公开(公告)号：US20200260534A1

公开(公告)日：2020-08-13

申请号：US16656054

申请日：2019-10-17

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： YOUNGHO HWANG ,  Chulmin Cho ,  Seok Heo

IPC: H05B6/06 ,  H01L21/67 ,  H05B1/02 ,  H05B6/44 ,  H05B6/04

Abstract: A heating module including: a plate including heating regions; heater coils disposed in the heating regions; a power source supplying an electric power to the heater coils; a switching circuit connected to the heater coils and the power source to control the electric power; temperature sensors disposed in the heating regions to sense temperatures of the heating regions; current sensors connected to the switching circuit and the heater coils to sense currents supplied to the heater coils; and a heating controller connected to the temperature sensors and the current sensors to measure temperatures of the heating regions. The heating controller is configured to detect the currents supplied to the heater coils and provides a maximum power to the heater coils regardless of a resistance difference of the heater coils, when a measured temperature is less than a predetermined temperature.

公开(公告)号：US20250155814A1

公开(公告)日：2025-05-15

申请号：US18751464

申请日：2024-06-24

Applicant: Samsung Electronics Co., Ltd.

Inventor： Chulmin Cho ,  Youngho Hwang ,  Juno Park ,  Kyoungwhan Oh ,  Sunyoung Yun ,  Youngkyun Im ,  Jaehong Lim ,  Seok Heo

IPC: G03F7/16 ,  B05C11/08

Abstract: A spin coating apparatus according to an embodiment includes a substrate supporter supporting a substrate, a substrate supporter driver rotating the substrate supporter, a laser supply unit disposed on the substrate supporter and providing a laser, and a laser driver of driving the laser supply unit, wherein the laser supply unit may move along a first direction, which is horizontal to the substrate surface on the substrate supporter.

公开(公告)号：US20250028257A1

公开(公告)日：2025-01-23

申请号：US18436744

申请日：2024-02-08

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Kyoungwhan Oh ,  Dahae Lee ,  Eunhee Jeang ,  Chulmin Cho ,  Kyungwon Kang

IPC: G03F7/00 ,  G03F7/20

Abstract: A semiconductor process apparatus includes a light generator configured to output extreme ultraviolet (EUV) light having an EUV wavelength band, a mask stage configured to seat a mask reflecting the EUV light output from the light generator, a light-receiving optical unit including a plurality of mirrors generating output light by reflecting the EUV light reflected from the mask, at least one of the plurality of mirrors including a mirror body and a reflective layer attached to a surface of the mirror body, a power supply configured to apply a bias voltage to the reflective layer, and a substrate stage configured to seat a substrate to be irradiated with the output light.