METHOD AND DEVICE FOR LOCATING THE ORIGIN OF A DEFECT AFFECTING A STACK OF THIN LAYERS DEPOSITED ON A SUBSTRATE

    公开(公告)号:US20190309409A1

    公开(公告)日:2019-10-10

    申请号:US16309184

    申请日:2017-06-22

    Abstract: A method for locating, in a deposition line including a succession of compartments, an origin of a defect affecting a stack of thin layers deposited on a substrate in the compartments, in which each thin layer is deposited in one or more successive compartments of the deposition line and pieces of debris remaining on the surface of a thin layer deposited in a compartment act as masks for the subsequent depositions of thin layers and are the origin of defects, includes obtaining at least one image showing the defect, determining, from the at least one image, a signature of the defect, the signature containing at least one characteristic representative of the defect, and identifying at least one compartment of the deposition line liable to be the origin of the defect from the signature of the defect and using reference signatures associated with the compartments of the deposition line.

    METHOD FOR ADJUSTING PARAMETERS OF A COATING PROCESS TO MANUFACTURE A COATED TRANSPARENT SUBSTRATE

    公开(公告)号:US20240280948A1

    公开(公告)日:2024-08-22

    申请号:US18571047

    申请日:2022-06-16

    CPC classification number: G05B13/0265 C03C17/3642

    Abstract: A method for adjusting at least two parameters of a coating process to manufacture a coated transparent substrate including a multi-layered coating according to a targeted value for at least one quality function for the coated transparent substrate. The method relies on a set of different mathematical prediction models in the training procedure, which, once trained, when they are used either sequentially, alternatively or in parallel, during the prediction procedure, allow to counteract or counterbalance drifts that may potentially occur from one of them. Outstanding benefits are that misbehaviours of current feedback methods may be prevented, that changes in the local atmosphere of deposit cells, and in turn in the chemistry of coated layers, which may occur from temperature and/or humidity variation, may be compensated, and that more than one coating process parameters may be adjusted at the same time.

    METHOD FOR CONFIGURING A COATING PROCESS
    4.
    发明公开

    公开(公告)号:US20230288895A1

    公开(公告)日:2023-09-14

    申请号:US18006326

    申请日:2021-07-13

    CPC classification number: G05B19/0426 G05B2219/23322

    Abstract: A computer implemented method for configuring a coating process to deposit a targeted mono- or multi-layered coating on a substrate, the method providing as output a series of ordered tasks executed on the coating process, and includes (a) providing a dataset including a data related to parameters of the coating process; (b) providing a set of algorithms which takes, as input, data from the dataset of (a) and provides, as output, series of at least one tasks associated to each algorithm; selecting two algorithms from the set of algorithms depending on current states of the coating process as provided as input data, and (d) selecting an order in which the algorithms selected at (c) has to be carried out so that the tasks provided by the algorithms are organized as a series of ordered tasks which are executed contextually onto the coating process at corresponding stages in the coating process.

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