Abstract:
A back contact substrate for a photovoltaic cell, including a carrier substrate and an electrode, the electrode including a conductive coating including a metallic thin film based on a metal or metal alloy; a barrier to selenization thin film for protecting the conductive coating and based on at least one among MoxOyNz, WxOyNz, TaxOyNz, NbxOyNz, RexOyNz.
Abstract:
The invention concerns a layer system for thin-layer solar cells, said layer system comprising an absorber layer for absorbing light and a buffer layer on the absorber layer, said buffer layer containing NaxIny-x/3S, in which 0.063≦x≦0.625 and 0.681≦y≦1.50.
Abstract:
A back contact substrate for a photovoltaic cell includes a carrier substrate and an electrode, the electrode including an alloy thin film based on at least two elements, at least one first element MA chosen among copper (Cu), silver (Ag) and gold (Au), and at least one second element MB chosen among zinc (Zn), titanium (Ti), tin (Sn), silicon (Si), germanium (Ge), zirconium (Zr), hafnium (Hf), carbon (C) and lead (Pb).
Abstract:
A back contact substrate for a photovoltaic cell includes a carrier substrate and an electrode, the electrode including an alloy thin film based: on at least one among copper (Cu) and silver (Ag); and on zinc (Zn).
Abstract:
The present invention relates to a layer system (1) for thin-film solar cells (100) and solar modules, comprising an absorber layer (4) that includes a chalcogenide compound semiconductor and a buffer layer (5) that is arranged on the absorber layer (4) and includes halogen-enriched InxSy with ⅔≦x/y≦1, wherein the buffer layer (5) consists of a first layer region (5.1) adjoining the absorber layer (4) with a halogen mole fraction A1 and a second layer region (5.2) adjoining the first layer region (5.1) with a halogen mole fraction A2 and the ratio A1/A2 is ≧2 and the layer thickness (d1) of the first layer region (5.1) is ≦50% of the layer thickness (d) of the buffer layer (5).
Abstract translation:本发明涉及一种用于薄膜太阳能电池(100)和太阳能模块的层系统(1),包括一个吸收层(4),该吸收层包括一个硫族化物化合物半导体和一个缓冲层(5) 层(4),并且包括具有⅔和nlE的卤素富集的In x S y; x / y&n l E; 1,其中缓冲层(5)由邻近吸收层(4)的第一层区域(5.1)和卤素摩尔分数A1组成, 与第一层区域(5.1)邻接的第二层区域(5.2)与卤素摩尔分数A2,比率A1 / A2为≥2,第一层区域(5.1)的层厚度(d1)为 缓冲层(5)的层厚度(d)。