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    PROJECTION ASSEMBLY FOR A HEAD-UP DISPLAY (HUD) WITH P-POLARIZED RADIATION
    3.
    发明申请
    PROJECTION ASSEMBLY FOR A HEAD-UP DISPLAY (HUD) WITH P-POLARIZED RADIATION 有权

    公开(公告)号：US20250155614A1

    公开(公告)日：2025-05-15

    申请号：US18729824

    申请日：2023-01-17

    Applicant: SAINT-GOBAIN GLASS FRANCE

    Inventor： Denis GUIMARD ,  Romain HIVET ,  Jan HAGEN ,  Bernard NGHIEM

    IPC: G02B5/08 ,  G02B27/01 ,  G03B21/62

    Abstract: A projection arrangement for a head-up display (HUD), includes a composite pane, including an outer pane and an inner pane, which are connected to one another via a thermoplastic intermediate layer and having an HUD region, and an HUD projector, which is directed toward the HUD region. The radiation of the projector is at least partially p-polarised, and the composite pane is provided with a reflective layer which is suitable for reflecting p-polarised radiation. The reflective layer includes precisely one electrically conductive layer based on silver, which layer is arranged in a planar manner between a first layer module and a second layer module, the first layer module is the layer module of the reflective layer closest to the HUD projector, the first layer module and the second layer module include dielectric layers or layer sequences, and the first layer module contains a layer based on a transparent conductive oxide.

    METHOD AND DEVICE FOR LOCATING THE ORIGIN OF A DEFECT AFFECTING A STACK OF THIN LAYERS DEPOSITED ON A SUBSTRATE
    4.
    发明申请
    METHOD AND DEVICE FOR LOCATING THE ORIGIN OF A DEFECT AFFECTING A STACK OF THIN LAYERS DEPOSITED ON A SUBSTRATE 审中-公开

    公开(公告)号：US20190309409A1

    公开(公告)日：2019-10-10

    申请号：US16309184

    申请日：2017-06-22

    Applicant: SAINT-GOBAIN GLASS FRANCE

    Inventor： Bernard NGHIEM ,  Yohan FAUCILLON ,  Gregoire MATHEY ,  Thierry KAUFFMANN

    IPC: C23C14/18 ,  G06T7/00 ,  C23C14/54 ,  G01N21/88 ,  G02B1/10

    Abstract: A method for locating, in a deposition line including a succession of compartments, an origin of a defect affecting a stack of thin layers deposited on a substrate in the compartments, in which each thin layer is deposited in one or more successive compartments of the deposition line and pieces of debris remaining on the surface of a thin layer deposited in a compartment act as masks for the subsequent depositions of thin layers and are the origin of defects, includes obtaining at least one image showing the defect, determining, from the at least one image, a signature of the defect, the signature containing at least one characteristic representative of the defect, and identifying at least one compartment of the deposition line liable to be the origin of the defect from the signature of the defect and using reference signatures associated with the compartments of the deposition line.

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