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公开(公告)号：US20190204737A1
公开(公告)日：2019-07-04
申请号：US16192013
申请日：2018-11-15
发明人： Yeonok KIM , Geun HUH , Ju-Young JUNG , Jung-Hwa LEE , Jong Han YANG
CPC分类号： G03F7/0392 , G03F7/023 , G03F7/0757 , H01L27/1218
摘要： The present invention relates to a positive-type photosensitive resin composition and a cured film prepared therefrom. The positive-type photosensitive resin composition comprises an acrylic resin and a siloxane copolymer containing a sulfonated diazoquinone group at the terminal thereof. Thus, the film retention rate and adhesiveness can be further enhanced, while the sensitivity is maintained.
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公开(公告)号：US20210165326A1
公开(公告)日：2021-06-03
申请号：US17089602
申请日：2020-11-04
发明人： Kahee Shin , Jung-Hwa LEE , Jong-Ho NA , Geun HUH
摘要： The present invention relates to a positive-type photosensitive resin composition and a cured film prepared therefrom. The composition comprises a siloxane copolymer having specific structural units. Thus, a cured film formed from the composition may achieve a low edge angle of the pattern, thereby enhancing the resolution without deteriorating such physical properties as film retention rate and sensitivity.
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公开(公告)号：US20230244144A1
公开(公告)日：2023-08-03
申请号：US18070893
申请日：2022-11-29
发明人： Jung-Hwa LEE , Jong-Ho NA , Geun HUH
CPC分类号： G03F7/0395 , C08G77/18 , G03F7/0757 , C08G77/80
摘要： The present invention relates to a positive-type photosensitive resin composition and to a cured film prepared therefrom The positive-type photosensitive resin composition comprises an acid-modified epoxy acrylate resin of a specific structure, so that it can provide a cured film that is excellent in flexible characteristics while having excellent film retention rate and sensitivity.
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