公开(公告)号：US20210165326A1

公开(公告)日：2021-06-03

申请号：US17089602

申请日：2020-11-04

申请人： ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.

发明人： Kahee Shin ,  Jung-Hwa LEE ,  Jong-Ho NA ,  Geun HUH

IPC分类号： G03F7/075 ,  G03F7/022

摘要： The present invention relates to a positive-type photosensitive resin composition and a cured film prepared therefrom. The composition comprises a siloxane copolymer having specific structural units. Thus, a cured film formed from the composition may achieve a low edge angle of the pattern, thereby enhancing the resolution without deteriorating such physical properties as film retention rate and sensitivity.

公开(公告)号：US11226558B2

公开(公告)日：2022-01-18

申请号：US16664994

申请日：2019-10-28

申请人： ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.

发明人： Kahee Shin ,  Eun-Young Lee ,  Jong-Ho Na ,  Geun Huh

IPC分类号： G03F7/023 ,  G03F7/033 ,  G03F7/039 ,  C08F220/14 ,  G03F7/031

摘要： The present invention relates to a positive-type photosensitive resin composition and a cured film prepared therefrom. The composition comprises a photopolymerizable compound containing a double bond and a specific photopolymerization initiator, wherein the photopolymerizable compound containing a double bond suppresses the photopolymerization reaction upon exposure to light but causes the photopolymerization reaction at the time of photobleaching after development, thereby controlling the flowability of the composition during thermal curing. Thus, a pattern is readily formed, which makes it possible to maintain excellent sensitivity upon the development and even upon the hard-bake process after the development, and it is possible to provide a cured film that is excellent in film strength and film retention rate.

公开(公告)号：US11137682B2

公开(公告)日：2021-10-05

申请号：US16160024

申请日：2018-10-15

申请人： ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.

发明人： Kahee Shin ,  Jong Han Yang ,  Geun Huh

IPC分类号： G03F7/075 ,  G03F7/023 ,  G03F7/022 ,  G03F7/033 ,  G03F7/039

摘要： The present invention relates to a photosensitive resin composition that is excellent in adhesiveness and sensitivity. Specifically, the photosensitive resin composition is capable of providing a cured film that is excellent in transparency, sensitivity, chemical resistance, and adhesiveness upon immersion in a stripper. Thus, the cured film can be effectively used in a liquid crystal display, an organic EL display, and the like.