxide film stack on the sidewall of a tub-well is etched to form the tunnel junctions. Memory circuits, other integrated circuit structures, substrates carrying microelectronics, and other electronic devices made by the methods are disclosed.

    摘要翻译: 隧道结结构通过同时形成两个或更多个隧道结的一组相关方法中的任一种来制造。 所公开的制造方法与常规CMOS制造实践兼容,包括单镶嵌和双镶嵌工艺。 同时形成的隧道结可以具有不同的区域。 在一些实施例中,浴盆结构形成有倾斜的侧壁。 在一些实施例中,蚀刻在浴缸的侧壁上的氧化物 - 金属氧化物膜堆叠以形成隧道结。 公开了存储电路,其它集成电路结构,携带微电子的衬底以及通过该方法制造的其它电子器件。

    Methods and memory structures using tunnel-junction device as control element

    公开(公告)号:US06831861B2

    公开(公告)日:2004-12-14

    申请号:US10756450

    申请日:2004-01-12

    IPC分类号: G11C700

    摘要: A memory structure includes a memory storage element electrically coupled to a control element. The control element comprises a tunnel-junction device. The memory storage element may also comprise a tunnel-junction device. Methods for fusing a tunnel-junction device of a memory storage element without fusing a tunnel-junction device of an associated control element are disclosed. The memory storage element may have an effective cross-sectional area that is greater than an effective cross-sectional area of the control element. A memory structure comprises a memory storage element, a control element comprising a tunnel-junction device electrically coupled to the memory storage element and configured to control the state of the memory storage element, and a reference element. The reference element is configured as a reference to protect the control element when selectively controlling the state of the memory storage element. The reference element may comprise a tunnel-junction device and be used with a current source to fuse a memory storage element without fusing a tunnel-junction device of an associated control element. Methods of making the memory structure and using it in electronic devices are disclosed.

    Methods and memory structures using tunnel-junction device as control element
    4.
    发明授权
    Methods and memory structures using tunnel-junction device as control element 失效
    使用隧道结装置作为控制元件的方法和记忆结构

    公开(公告)号:US07372714B2

    公开(公告)日:2008-05-13

    申请号:US11494397

    申请日:2006-07-26

    IPC分类号: G11C5/02

    摘要: A memory structure includes a memory storage element electrically coupled to a control element. The control element comprises a tunnel-junction device. The memory storage element may also comprise a tunnel-junction device. Methods for fusing a tunnel-junction device of a memory storage element without fusing a tunnel-junction device of an associated control element are disclosed. The memory storage element may have an effective cross-sectional area that is greater than an effective cross-sectional area of the control element. A reference element comprising a tunnel-junction device may be used with a current source to fuse a memory storage element without fusing a tunnel-junction device of an associated control element. Methods of making the memory structure and using it in electronic devices are disclosed.

    摘要翻译: 存储器结构包括电耦合到控制元件的存储器存储元件。 控制元件包括隧道连接装置。 存储器存储元件还可以包括隧道连接装置。 公开了一种用于熔接存储器存储元件的隧道结器件而不熔接相关控制元件的隧道结器件的方法。 存储器存储元件可以具有大于控制元件的有效横截面面积的有效横截面面积。 包括隧道结结器件的参考元件可以与电流源一起使用,以熔化存储器存储元件而不熔合相关联的控制元件的隧道连接器件。 公开了在电子设备中制作存储器结构并将其使用的方法。

    Methods and memory structures using tunnel-junction device as control element

    公开(公告)号:US06711045B2

    公开(公告)日:2004-03-23

    申请号:US10236274

    申请日:2002-09-06

    IPC分类号: G11C506

    摘要: A memory structure includes a memory storage element electrically coupled to a control element. The control element comprises a tunnel-junction device. The memory storage element may also comprise a tunnel-junction device. Methods for fusing a tunnel-junction device of a memory storage element without fusing a tunnel-junction device of an associated control element are disclosed. The memory storage element may have an effective cross-sectional area that is greater than an effective cross-sectional area of the control element. A memory structure comprises a memory storage element, a control element comprising a tunnel-junction device electrically coupled to the memory storage element and configured to control the state of the memory storage element, and a reference element. The reference element is configured as a reference to protect the control element when selectively controlling the state of the memory storage element. The reference element may comprise a tunnel-junction device and be used with a current source to fuse a memory storage element without fusing a tunnel-junction device of an associated control element. Methods of making the memory structure and using it in electronic devices are disclosed.

    Antifuse structure and method of making
    9.
    发明授权
    Antifuse structure and method of making 失效
    防腐结构及制作方法

    公开(公告)号:US06559516B1

    公开(公告)日:2003-05-06

    申请号:US10051676

    申请日:2002-01-16

    IPC分类号: H01L2900

    摘要: An antifuse structure has an antifuse between first and second thermal conduction regions. Each of the first and second thermal conduction regions has a portion of low thermal conductivity and a portion of high thermal conductivity. The portion having low thermal conductivity is between the respective portion of high thermal conductivity and the antifuse.

    摘要翻译: 反熔丝结构在第一和第二导热区域之间具有反熔丝。 第一和第二导热区域中的每一个具有低热导率的部分和高导热率的一部分。 具有低热导率的部分在高热导率的相应部分和反熔丝之间。